GB1250653A - - Google Patents

Info

Publication number
GB1250653A
GB1250653A GB1250653DA GB1250653A GB 1250653 A GB1250653 A GB 1250653A GB 1250653D A GB1250653D A GB 1250653DA GB 1250653 A GB1250653 A GB 1250653A
Authority
GB
United Kingdom
Prior art keywords
planes
solution
rate
attack
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1250653A publication Critical patent/GB1250653A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/69—Etching of wafers, substrates or parts of devices using masks for semiconductor materials
    • H10P50/691—Etching of wafers, substrates or parts of devices using masks for semiconductor materials for Group V materials or Group III-V materials
    • H10P50/693—Etching of wafers, substrates or parts of devices using masks for semiconductor materials for Group V materials or Group III-V materials characterised by their size, orientation, disposition, behaviour or shape, in horizontal or vertical plane
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/60—Wet etching
    • H10P50/64—Wet etching of semiconductor materials
    • H10P50/642—Chemical etching
    • H10P50/644—Anisotropic liquid etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/115—Orientation

Landscapes

  • Weting (AREA)
GB1250653D 1967-11-01 1968-11-01 Expired GB1250653A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US67981867A 1967-11-01 1967-11-01

Publications (1)

Publication Number Publication Date
GB1250653A true GB1250653A (https=) 1971-10-20

Family

ID=24728489

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1250653D Expired GB1250653A (https=) 1967-11-01 1968-11-01

Country Status (7)

Country Link
US (1) US3506509A (https=)
BE (1) BE723234A (https=)
FR (1) FR96065E (https=)
GB (1) GB1250653A (https=)
MY (1) MY7300448A (https=)
NL (1) NL152115B (https=)
SE (1) SE353185B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0944114A3 (de) * 1998-03-18 2000-02-23 SIEMENS SOLAR GmbH Verfahren zum nasschemischen pyramidalen Texturätzen von Siliziumoberflächen

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770533A (en) * 1971-07-02 1973-11-06 Philips Corp Method of producing high resolution patterns in single crystals
US3909325A (en) * 1974-06-28 1975-09-30 Motorola Inc Polycrystalline etch
US4137123A (en) * 1975-12-31 1979-01-30 Motorola, Inc. Texture etching of silicon: method
US4859280A (en) * 1986-12-01 1989-08-22 Harris Corporation Method of etching silicon by enhancing silicon etching capability of alkali hydroxide through the addition of positive valence impurity ions
US4810557A (en) * 1988-03-03 1989-03-07 American Telephone And Telegraph Company, At&T Bell Laboratories Method of making an article comprising a tandem groove, and article produced by the method
US4918030A (en) * 1989-03-31 1990-04-17 Electric Power Research Institute Method of forming light-trapping surface for photovoltaic cell and resulting structure
DE3920644C1 (https=) * 1989-06-23 1990-12-20 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5431777A (en) * 1992-09-17 1995-07-11 International Business Machines Corporation Methods and compositions for the selective etching of silicon
US6326689B1 (en) * 1999-07-26 2001-12-04 Stmicroelectronics, Inc. Backside contact for touchchip
WO2007129555A1 (ja) * 2006-05-02 2007-11-15 Mimasu Semiconductor Industry Co., Ltd. 半導体基板の製造方法、ソーラー用半導体基板及びエッチング液

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL105904C (https=) * 1955-12-30
US3041226A (en) * 1958-04-02 1962-06-26 Hughes Aircraft Co Method of preparing semiconductor crystals
US3425879A (en) * 1965-10-24 1969-02-04 Texas Instruments Inc Method of making shaped epitaxial deposits

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0944114A3 (de) * 1998-03-18 2000-02-23 SIEMENS SOLAR GmbH Verfahren zum nasschemischen pyramidalen Texturätzen von Siliziumoberflächen
US6451218B1 (en) 1998-03-18 2002-09-17 Siemens Solar Gmbh Method for the wet chemical pyramidal texture etching of silicon surfaces

Also Published As

Publication number Publication date
MY7300448A (en) 1973-12-31
US3506509A (en) 1970-04-14
DE1806225A1 (de) 1971-01-28
BE723234A (https=) 1969-04-01
DE1806225B2 (de) 1972-08-24
SE353185B (https=) 1973-01-22
FR96065E (fr) 1972-05-19
NL152115B (nl) 1977-01-17
NL6815372A (https=) 1969-05-05

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee