GB1250138A - - Google Patents

Info

Publication number
GB1250138A
GB1250138A GB1250138DA GB1250138A GB 1250138 A GB1250138 A GB 1250138A GB 1250138D A GB1250138D A GB 1250138DA GB 1250138 A GB1250138 A GB 1250138A
Authority
GB
United Kingdom
Prior art keywords
conductor
silicon dioxide
conductors
heading
spreads
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1250138A publication Critical patent/GB1250138A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/69215—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material being a silicon oxide, e.g. SiO2
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/02—Contacts, special
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/043—Dual dielectric
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/118—Oxide films

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Inorganic Insulating Materials (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Insulating Bodies (AREA)
  • Semiconductor Integrated Circuits (AREA)
GB1250138D 1969-08-04 1970-07-06 Expired GB1250138A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84715369A 1969-08-04 1969-08-04

Publications (1)

Publication Number Publication Date
GB1250138A true GB1250138A (https=) 1971-10-20

Family

ID=25299906

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1250138D Expired GB1250138A (https=) 1969-08-04 1970-07-06

Country Status (5)

Country Link
US (1) US3663277A (https=)
JP (1) JPS4923633B1 (https=)
DE (1) DE2038109B2 (https=)
FR (1) FR2056469A5 (https=)
GB (1) GB1250138A (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103045A (en) * 1972-07-31 1978-07-25 Rhone-Poulenc, S.A. Process for improving the adhesion of coatings made of photoresistant polymers to surfaces of inorganic oxides
US3868723A (en) * 1973-06-29 1975-02-25 Ibm Integrated circuit structure accommodating via holes
JPS535342A (en) * 1976-07-02 1978-01-18 Hitachi Ltd Ignition device for internal combustion engine
JPS5425178A (en) * 1977-07-27 1979-02-24 Fujitsu Ltd Manufacture for semiconductor device
US4172907A (en) * 1977-12-29 1979-10-30 Honeywell Information Systems Inc. Method of protecting bumped semiconductor chips
JPS5564468U (https=) * 1979-11-21 1980-05-02
US4630090A (en) * 1984-09-25 1986-12-16 Texas Instruments Incorporated Mercury cadmium telluride infrared focal plane devices having step insulator and process for making same
CA2009518C (en) * 1990-02-07 2000-10-17 Luc Ouellet Spin-on glass processing technique for the fabrication of semiconductor device
US5334415A (en) * 1992-09-21 1994-08-02 Compaq Computer Corporation Method and apparatus for film coated passivation of ink channels in ink jet printhead
US6153080A (en) * 1997-01-31 2000-11-28 Elisha Technologies Co Llc Electrolytic process for forming a mineral
US6599643B2 (en) 1997-01-31 2003-07-29 Elisha Holding Llc Energy enhanced process for treating a conductive surface and products formed thereby
WO1998033960A1 (en) * 1997-01-31 1998-08-06 Elisha Technologies Co. L.L.C. An electrolytic process for forming a mineral containing coating
US6322687B1 (en) 1997-01-31 2001-11-27 Elisha Technologies Co Llc Electrolytic process for forming a mineral
US6592738B2 (en) 1997-01-31 2003-07-15 Elisha Holding Llc Electrolytic process for treating a conductive surface and products formed thereby
US6444495B1 (en) * 2001-01-11 2002-09-03 Honeywell International, Inc. Dielectric films for narrow gap-fill applications
US6653718B2 (en) 2001-01-11 2003-11-25 Honeywell International, Inc. Dielectric films for narrow gap-fill applications
US20040188262A1 (en) * 2002-02-05 2004-09-30 Heimann Robert L. Method for treating metallic surfaces and products formed thereby
WO2003066937A2 (en) * 2002-02-05 2003-08-14 Elisha Holding Llc Method for treating metallic surfaces and products formed thereby
US6967172B2 (en) * 2002-07-03 2005-11-22 Honeywell International Inc. Colloidal silica composite films for premetal dielectric applications

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2539410A (en) * 1944-10-06 1951-01-30 Farnsworth Res Corp Method of forming a glass film on metal
BE622794A (https=) * 1961-09-29 1900-01-01

Also Published As

Publication number Publication date
JPS4923633B1 (https=) 1974-06-17
DE2038109B2 (de) 1973-02-08
FR2056469A5 (https=) 1971-05-14
DE2038109A1 (de) 1971-04-22
US3663277A (en) 1972-05-16

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee