NL7106221A - - Google Patents
Info
- Publication number
- NL7106221A NL7106221A NL7106221A NL7106221A NL7106221A NL 7106221 A NL7106221 A NL 7106221A NL 7106221 A NL7106221 A NL 7106221A NL 7106221 A NL7106221 A NL 7106221A NL 7106221 A NL7106221 A NL 7106221A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH199871A CH537987A (de) | 1971-02-10 | 1971-02-10 | Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7106221A true NL7106221A (enExample) | 1972-08-14 |
Family
ID=4223501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7106221A NL7106221A (enExample) | 1971-02-10 | 1971-05-06 |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH537987A (enExample) |
| DE (1) | DE2204333A1 (enExample) |
| FR (1) | FR2126761A5 (enExample) |
| GB (1) | GB1315647A (enExample) |
| NL (1) | NL7106221A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH644722A5 (de) * | 1980-07-21 | 1984-08-15 | Balzers Hochvakuum | Schwingquarzmesskopf. |
| EP1554566B1 (en) | 2002-10-25 | 2007-08-01 | Centre de Recherche Public - Gabriel Lippmann | Method and apparatus for in situ depositing of neutral cs under ultra-high vacuum to analytical ends |
| JP2018529014A (ja) * | 2015-09-21 | 2018-10-04 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 堆積速度を測定するための測定アセンブリ及びその方法 |
| JP2018538429A (ja) * | 2016-10-25 | 2018-12-27 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 堆積速度を測定するための測定アセンブリ、蒸発源、堆積装置及びそのための方法 |
-
1971
- 1971-02-10 CH CH199871A patent/CH537987A/de not_active IP Right Cessation
- 1971-05-06 NL NL7106221A patent/NL7106221A/xx unknown
-
1972
- 1972-01-31 DE DE19722204333 patent/DE2204333A1/de active Pending
- 1972-02-04 GB GB529372A patent/GB1315647A/en not_active Expired
- 1972-02-08 FR FR7204062A patent/FR2126761A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2126761A5 (enExample) | 1972-10-06 |
| CH537987A (de) | 1973-06-15 |
| DE2204333A1 (de) | 1972-08-17 |
| GB1315647A (en) | 1973-05-02 |