JPS51124679A - An ionized plating appatatus - Google Patents

An ionized plating appatatus

Info

Publication number
JPS51124679A
JPS51124679A JP4942675A JP4942675A JPS51124679A JP S51124679 A JPS51124679 A JP S51124679A JP 4942675 A JP4942675 A JP 4942675A JP 4942675 A JP4942675 A JP 4942675A JP S51124679 A JPS51124679 A JP S51124679A
Authority
JP
Japan
Prior art keywords
plating
appatatus
ionized
ionized plating
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4942675A
Other languages
Japanese (ja)
Inventor
Taro Kohama
Kozaburo Shibayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP4942675A priority Critical patent/JPS51124679A/en
Publication of JPS51124679A publication Critical patent/JPS51124679A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:An ionized plating apparatus permitting easy ionization of vapor of metal for plating and capable of producing plating film at high purity with few pinholes.
JP4942675A 1975-04-23 1975-04-23 An ionized plating appatatus Pending JPS51124679A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4942675A JPS51124679A (en) 1975-04-23 1975-04-23 An ionized plating appatatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4942675A JPS51124679A (en) 1975-04-23 1975-04-23 An ionized plating appatatus

Publications (1)

Publication Number Publication Date
JPS51124679A true JPS51124679A (en) 1976-10-30

Family

ID=12830756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4942675A Pending JPS51124679A (en) 1975-04-23 1975-04-23 An ionized plating appatatus

Country Status (1)

Country Link
JP (1) JPS51124679A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0192362A (en) * 1987-10-05 1989-04-11 Nissin Electric Co Ltd Molecular flow generator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0192362A (en) * 1987-10-05 1989-04-11 Nissin Electric Co Ltd Molecular flow generator

Similar Documents

Publication Publication Date Title
MY7100088A (en) Methods of deositing thin films on substrates by means of gas plasmas
JPS51124679A (en) An ionized plating appatatus
JPS526840A (en) Current interception ignition device
JPS5333689A (en) Composite ion source for mass spectrometer
JPS5244174A (en) Plasma treatment device
JPS5337378A (en) Manufacture ofr flat type electron tube
JPS5224990A (en) Ionized vapor forming appratus
JPS51133845A (en) Heat insulator
JPS5283A (en) Metal halide lamp
JPS5287985A (en) Plasma etching method
JPS5223579A (en) Activation reaction evaporating apparatus
JPS51120671A (en) Photomask fault processing method
JPS5210867A (en) Apparatus for forming films in vacuum
JPS527278A (en) Device for timepiece
JPS5216035A (en) Magnetron electric source circuit
AU513714B2 (en) Apparatus for stretching lengths of metal
JPS51117986A (en) Sputtering apparatus
JPS51147324A (en) Solvent for electronic wire resist
JPS51117568A (en) Electron gun for use in electron microscope
JPS5223564A (en) Atmosphere gas purification apparatus
JPS51146183A (en) High frequency wave ion plating device
JPS51141583A (en) Method for producing an electrode for use semiconductor units
JPS5219069A (en) Electrode formation method of semiconductor device
JPS5369979A (en) System for reducing time of consuming smoke
JPS52102999A (en) Ion source device