ES389693A1 - Metodo de deposicion de peliculas. - Google Patents
Metodo de deposicion de peliculas.Info
- Publication number
- ES389693A1 ES389693A1 ES389693A ES389693A ES389693A1 ES 389693 A1 ES389693 A1 ES 389693A1 ES 389693 A ES389693 A ES 389693A ES 389693 A ES389693 A ES 389693A ES 389693 A1 ES389693 A1 ES 389693A1
- Authority
- ES
- Spain
- Prior art keywords
- deposition
- plasma
- extraction
- film deposition
- charged particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2128270A | 1970-03-20 | 1970-03-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES389693A1 true ES389693A1 (es) | 1974-03-01 |
Family
ID=21803338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES389693A Expired ES389693A1 (es) | 1970-03-20 | 1971-03-17 | Metodo de deposicion de peliculas. |
Country Status (5)
Country | Link |
---|---|
DE (1) | DE2113375A1 (es) |
ES (1) | ES389693A1 (es) |
FR (1) | FR2084956A5 (es) |
GB (1) | GB1341759A (es) |
ZA (1) | ZA711702B (es) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0008634B1 (de) * | 1978-07-08 | 1983-03-30 | Wolfgang Kieferle | Verfahren zum Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück und Vorrichtung zur Durchführung desselben |
JPS5957416A (ja) * | 1982-09-27 | 1984-04-03 | Konishiroku Photo Ind Co Ltd | 化合物半導体層の形成方法 |
US4486286A (en) * | 1982-09-28 | 1984-12-04 | Nerken Research Corp. | Method of depositing a carbon film on a substrate and products obtained thereby |
CH664163A5 (de) * | 1985-03-01 | 1988-02-15 | Balzers Hochvakuum | Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden. |
GB2178061B (en) * | 1985-07-01 | 1989-04-26 | Atomic Energy Authority Uk | Coating improvements |
EP0208487A3 (en) * | 1985-07-01 | 1987-08-19 | United Kingdom Atomic Energy Authority | Coating improvements |
US4888202A (en) * | 1986-07-31 | 1989-12-19 | Nippon Telegraph And Telephone Corporation | Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film |
US4822466A (en) * | 1987-06-25 | 1989-04-18 | University Of Houston - University Park | Chemically bonded diamond films and method for producing same |
US4816291A (en) * | 1987-08-19 | 1989-03-28 | The Regents Of The University Of California | Process for making diamond, doped diamond, diamond-cubic boron nitride composite films |
GB2213501A (en) * | 1987-12-11 | 1989-08-16 | Plessey Co Plc | Production of superconducting thin films by ion beam sputtering from a single ceramic target |
US7608151B2 (en) * | 2005-03-07 | 2009-10-27 | Sub-One Technology, Inc. | Method and system for coating sections of internal surfaces |
-
1971
- 1971-03-16 ZA ZA711702A patent/ZA711702B/xx unknown
- 1971-03-17 ES ES389693A patent/ES389693A1/es not_active Expired
- 1971-03-19 FR FR7109878A patent/FR2084956A5/fr not_active Expired
- 1971-03-19 DE DE19712113375 patent/DE2113375A1/de active Pending
- 1971-05-19 GB GB2334371A patent/GB1341759A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2084956A5 (es) | 1971-12-17 |
GB1341759A (en) | 1973-12-25 |
DE2113375A1 (de) | 1971-10-07 |
ZA711702B (en) | 1971-12-29 |
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