GB1376640A - Charge coupled devices - Google Patents
Charge coupled devicesInfo
- Publication number
- GB1376640A GB1376640A GB3004672A GB3004672A GB1376640A GB 1376640 A GB1376640 A GB 1376640A GB 3004672 A GB3004672 A GB 3004672A GB 3004672 A GB3004672 A GB 3004672A GB 1376640 A GB1376640 A GB 1376640A
- Authority
- GB
- United Kingdom
- Prior art keywords
- wells
- electrodes
- charge
- beneath
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000969 carrier Substances 0.000 abstract 2
- 239000002800 charge carrier Substances 0.000 abstract 2
- 239000011810 insulating material Substances 0.000 abstract 2
- 230000001788 irregular Effects 0.000 abstract 2
- 238000005036 potential barrier Methods 0.000 abstract 2
- 238000011144 upstream manufacturing Methods 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000009828 non-uniform distribution Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
- H01L29/76833—Buried channel CCD
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers
- G11C19/28—Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements
- G11C19/282—Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements with charge storage in a depletion layer, i.e. charge coupled devices [CCD]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1025—Channel region of field-effect devices
- H01L29/1062—Channel region of field-effect devices of charge coupled devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
- H01L29/76833—Buried channel CCD
- H01L29/76841—Two-Phase CCD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
- H01L29/76866—Surface Channel CCD
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Semiconductor Memories (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
1376640 Semi-conductor devices WESTERN ELECTRIC CO Inc 27 June 1972 [28 June 1971 (2)] 30046/72 Heading H1K A charge coupled device comprises an electrode arrangement, on an insulating layer, over a charge carrier storage medium, fixed charges being distributed beneath the electrode arrangement to form an asymmetric well during operation. The fixed charge may reside in the medium, the insulating layer or both, and may be produced by diffusion or ion implantation. In one embodiment, Figs. 1, 2 (not shown), a two-phase system has chargers fixed in the medium and distributed non-uniformly so as to form potential barriers to charge carriers in the "upstream" direction. In a second embodiment, Fig. 6, the fixed charges reside, non-uniformly, in the insulating layer, again forming potential barriers in the "upstream" direction. The use of two value clock pulses enables a single row of electrodes to be used, the first pulse to all electrodes being of a low value to form shallow potential wells beneath the electrodes enabling carriers to transfer to deeper wells beneath the interelectrode spaces, the second pulse being of a greater value to form deep wells beneath the electrodes and receive carriers, in one direction only, from the shallower inter-electrode wells. In a further embodiment, the electrodes may be mounted on insulating material of irregular thickness to assist in the formation of suitably asymmetric wells. In Fig. 12 (not shown), a single electrode extends over insulating material of irregular thickness, the material containing a non-uniform distribution of fixed charge, a two-value clock pulse enabling charge transfer by means of wells of different depths beneath different parts of the electrode. The medium may be of silicon, the insulating layer of silicon dioxide.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15750771A | 1971-06-28 | 1971-06-28 | |
US15750971A | 1971-06-28 | 1971-06-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1376640A true GB1376640A (en) | 1974-12-11 |
Family
ID=26854197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3004672A Expired GB1376640A (en) | 1971-06-28 | 1972-06-27 | Charge coupled devices |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS5147586B1 (en) |
BE (1) | BE785468A (en) |
DE (1) | DE2231616C3 (en) |
FR (1) | FR2143837B1 (en) |
GB (1) | GB1376640A (en) |
IT (1) | IT958489B (en) |
NL (1) | NL163675C (en) |
SE (2) | SE387186B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3852799A (en) * | 1973-04-27 | 1974-12-03 | Bell Telephone Labor Inc | Buried channel charge coupled apparatus |
FR2259438B1 (en) * | 1974-01-24 | 1976-10-08 | Commissariat Energie Atomique | |
FR2294546A1 (en) * | 1974-12-13 | 1976-07-09 | Thomson Csf | SINGLE-PHASE LOAD TRANSFER DEVICE |
-
1972
- 1972-06-19 SE SE7208053A patent/SE387186B/en unknown
- 1972-06-22 IT IT51081/72A patent/IT958489B/en active
- 1972-06-27 NL NL7208841.A patent/NL163675C/en not_active IP Right Cessation
- 1972-06-27 GB GB3004672A patent/GB1376640A/en not_active Expired
- 1972-06-27 BE BE785468A patent/BE785468A/en unknown
- 1972-06-28 DE DE2231616A patent/DE2231616C3/en not_active Expired
- 1972-06-28 JP JP47064167A patent/JPS5147586B1/ja active Pending
- 1972-06-28 FR FR7223408A patent/FR2143837B1/fr not_active Expired
-
1975
- 1975-08-14 SE SE7509111A patent/SE409773B/en unknown
Also Published As
Publication number | Publication date |
---|---|
FR2143837A1 (en) | 1973-02-09 |
NL163675C (en) | 1980-09-15 |
IT958489B (en) | 1973-10-20 |
SE409773B (en) | 1979-09-03 |
DE2231616A1 (en) | 1973-01-11 |
NL163675B (en) | 1980-04-15 |
BE785468A (en) | 1972-10-16 |
DE2231616B2 (en) | 1981-02-05 |
SE7509111L (en) | 1975-08-14 |
SE387186B (en) | 1976-08-30 |
DE2231616C3 (en) | 1981-10-01 |
NL7208841A (en) | 1973-01-02 |
FR2143837B1 (en) | 1974-12-27 |
JPS5147586B1 (en) | 1976-12-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |