GB1376640A - Charge coupled devices - Google Patents

Charge coupled devices

Info

Publication number
GB1376640A
GB1376640A GB3004672A GB3004672A GB1376640A GB 1376640 A GB1376640 A GB 1376640A GB 3004672 A GB3004672 A GB 3004672A GB 3004672 A GB3004672 A GB 3004672A GB 1376640 A GB1376640 A GB 1376640A
Authority
GB
United Kingdom
Prior art keywords
wells
electrodes
charge
beneath
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3004672A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1376640A publication Critical patent/GB1376640A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/762Charge transfer devices
    • H01L29/765Charge-coupled devices
    • H01L29/768Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76833Buried channel CCD
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/28Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements
    • G11C19/282Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements with charge storage in a depletion layer, i.e. charge coupled devices [CCD]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1025Channel region of field-effect devices
    • H01L29/1062Channel region of field-effect devices of charge coupled devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/762Charge transfer devices
    • H01L29/765Charge-coupled devices
    • H01L29/768Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76833Buried channel CCD
    • H01L29/76841Two-Phase CCD
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/762Charge transfer devices
    • H01L29/765Charge-coupled devices
    • H01L29/768Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76866Surface Channel CCD

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Semiconductor Memories (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)

Abstract

1376640 Semi-conductor devices WESTERN ELECTRIC CO Inc 27 June 1972 [28 June 1971 (2)] 30046/72 Heading H1K A charge coupled device comprises an electrode arrangement, on an insulating layer, over a charge carrier storage medium, fixed charges being distributed beneath the electrode arrangement to form an asymmetric well during operation. The fixed charge may reside in the medium, the insulating layer or both, and may be produced by diffusion or ion implantation. In one embodiment, Figs. 1, 2 (not shown), a two-phase system has chargers fixed in the medium and distributed non-uniformly so as to form potential barriers to charge carriers in the "upstream" direction. In a second embodiment, Fig. 6, the fixed charges reside, non-uniformly, in the insulating layer, again forming potential barriers in the "upstream" direction. The use of two value clock pulses enables a single row of electrodes to be used, the first pulse to all electrodes being of a low value to form shallow potential wells beneath the electrodes enabling carriers to transfer to deeper wells beneath the interelectrode spaces, the second pulse being of a greater value to form deep wells beneath the electrodes and receive carriers, in one direction only, from the shallower inter-electrode wells. In a further embodiment, the electrodes may be mounted on insulating material of irregular thickness to assist in the formation of suitably asymmetric wells. In Fig. 12 (not shown), a single electrode extends over insulating material of irregular thickness, the material containing a non-uniform distribution of fixed charge, a two-value clock pulse enabling charge transfer by means of wells of different depths beneath different parts of the electrode. The medium may be of silicon, the insulating layer of silicon dioxide.
GB3004672A 1971-06-28 1972-06-27 Charge coupled devices Expired GB1376640A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15750771A 1971-06-28 1971-06-28
US15750971A 1971-06-28 1971-06-28

Publications (1)

Publication Number Publication Date
GB1376640A true GB1376640A (en) 1974-12-11

Family

ID=26854197

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3004672A Expired GB1376640A (en) 1971-06-28 1972-06-27 Charge coupled devices

Country Status (8)

Country Link
JP (1) JPS5147586B1 (en)
BE (1) BE785468A (en)
DE (1) DE2231616C3 (en)
FR (1) FR2143837B1 (en)
GB (1) GB1376640A (en)
IT (1) IT958489B (en)
NL (1) NL163675C (en)
SE (2) SE387186B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3852799A (en) * 1973-04-27 1974-12-03 Bell Telephone Labor Inc Buried channel charge coupled apparatus
FR2259438B1 (en) * 1974-01-24 1976-10-08 Commissariat Energie Atomique
FR2294546A1 (en) * 1974-12-13 1976-07-09 Thomson Csf SINGLE-PHASE LOAD TRANSFER DEVICE

Also Published As

Publication number Publication date
FR2143837A1 (en) 1973-02-09
NL163675C (en) 1980-09-15
IT958489B (en) 1973-10-20
SE409773B (en) 1979-09-03
DE2231616A1 (en) 1973-01-11
NL163675B (en) 1980-04-15
BE785468A (en) 1972-10-16
DE2231616B2 (en) 1981-02-05
SE7509111L (en) 1975-08-14
SE387186B (en) 1976-08-30
DE2231616C3 (en) 1981-10-01
NL7208841A (en) 1973-01-02
FR2143837B1 (en) 1974-12-27
JPS5147586B1 (en) 1976-12-15

Similar Documents

Publication Publication Date Title
GB1442464A (en) Charge-coupled devices
GB1340618A (en) Charge transfer apparatus
ES388720A1 (en) Monolithic semiconductor apparatus adapted for sequential charge transfer
GB1377129A (en) Charged coupled devices
GB1451096A (en) Semiconductor devices
GB1415944A (en) Charge transfer devices
US3735156A (en) Reversible two-phase charge coupled devices
GB1220306A (en) Triac structure
GB1376640A (en) Charge coupled devices
JPS5324789A (en) Production of semiconductor device
GB1301193A (en) Improvements in semiconductor devices
GB1471617A (en) Circuits comprising a semiconductor device
GB1374009A (en) Information storage
GB1322110A (en) Charge-coupled device
GB1423449A (en) Semiconductor device
JPS5228277A (en) Non-voltatile semiconductor memory device
GB1177540A (en) Improvements in or relating to Transistors
JPS52115669A (en) Semiconductor memory device
JPS6449274A (en) Superhigh-speed semiconductor device
CA980918A (en) Method of forming a nickel electrode on a silicon substrate
JPS5287373A (en) Production of semiconductor device
JPS6489563A (en) Charge coupled device
GB1446236A (en) Charge transfer semiconductor devices
NL7901180A (en) Charge transfer semiconductor device - has depletion regions of different depth beneath adjacent electrodes
JPS5275189A (en) Charge transfer device

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee