ZA711702B - Film deposition - Google Patents
Film depositionInfo
- Publication number
- ZA711702B ZA711702B ZA711702A ZA711702A ZA711702B ZA 711702 B ZA711702 B ZA 711702B ZA 711702 A ZA711702 A ZA 711702A ZA 711702 A ZA711702 A ZA 711702A ZA 711702 B ZA711702 B ZA 711702B
- Authority
- ZA
- South Africa
- Prior art keywords
- film deposition
- deposition
- film
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2128270A | 1970-03-20 | 1970-03-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA711702B true ZA711702B (en) | 1971-12-29 |
Family
ID=21803338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA711702A ZA711702B (en) | 1970-03-20 | 1971-03-16 | Film deposition |
Country Status (5)
Country | Link |
---|---|
DE (1) | DE2113375A1 (es) |
ES (1) | ES389693A1 (es) |
FR (1) | FR2084956A5 (es) |
GB (1) | GB1341759A (es) |
ZA (1) | ZA711702B (es) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6040507B2 (ja) * | 1978-07-08 | 1985-09-11 | テルマク・アンラ−ゲンバウ・アクチエンゲゼルシャフト | 誘電性の被加工材料上に金属層或いは合金層を積層させる方法およびこの方法を実施するための装置 |
JPS5957416A (ja) * | 1982-09-27 | 1984-04-03 | Konishiroku Photo Ind Co Ltd | 化合物半導体層の形成方法 |
US4486286A (en) * | 1982-09-28 | 1984-12-04 | Nerken Research Corp. | Method of depositing a carbon film on a substrate and products obtained thereby |
CH664163A5 (de) * | 1985-03-01 | 1988-02-15 | Balzers Hochvakuum | Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden. |
EP0208487A3 (en) * | 1985-07-01 | 1987-08-19 | United Kingdom Atomic Energy Authority | Coating improvements |
EP0207768A3 (en) * | 1985-07-01 | 1987-08-05 | United Kingdom Atomic Energy Authority | Coating improvements |
US4888202A (en) * | 1986-07-31 | 1989-12-19 | Nippon Telegraph And Telephone Corporation | Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film |
US4822466A (en) * | 1987-06-25 | 1989-04-18 | University Of Houston - University Park | Chemically bonded diamond films and method for producing same |
US4816291A (en) * | 1987-08-19 | 1989-03-28 | The Regents Of The University Of California | Process for making diamond, doped diamond, diamond-cubic boron nitride composite films |
GB2213501A (en) * | 1987-12-11 | 1989-08-16 | Plessey Co Plc | Production of superconducting thin films by ion beam sputtering from a single ceramic target |
US7608151B2 (en) * | 2005-03-07 | 2009-10-27 | Sub-One Technology, Inc. | Method and system for coating sections of internal surfaces |
-
1971
- 1971-03-16 ZA ZA711702A patent/ZA711702B/xx unknown
- 1971-03-17 ES ES389693A patent/ES389693A1/es not_active Expired
- 1971-03-19 FR FR7109878A patent/FR2084956A5/fr not_active Expired
- 1971-03-19 DE DE19712113375 patent/DE2113375A1/de active Pending
- 1971-05-19 GB GB2334371A patent/GB1341759A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2113375A1 (de) | 1971-10-07 |
GB1341759A (en) | 1973-12-25 |
ES389693A1 (es) | 1974-03-01 |
FR2084956A5 (es) | 1971-12-17 |
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