GB1337626A - Photosensitive etching solution especially for etching silicon- containing coatings of semi-conductor devices - Google Patents

Photosensitive etching solution especially for etching silicon- containing coatings of semi-conductor devices

Info

Publication number
GB1337626A
GB1337626A GB472671A GB472671A GB1337626A GB 1337626 A GB1337626 A GB 1337626A GB 472671 A GB472671 A GB 472671A GB 472671 A GB472671 A GB 472671A GB 1337626 A GB1337626 A GB 1337626A
Authority
GB
United Kingdom
Prior art keywords
semi
etching
containing coatings
conductor devices
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB472671A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to GB1267190D priority Critical patent/GB1267190A/en
Publication of GB1337626A publication Critical patent/GB1337626A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0041—Photosensitive materials providing an etching agent upon exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Weting (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Materials For Photolithography (AREA)
  • Silicon Compounds (AREA)

Abstract

1337626 Etching FUJI PHOTO FILM CO Ltd 24 Aug 1971 [25 Aug 1970] 4726/73 Heading B6J The subject-matter is the same as part of that of Specification 1,337,625, but the claims are directed to the etchant.
GB472671A 1970-08-25 1971-02-16 Photosensitive etching solution especially for etching silicon- containing coatings of semi-conductor devices Expired GB1337626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1267190D GB1267190A (en) 1971-02-16 1971-02-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7448870A JPS514752B1 (en) 1970-08-25 1970-08-25

Publications (1)

Publication Number Publication Date
GB1337626A true GB1337626A (en) 1973-11-14

Family

ID=13548708

Family Applications (2)

Application Number Title Priority Date Filing Date
GB472671A Expired GB1337626A (en) 1970-08-25 1971-02-16 Photosensitive etching solution especially for etching silicon- containing coatings of semi-conductor devices
GB3974771A Expired GB1337625A (en) 1970-08-25 1971-08-21 Etching of coatings containing a silicon compound especially for semiconductor devices

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB3974771A Expired GB1337625A (en) 1970-08-25 1971-08-21 Etching of coatings containing a silicon compound especially for semiconductor devices

Country Status (3)

Country Link
JP (1) JPS514752B1 (en)
DE (1) DE2142174A1 (en)
GB (2) GB1337626A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019191490A1 (en) * 2018-03-29 2019-10-03 Northeastern University Nanoscale etching of light absorbing materials using light and an electron donor solvent
US11313857B2 (en) 2018-04-06 2022-04-26 Northeastern University System and method for identifying and quantifying species with nanopores, using complexes of nanoparticles with carrier particles
US11703476B2 (en) 2019-10-28 2023-07-18 Northeastern University Method and apparatus for sensing a molecule

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0627600U (en) * 1992-09-14 1994-04-12 敏雄 博多 Inverted container

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019191490A1 (en) * 2018-03-29 2019-10-03 Northeastern University Nanoscale etching of light absorbing materials using light and an electron donor solvent
US11073764B2 (en) 2018-03-29 2021-07-27 Northeastern University Nanoscale etching of light absorbing materials using light and an electron donor solvent
US11313857B2 (en) 2018-04-06 2022-04-26 Northeastern University System and method for identifying and quantifying species with nanopores, using complexes of nanoparticles with carrier particles
US11703476B2 (en) 2019-10-28 2023-07-18 Northeastern University Method and apparatus for sensing a molecule

Also Published As

Publication number Publication date
JPS514752B1 (en) 1976-02-14
GB1337625A (en) 1973-11-14
DE2142174A1 (en) 1972-03-02

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees