Classifications

• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C247/00—Compounds containing azido groups
• • C—CHEMISTRY; METALLURGY
  • C07—ORGANIC CHEMISTRY
  • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
  • C07C255/00—Carboxylic acid nitriles
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
  • C08F8/00—Chemical modification by after-treatment
  • C08F8/14—Esterification
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
  • C08G59/14—Polycondensates modified by chemical after-treatment
  • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
  • C08G59/1477—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing nitrogen
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
  • C08G85/00—General processes for preparing compounds provided for in this subclass
  • C08G85/004—Modification of polymers by chemical after-treatment
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/004—Photosensitive materials
  • G03F7/008—Azides
  • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
  • C08F2810/00—Chemical modification of a polymer
  • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
  • C08F2810/00—Chemical modification of a polymer
  • C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains

Landscapes

• Chemical & Material Sciences (AREA)
• Organic Chemistry (AREA)
• General Chemical & Material Sciences (AREA)
• Health & Medical Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Medicinal Chemistry (AREA)
• Polymers & Plastics (AREA)
• Physics & Mathematics (AREA)
• Spectroscopy & Molecular Physics (AREA)
• General Physics & Mathematics (AREA)
• Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
• Macromonomer-Based Addition Polymer (AREA)
• Polymerisation Methods In General (AREA)
• Phenolic Resins Or Amino Resins (AREA)
• Polysaccharides And Polysaccharide Derivatives (AREA)
• Materials For Photolithography (AREA)
• Epoxy Compounds (AREA)
• Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=10451864

Family Applications (1)

Country Status (20)

Families Citing this family (5)

• 0
  • BE BE790383D patent/BE790383A/xx not_active IP Right Cessation
• 1971
  • 1971-10-22 GB GB4929771A patent/GB1377747A/en not_active Expired
• 1972
  • 1972-10-16 ZA ZA727353A patent/ZA727353B/xx unknown
  • 1972-10-18 CA CA154519A patent/CA986638A/en not_active Expired
  • 1972-10-18 FI FI2886/72A patent/FI57183C/fi active
  • 1972-10-19 AU AU47952/72A patent/AU473438B2/en not_active Expired
  • 1972-10-20 SU SU1845296A patent/SU493984A3/ru active
  • 1972-10-20 NO NO3785/72A patent/NO137104C/no unknown
  • 1972-10-20 NL NLAANVRAGE7214212,A patent/NL189626C/xx active Search and Examination
  • 1972-10-20 CH CH1539172A patent/CH558400A/fr not_active IP Right Cessation
  • 1972-10-20 SE SE7213552A patent/SE393621B/xx unknown
  • 1972-10-20 IT IT70312/72A patent/IT975318B/it active
  • 1972-10-20 FR FR7237376A patent/FR2156906B1/fr not_active Expired
  • 1972-10-21 IN IN1703/1972A patent/IN137774B/en unknown
  • 1972-10-21 ES ES408109A patent/ES408109A1/es not_active Expired
  • 1972-10-21 DE DE2251828A patent/DE2251828C2/de not_active Expired
  • 1972-10-23 JP JP10765872A patent/JPS578126B2/ja not_active Expired
  • 1972-10-23 CS CS7107A patent/CS171174B2/cs unknown
  • 1972-10-23 DD DD162944A patent/DD102222A5/xx unknown
  • 1972-10-23 AT AT903672A patent/AT322977B/de not_active IP Right Cessation

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