GB1301653A - - Google Patents

Info

Publication number
GB1301653A
GB1301653A GB38069A GB1301653DA GB1301653A GB 1301653 A GB1301653 A GB 1301653A GB 38069 A GB38069 A GB 38069A GB 1301653D A GB1301653D A GB 1301653DA GB 1301653 A GB1301653 A GB 1301653A
Authority
GB
United Kingdom
Prior art keywords
space
getter
sputter
chamber
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB38069A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1301653A publication Critical patent/GB1301653A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
GB38069A 1969-01-02 1969-01-02 Expired GB1301653A (enEXAMPLES)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB38069 1969-01-02
GB5695969 1969-11-20

Publications (1)

Publication Number Publication Date
GB1301653A true GB1301653A (enEXAMPLES) 1973-01-04

Family

ID=26235885

Family Applications (1)

Application Number Title Priority Date Filing Date
GB38069A Expired GB1301653A (enEXAMPLES) 1969-01-02 1969-01-02

Country Status (4)

Country Link
US (1) US3691053A (enEXAMPLES)
DE (1) DE2000054A1 (enEXAMPLES)
FR (1) FR2027696A1 (enEXAMPLES)
GB (1) GB1301653A (enEXAMPLES)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6444099B1 (en) * 1997-05-28 2002-09-03 Anelva Corporation Ionizing sputtering method

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1485266A (en) * 1973-11-20 1977-09-08 Atomic Energy Authority Uk Storage of material
US3904503A (en) * 1974-05-31 1975-09-09 Western Electric Co Depositing material on a substrate using a shield
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus
DE3569265D1 (en) * 1985-01-17 1989-05-11 Ibm Deutschland Process for the production of low-resistance contacts
DE3811599A1 (de) * 1988-04-07 1989-10-19 Battelle Institut E V Vorrichtung zur beschichtung der innenwand eines kunststoff-kraftfahrzeugtanks mit einer sperrschicht
US4961832A (en) * 1989-03-14 1990-10-09 Shagun Vladimir A Apparatus for applying film coatings onto substrates in vacuum
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5223112A (en) * 1991-04-30 1993-06-29 Applied Materials, Inc. Removable shutter apparatus for a semiconductor process chamber
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
CN1561405A (zh) * 2001-09-27 2005-01-05 纳幕尔杜邦公司 用于溅射淀积的双源单腔的方法和设备
US20230037882A1 (en) * 2021-08-06 2023-02-09 Duke University High stability optomechanical system and cryo-package assembly for quantum computing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6444099B1 (en) * 1997-05-28 2002-09-03 Anelva Corporation Ionizing sputtering method

Also Published As

Publication number Publication date
DE2000054A1 (de) 1971-03-04
US3691053A (en) 1972-09-12
FR2027696A1 (enEXAMPLES) 1970-10-02

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees