CA994709A - Apparatus for the sputtering deposition of thin films with labyrinth heat exchanger - Google Patents

Apparatus for the sputtering deposition of thin films with labyrinth heat exchanger

Info

Publication number
CA994709A
CA994709A CA160,972A CA160972A CA994709A CA 994709 A CA994709 A CA 994709A CA 160972 A CA160972 A CA 160972A CA 994709 A CA994709 A CA 994709A
Authority
CA
Canada
Prior art keywords
heat exchanger
thin films
sputtering deposition
labyrinth heat
labyrinth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA160,972A
Other versions
CA160972S (en
Inventor
Richard E. Govednik
Joseph C. Provenzano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GTE Automatic Electric Laboratories Inc
Original Assignee
GTE Automatic Electric Laboratories Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GTE Automatic Electric Laboratories Inc filed Critical GTE Automatic Electric Laboratories Inc
Application granted granted Critical
Publication of CA994709A publication Critical patent/CA994709A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CA160,972A 1972-01-24 1973-01-10 Apparatus for the sputtering deposition of thin films with labyrinth heat exchanger Expired CA994709A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22024272A 1972-01-24 1972-01-24

Publications (1)

Publication Number Publication Date
CA994709A true CA994709A (en) 1976-08-10

Family

ID=22822709

Family Applications (1)

Application Number Title Priority Date Filing Date
CA160,972A Expired CA994709A (en) 1972-01-24 1973-01-10 Apparatus for the sputtering deposition of thin films with labyrinth heat exchanger

Country Status (2)

Country Link
US (1) US3748253A (en)
CA (1) CA994709A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3945911A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Cathodes for sputter-coating glass sheets or other substrates
US3976555A (en) * 1975-03-20 1976-08-24 Coulter Information Systems, Inc. Method and apparatus for supplying background gas in a sputtering chamber
DE3587369D1 (en) * 1984-01-28 1993-07-01 Philips Patentverwaltung DEVICE FOR COATING A SUBSTRATE BY MEANS OF PLASMA-CHEMICAL VAPOR DEPOSITION OR CATHODE SPRAYING AND METHOD THEREFORE.
DE3427587A1 (en) * 1984-07-26 1986-02-06 Leybold-Heraeus GmbH, 5000 Köln SPRAYING DEVICE FOR CATODE SPRAYING SYSTEMS
FR2670218B1 (en) * 1990-12-06 1993-02-05 Innovatique Sa PROCESS FOR TREATING METALS BY DEPOSIT OF MATERIAL, AND FOR CARRYING OUT SAID METHOD.
DE10058769C1 (en) * 2000-11-27 2002-08-14 Singulus Technologies Ag Device for cooling a rotationally symmetrical object
US9127362B2 (en) 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
US8647484B2 (en) * 2005-11-25 2014-02-11 Applied Materials, Inc. Target for sputtering chamber
WO2009048920A1 (en) * 2007-10-10 2009-04-16 Shell Oil Company Systems and methods for making a middle distillate product and lower olefins from a hydrocarbon feedstock

Also Published As

Publication number Publication date
US3748253A (en) 1973-07-24

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