GB1192088A - Improvements in and relating to Light-Sensitive Material for the Production of Printing Plates - Google Patents

Improvements in and relating to Light-Sensitive Material for the Production of Printing Plates

Info

Publication number
GB1192088A
GB1192088A GB40097/67A GB4009767A GB1192088A GB 1192088 A GB1192088 A GB 1192088A GB 40097/67 A GB40097/67 A GB 40097/67A GB 4009767 A GB4009767 A GB 4009767A GB 1192088 A GB1192088 A GB 1192088A
Authority
GB
United Kingdom
Prior art keywords
layers
light
sensitive material
sensitive
relating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB40097/67A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1192088A publication Critical patent/GB1192088A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
GB40097/67A 1966-09-02 1967-09-01 Improvements in and relating to Light-Sensitive Material for the Production of Printing Plates Expired GB1192088A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0060162 1966-09-02

Publications (1)

Publication Number Publication Date
GB1192088A true GB1192088A (en) 1970-05-20

Family

ID=7229475

Family Applications (1)

Application Number Title Priority Date Filing Date
GB40097/67A Expired GB1192088A (en) 1966-09-02 1967-09-01 Improvements in and relating to Light-Sensitive Material for the Production of Printing Plates

Country Status (10)

Country Link
US (1) US3522042A (it)
JP (1) JPS5336364B1 (it)
AT (1) AT272381B (it)
BE (1) BE703277A (it)
CH (1) CH481399A (it)
DE (1) DE1522501C3 (it)
GB (1) GB1192088A (it)
NL (1) NL151522B (it)
SE (1) SE311596B (it)
ZA (1) ZA6705261B (it)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100920A1 (en) * 1982-08-11 1984-02-22 Hitachi, Ltd. Photosensitive composition and pattern forming process using same

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1277428A (en) * 1968-11-26 1972-06-14 Agfa Gevaert Light-sensitive materials
US3933499A (en) * 1972-09-11 1976-01-20 Lith-Kem Corporation Printing plate comprising diazo-borofluoride and diazo resin layers
US3899332A (en) * 1972-09-11 1975-08-12 Lith Kem Corp Printing plate and method of making the same
US3836366A (en) * 1972-09-11 1974-09-17 Lith Kem Corp Planographic printing plates and method for their preparation
US3837858A (en) * 1972-09-11 1974-09-24 Lith Kem Corp Printing plate and method of making the same
US4191573A (en) * 1974-10-09 1980-03-04 Fuji Photo Film Co., Ltd. Photosensitive positive image forming process with two photo-sensitive layers
US4104072A (en) * 1977-05-19 1978-08-01 Polychrome Corporation Water developable lithographic printing plate having dual photosensitive layering

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
BE563723A (it) * 1957-01-04
BE620097A (it) * 1958-11-26
US3313626A (en) * 1962-08-01 1967-04-11 Russeli H Whitney Process of making a lithographic printing plate
BE639500A (it) * 1962-12-14

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100920A1 (en) * 1982-08-11 1984-02-22 Hitachi, Ltd. Photosensitive composition and pattern forming process using same

Also Published As

Publication number Publication date
SE311596B (it) 1969-06-16
NL151522B (nl) 1976-11-15
AT272381B (de) 1969-07-10
DE1522501A1 (de) 1969-09-18
NL6711600A (it) 1967-11-27
CH481399A (de) 1969-11-15
ZA6705261B (it)
JPS5336364B1 (it) 1978-10-02
DE1522501C3 (de) 1975-05-07
BE703277A (it) 1968-02-29
DE1522501B2 (de) 1974-09-19
US3522042A (en) 1970-07-28

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLE Entries relating assignments, transmissions, licences in the register of patents
PCNP Patent ceased through non-payment of renewal fee
PCPE Delete 'patent ceased' from journal

Free format text: 4910,PAGE 1150

PE20 Patent expired after termination of 20 years