CH537987A - Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten - Google Patents

Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten

Info

Publication number
CH537987A
CH537987A CH199871A CH199871A CH537987A CH 537987 A CH537987 A CH 537987A CH 199871 A CH199871 A CH 199871A CH 199871 A CH199871 A CH 199871A CH 537987 A CH537987 A CH 537987A
Authority
CH
Switzerland
Prior art keywords
thin layers
during vacuum
vapor deposition
monitoring vapor
vacuum deposition
Prior art date
Application number
CH199871A
Other languages
English (en)
Inventor
K Dr Pulker Hans
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH199871A priority Critical patent/CH537987A/de
Priority to NL7106221A priority patent/NL7106221A/xx
Priority to DE19722204333 priority patent/DE2204333A1/de
Priority to GB529372A priority patent/GB1315647A/en
Priority to FR7204062A priority patent/FR2126761A5/fr
Publication of CH537987A publication Critical patent/CH537987A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
    • G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
CH199871A 1971-02-10 1971-02-10 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten CH537987A (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CH199871A CH537987A (de) 1971-02-10 1971-02-10 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten
NL7106221A NL7106221A (de) 1971-02-10 1971-05-06
DE19722204333 DE2204333A1 (de) 1971-02-10 1972-01-31 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten
GB529372A GB1315647A (en) 1971-02-10 1972-02-04 Deposition from the vapour phase in vacuo of layers
FR7204062A FR2126761A5 (de) 1971-02-10 1972-02-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH199871A CH537987A (de) 1971-02-10 1971-02-10 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten

Publications (1)

Publication Number Publication Date
CH537987A true CH537987A (de) 1973-06-15

Family

ID=4223501

Family Applications (1)

Application Number Title Priority Date Filing Date
CH199871A CH537987A (de) 1971-02-10 1971-02-10 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten

Country Status (5)

Country Link
CH (1) CH537987A (de)
DE (1) DE2204333A1 (de)
FR (1) FR2126761A5 (de)
GB (1) GB1315647A (de)
NL (1) NL7106221A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH644722A5 (de) * 1980-07-21 1984-08-15 Balzers Hochvakuum Schwingquarzmesskopf.
ATE368849T1 (de) * 2002-10-25 2007-08-15 Ct De Rech Public Gabriel Lipp VERFAHREN UND VORRICHTUNG ZUR ßIN-SITU- DEPONIERUNGß VON NEUTRALEM CS UNTER ULTRAHOCHVAKUUM ZU ANALYTISCHEN ZWECKEN.
EP3274701A1 (de) * 2015-09-21 2018-01-31 Applied Materials, Inc. Messanordnung zur messung einer abscheidungsgeschwindigkeit und verfahren dafür
WO2018077388A1 (en) * 2016-10-25 2018-05-03 Applied Materials, Inc. Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor

Also Published As

Publication number Publication date
FR2126761A5 (de) 1972-10-06
GB1315647A (en) 1973-05-02
DE2204333A1 (de) 1972-08-17
NL7106221A (de) 1972-08-14

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Legal Events

Date Code Title Description
PL Patent ceased