GB1315647A - Deposition from the vapour phase in vacuo of layers - Google Patents

Deposition from the vapour phase in vacuo of layers

Info

Publication number
GB1315647A
GB1315647A GB529372A GB529372A GB1315647A GB 1315647 A GB1315647 A GB 1315647A GB 529372 A GB529372 A GB 529372A GB 529372 A GB529372 A GB 529372A GB 1315647 A GB1315647 A GB 1315647A
Authority
GB
United Kingdom
Prior art keywords
vapour
deposition
vacuo
layers
feb
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB529372A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of GB1315647A publication Critical patent/GB1315647A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
    • G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
GB529372A 1971-02-10 1972-02-04 Deposition from the vapour phase in vacuo of layers Expired GB1315647A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH199871A CH537987A (de) 1971-02-10 1971-02-10 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten

Publications (1)

Publication Number Publication Date
GB1315647A true GB1315647A (en) 1973-05-02

Family

ID=4223501

Family Applications (1)

Application Number Title Priority Date Filing Date
GB529372A Expired GB1315647A (en) 1971-02-10 1972-02-04 Deposition from the vapour phase in vacuo of layers

Country Status (5)

Country Link
CH (1) CH537987A (enExample)
DE (1) DE2204333A1 (enExample)
FR (1) FR2126761A5 (enExample)
GB (1) GB1315647A (enExample)
NL (1) NL7106221A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004038395A3 (en) * 2002-10-25 2004-10-07 Ct De Rech Public Gabriel Lipp Method and apparatus for in situ depositing of neutral cs under ultra-high vacuum to analytical ends
WO2017050349A1 (en) * 2015-09-21 2017-03-30 Applied Materials, Inc. Measurement assembly for measuring a deposition rate and method therefore
WO2018077388A1 (en) * 2016-10-25 2018-05-03 Applied Materials, Inc. Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH644722A5 (de) * 1980-07-21 1984-08-15 Balzers Hochvakuum Schwingquarzmesskopf.

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004038395A3 (en) * 2002-10-25 2004-10-07 Ct De Rech Public Gabriel Lipp Method and apparatus for in situ depositing of neutral cs under ultra-high vacuum to analytical ends
US7205534B2 (en) 2002-10-25 2007-04-17 Centre De Recherche Public-Gabriel Lippmann Method and apparatus for in situ depositing of neutral Cs under ultra-high vacuum to analytical ends
WO2017050349A1 (en) * 2015-09-21 2017-03-30 Applied Materials, Inc. Measurement assembly for measuring a deposition rate and method therefore
KR20170139674A (ko) * 2015-09-21 2017-12-19 어플라이드 머티어리얼스, 인코포레이티드 증착률을 측정하기 위한 측정 어셈블리 및 이를 위한 방법
TWI628303B (zh) * 2015-09-21 2018-07-01 應用材料股份有限公司 用以測量ㄧ沈積率之測量組件及應用其之蒸發源、沈積設備及方法
KR101940602B1 (ko) 2015-09-21 2019-01-21 어플라이드 머티어리얼스, 인코포레이티드 증착률을 측정하기 위한 측정 어셈블리 및 이를 위한 방법
WO2018077388A1 (en) * 2016-10-25 2018-05-03 Applied Materials, Inc. Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor

Also Published As

Publication number Publication date
FR2126761A5 (enExample) 1972-10-06
DE2204333A1 (de) 1972-08-17
NL7106221A (enExample) 1972-08-14
CH537987A (de) 1973-06-15

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees