GB1315647A - Deposition from the vapour phase in vacuo of layers - Google Patents
Deposition from the vapour phase in vacuo of layersInfo
- Publication number
- GB1315647A GB1315647A GB529372A GB529372A GB1315647A GB 1315647 A GB1315647 A GB 1315647A GB 529372 A GB529372 A GB 529372A GB 529372 A GB529372 A GB 529372A GB 1315647 A GB1315647 A GB 1315647A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vapour
- deposition
- vacuo
- layers
- feb
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000008021 deposition Effects 0.000 title abstract 4
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Abstract
1315647 Vapour deposition apparatus BALZERS PATENT-UND BETEILIGUNGS A G 4 Feb 1972 [10 Feb 1971] 5293/72 Heading C7F The thickness of a vapour deposited coating is controlled by mounting in the vapour deposition chamber 1 a casing 6 having quartz oscillators 8 on a turntable 7 and a rotatable shutter 12 having opening of various sizes between the oscillators and the vapour source. Alternatively a continuously adjustable shutter may be used. By reducing the size of the aperture during deposition, it is stated that a linear calibration graph is obtained.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH199871A CH537987A (en) | 1971-02-10 | 1971-02-10 | Device for monitoring vapor deposition during vacuum deposition of thin layers |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1315647A true GB1315647A (en) | 1973-05-02 |
Family
ID=4223501
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB529372A Expired GB1315647A (en) | 1971-02-10 | 1972-02-04 | Deposition from the vapour phase in vacuo of layers |
Country Status (5)
Country | Link |
---|---|
CH (1) | CH537987A (en) |
DE (1) | DE2204333A1 (en) |
FR (1) | FR2126761A5 (en) |
GB (1) | GB1315647A (en) |
NL (1) | NL7106221A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004038395A2 (en) * | 2002-10-25 | 2004-05-06 | Centre De Recherche Public - Gabriel Lippmann | Method and apparatus for in situ depositing of neutral cs under ultra-high vacuum to analytical ends |
WO2017050349A1 (en) * | 2015-09-21 | 2017-03-30 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate and method therefore |
WO2018077388A1 (en) * | 2016-10-25 | 2018-05-03 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH644722A5 (en) * | 1980-07-21 | 1984-08-15 | Balzers Hochvakuum | SWINGING QUARTZ MEASURING HEAD. |
-
1971
- 1971-02-10 CH CH199871A patent/CH537987A/en not_active IP Right Cessation
- 1971-05-06 NL NL7106221A patent/NL7106221A/xx unknown
-
1972
- 1972-01-31 DE DE19722204333 patent/DE2204333A1/en active Pending
- 1972-02-04 GB GB529372A patent/GB1315647A/en not_active Expired
- 1972-02-08 FR FR7204062A patent/FR2126761A5/fr not_active Expired
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004038395A2 (en) * | 2002-10-25 | 2004-05-06 | Centre De Recherche Public - Gabriel Lippmann | Method and apparatus for in situ depositing of neutral cs under ultra-high vacuum to analytical ends |
WO2004038395A3 (en) * | 2002-10-25 | 2004-10-07 | Ct De Rech Public Gabriel Lipp | Method and apparatus for in situ depositing of neutral cs under ultra-high vacuum to analytical ends |
US7205534B2 (en) | 2002-10-25 | 2007-04-17 | Centre De Recherche Public-Gabriel Lippmann | Method and apparatus for in situ depositing of neutral Cs under ultra-high vacuum to analytical ends |
WO2017050349A1 (en) * | 2015-09-21 | 2017-03-30 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate and method therefore |
KR20170139674A (en) * | 2015-09-21 | 2017-12-19 | 어플라이드 머티어리얼스, 인코포레이티드 | Measurement assembly for measuring deposition rate and method therefor |
TWI628303B (en) * | 2015-09-21 | 2018-07-01 | 應用材料股份有限公司 | Measurement assembly for measuring a deposition rate and evaporation source, deposition apparatus and method using the same |
KR101940602B1 (en) | 2015-09-21 | 2019-01-21 | 어플라이드 머티어리얼스, 인코포레이티드 | Measurement assembly for measuring deposition rate and method therefor |
WO2018077388A1 (en) * | 2016-10-25 | 2018-05-03 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor |
Also Published As
Publication number | Publication date |
---|---|
NL7106221A (en) | 1972-08-14 |
DE2204333A1 (en) | 1972-08-17 |
FR2126761A5 (en) | 1972-10-06 |
CH537987A (en) | 1973-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |