GB1374009A - Information storage - Google Patents

Information storage

Info

Publication number
GB1374009A
GB1374009A GB2941972A GB2941972A GB1374009A GB 1374009 A GB1374009 A GB 1374009A GB 2941972 A GB2941972 A GB 2941972A GB 2941972 A GB2941972 A GB 2941972A GB 1374009 A GB1374009 A GB 1374009A
Authority
GB
United Kingdom
Prior art keywords
storage
electrode
semi
layer
polycrystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2941972A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1374009A publication Critical patent/GB1374009A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/495Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Non-Volatile Memory (AREA)

Abstract

1374009 Semi-conductor memory elements INTERNATIONAL BUSINESS MACHINES CORP 23 June 1972 [9 Aug 1971] 29419/72 Heading H1K Binary information is represented by the presence or absence of charge stored at the surface of a semi-conductor body 8 beneath a storage electrode 14, the charge being transferred between the storage site and a diffused region 11 forming a PN junction with the body 8 via an inversion channel induced in the body 8 by a potential applied to a gate electrode 16. The region 11 carries an ohmic electrode through which current is carried for reading and writing purposes. Preferably the storage and gate electrodes 14, 16 are capacitively coupled to the body 8 through a silicon oxide layer 28 and an overlying layer 30 of silicon nitride, aluminium oxide, titanium dioxide or phosphosilicate glass. As shown the gate electrode 16 comprises doped polycrystalline Si and the storage electrode 14 comprises a metal layer, the electrodes 14, 16 being mutually isolated by a thin oxide layer. In a modification the storage electrode 14 is made of polycrystalline Si while the gate electrode 16 is a metal layer. In a memory array of such elements word, bit and storage potential lines are formed by metal or polycrystalline Si tracks on an insulating layer or by elongate diffused semi-conductor strips. The circuit schematically represented in Fig. 4A, is intended for use in a charge depletion mode, alternative circuitry being described for accumulation mode use.
GB2941972A 1971-08-09 1972-06-23 Information storage Expired GB1374009A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16996171A 1971-08-09 1971-08-09

Publications (1)

Publication Number Publication Date
GB1374009A true GB1374009A (en) 1974-11-13

Family

ID=22617925

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2941972A Expired GB1374009A (en) 1971-08-09 1972-06-23 Information storage

Country Status (10)

Country Link
JP (1) JPS5314351B2 (en)
AR (1) AR200242A1 (en)
BR (2) BR7205403D0 (en)
CH (1) CH534939A (en)
DE (1) DE2236510C3 (en)
FR (1) FR2148581B1 (en)
GB (1) GB1374009A (en)
IT (1) IT963412B (en)
NL (1) NL7209890A (en)
SE (1) SE384756B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2705757A1 (en) * 1976-02-13 1977-08-18 Tokyo Shibaura Electric Co RAM

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES404184A1 (en) * 1971-07-06 1975-06-01 Ibm A cellular disposal of casual access memory for digital calculators. (Machine-translation by Google Translate, not legally binding)
DE2441385C3 (en) * 1974-08-29 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Method for increasing the read signal in a one-transistor memory element
JPS51147226A (en) * 1975-06-13 1976-12-17 Nec Corp Semiconductor memory device
JPS5811103B2 (en) * 1975-11-07 1983-03-01 株式会社日立製作所 hand tie memory
GB1562650A (en) * 1976-11-18 1980-03-12 Fairchild Camera Instr Co Memory cell for storing charge
EP0003413A3 (en) * 1978-01-19 1979-08-22 Sperry Corporation Improvements relating to semiconductor memories
DE2912858A1 (en) * 1979-03-30 1980-10-09 Siemens Ag LOW RESISTANT PIPE
JPH0782753B2 (en) * 1984-08-31 1995-09-06 三菱電機株式会社 Dynamic memory device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2705757A1 (en) * 1976-02-13 1977-08-18 Tokyo Shibaura Electric Co RAM

Also Published As

Publication number Publication date
CH534939A (en) 1973-03-15
FR2148581B1 (en) 1980-03-21
JPS4826437A (en) 1973-04-07
SE384756B (en) 1976-05-17
FR2148581A1 (en) 1973-03-23
NL7209890A (en) 1973-02-13
JPS5314351B2 (en) 1978-05-17
BR7205394D0 (en) 1973-06-07
AR200242A1 (en) 1974-10-31
DE2236510B2 (en) 1974-05-22
BR7205403D0 (en) 1973-06-07
DE2236510A1 (en) 1973-03-08
IT963412B (en) 1974-01-10
DE2236510C3 (en) 1975-01-23

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee