GB1242839A - Etching glass - Google Patents

Etching glass

Info

Publication number
GB1242839A
GB1242839A GB2284570A GB2284570A GB1242839A GB 1242839 A GB1242839 A GB 1242839A GB 2284570 A GB2284570 A GB 2284570A GB 2284570 A GB2284570 A GB 2284570A GB 1242839 A GB1242839 A GB 1242839A
Authority
GB
United Kingdom
Prior art keywords
glass
etching
aluminium
layer
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2284570A
Inventor
Paul Denham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB2284570A priority Critical patent/GB1242839A/en
Publication of GB1242839A publication Critical patent/GB1242839A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105After-treatment
    • H01L21/311Etching the insulating layers by chemical or physical means
    • H01L21/31105Etching inorganic layers
    • H01L21/31111Etching inorganic layers by chemical means
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)

Abstract

1,242,839. Etching. STANDARD TELEPHONES & CABLES Ltd. 12 May, 1970, No. 22845/70. Heading B6J. [Also in Division C1] Phosphorus glass is etched through an aluminium mask. The etchant may be buffered hydrofluoric acid solution. The mask may be formed by etching away portions of an aluminium layer provided on the glass. The aluminium layer may be masked with photoresist. The glass may be provided as a layer on a silicon slice intended for use as a semi-conductor device. Those portions of the aluminium layer which remain after etching of the glass are removed with phosphonic acid or sodium hydroxide.
GB2284570A 1970-05-12 1970-05-12 Etching glass Expired GB1242839A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2284570A GB1242839A (en) 1970-05-12 1970-05-12 Etching glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2284570A GB1242839A (en) 1970-05-12 1970-05-12 Etching glass

Publications (1)

Publication Number Publication Date
GB1242839A true GB1242839A (en) 1971-08-11

Family

ID=10185978

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2284570A Expired GB1242839A (en) 1970-05-12 1970-05-12 Etching glass

Country Status (1)

Country Link
GB (1) GB1242839A (en)

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