DE2204333A1 - Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten - Google Patents

Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten

Info

Publication number
DE2204333A1
DE2204333A1 DE19722204333 DE2204333A DE2204333A1 DE 2204333 A1 DE2204333 A1 DE 2204333A1 DE 19722204333 DE19722204333 DE 19722204333 DE 2204333 A DE2204333 A DE 2204333A DE 2204333 A1 DE2204333 A1 DE 2204333A1
Authority
DE
Germany
Prior art keywords
quartz
vapor deposition
diaphragm
thin layers
during vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19722204333
Other languages
German (de)
English (en)
Inventor
Hans Dr. Balzers Pulker, (Liechtenstein)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of DE2204333A1 publication Critical patent/DE2204333A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
    • G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
DE19722204333 1971-02-10 1972-01-31 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten Pending DE2204333A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH199871A CH537987A (de) 1971-02-10 1971-02-10 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten

Publications (1)

Publication Number Publication Date
DE2204333A1 true DE2204333A1 (de) 1972-08-17

Family

ID=4223501

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19722204333 Pending DE2204333A1 (de) 1971-02-10 1972-01-31 Einrichtung zur Überwachung der Aufdampfung beim Vakuumaufdampfen von dünnen Schichten

Country Status (5)

Country Link
CH (1) CH537987A (enExample)
DE (1) DE2204333A1 (enExample)
FR (1) FR2126761A5 (enExample)
GB (1) GB1315647A (enExample)
NL (1) NL7106221A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH644722A5 (de) * 1980-07-21 1984-08-15 Balzers Hochvakuum Schwingquarzmesskopf.
EP1554566B1 (en) 2002-10-25 2007-08-01 Centre de Recherche Public - Gabriel Lippmann Method and apparatus for in situ depositing of neutral cs under ultra-high vacuum to analytical ends
JP2018529014A (ja) * 2015-09-21 2018-10-04 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 堆積速度を測定するための測定アセンブリ及びその方法
JP2018538429A (ja) * 2016-10-25 2018-12-27 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 堆積速度を測定するための測定アセンブリ、蒸発源、堆積装置及びそのための方法

Also Published As

Publication number Publication date
FR2126761A5 (enExample) 1972-10-06
NL7106221A (enExample) 1972-08-14
CH537987A (de) 1973-06-15
GB1315647A (en) 1973-05-02

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