FR3068509B1 - Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins - Google Patents

Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins Download PDF

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Publication number
FR3068509B1
FR3068509B1 FR1756215A FR1756215A FR3068509B1 FR 3068509 B1 FR3068509 B1 FR 3068509B1 FR 1756215 A FR1756215 A FR 1756215A FR 1756215 A FR1756215 A FR 1756215A FR 3068509 B1 FR3068509 B1 FR 3068509B1
Authority
FR
France
Prior art keywords
weight
passivation layer
chemical composition
content
relative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1756215A
Other languages
English (en)
French (fr)
Other versions
FR3068509A1 (fr
Inventor
Christian PIZZETTI
Marine CAZES
Jerome Daviot
Nicolas Pialot
Philippe Vernin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Technic France
Original Assignee
Technic France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1756215A priority Critical patent/FR3068509B1/fr
Application filed by Technic France filed Critical Technic France
Priority to TW107122599A priority patent/TWI776909B/zh
Priority to KR1020207002493A priority patent/KR102617800B1/ko
Priority to US16/616,089 priority patent/US11075073B2/en
Priority to CN201880043734.4A priority patent/CN110892511A/zh
Priority to JP2020522793A priority patent/JP7206269B2/ja
Priority to MYPI2019006445A priority patent/MY205007A/en
Priority to PCT/FR2018/051607 priority patent/WO2019002789A1/fr
Priority to EP18749844.9A priority patent/EP3646371B1/fr
Publication of FR3068509A1 publication Critical patent/FR3068509A1/fr
Application granted granted Critical
Publication of FR3068509B1 publication Critical patent/FR3068509B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02—Inorganic compounds ; Elemental compounds
    • C11D3/04—Water-soluble compounds
    • C11D3/042—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/20—Organic compounds containing oxygen
    • C11D3/2075—Carboxylic acids-salts thereof
    • C11D3/2079—Monocarboxylic acids-salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/34—Organic compounds containing sulfur
    • C11D3/3409—Alkyl -, alkenyl -, cycloalkyl - or terpene sulfates or sulfonates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts
    • G03F7/063—Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
    • H10P70/234—
    • H10P70/273—
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Detergent Compositions (AREA)
FR1756215A 2017-06-30 2017-06-30 Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins Active FR3068509B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1756215A FR3068509B1 (fr) 2017-06-30 2017-06-30 Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins
KR1020207002493A KR102617800B1 (ko) 2017-06-30 2018-06-29 결정질 물질의 표면에서 비결정질 부동태화 층을 제거하기 위한 세정용 화학적 조성물
US16/616,089 US11075073B2 (en) 2017-06-30 2018-06-29 Cleaning chemical composition for the removal of an amorphous passivation layer at the surface of crystalline materials
CN201880043734.4A CN110892511A (zh) 2017-06-30 2018-06-29 用于除去晶体材料表面的非晶钝化层的化学清洁组合物
TW107122599A TWI776909B (zh) 2017-06-30 2018-06-29 用於移除位於結晶材料表面上的非晶形鈍化層之清洗化學組成物
JP2020522793A JP7206269B2 (ja) 2017-06-30 2018-06-29 結晶材料の表面における非晶質パッシベーション層を除去するための洗浄化学組成物
MYPI2019006445A MY205007A (en) 2017-06-30 2018-06-29 Cleaning chemical composition for the removal of an amorphous passivation layer at the surface of crystalline materials
PCT/FR2018/051607 WO2019002789A1 (fr) 2017-06-30 2018-06-29 Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de matériaux cristallins
EP18749844.9A EP3646371B1 (fr) 2017-06-30 2018-06-29 Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1756215 2017-06-30
FR1756215A FR3068509B1 (fr) 2017-06-30 2017-06-30 Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins

Publications (2)

Publication Number Publication Date
FR3068509A1 FR3068509A1 (fr) 2019-01-04
FR3068509B1 true FR3068509B1 (fr) 2020-02-28

Family

ID=60182676

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1756215A Active FR3068509B1 (fr) 2017-06-30 2017-06-30 Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins

Country Status (9)

Country Link
US (1) US11075073B2 (enExample)
EP (1) EP3646371B1 (enExample)
JP (1) JP7206269B2 (enExample)
KR (1) KR102617800B1 (enExample)
CN (1) CN110892511A (enExample)
FR (1) FR3068509B1 (enExample)
MY (1) MY205007A (enExample)
TW (1) TWI776909B (enExample)
WO (1) WO2019002789A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210317389A1 (en) * 2020-04-14 2021-10-14 William Quan Chemical product for rapid removal of food burned on to the surfaces of cooktops

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6064437A (ja) * 1983-09-20 1985-04-13 Toshiba Corp 鉛系パツシベ−シヨンガラスのエツチング液
US6296714B1 (en) * 1997-01-16 2001-10-02 Mitsubishi Materials Silicon Corporation Washing solution of semiconductor substrate and washing method using the same
CA2544209C (en) * 2003-10-28 2011-10-18 Sachem, Inc. Cleaning solutions and etchants and methods for using same
KR100660863B1 (ko) * 2005-04-12 2006-12-26 삼성전자주식회사 세정액 및 이를 이용한 반도체 소자의 금속 패턴 형성 방법
CN101356629B (zh) 2005-11-09 2012-06-06 高级技术材料公司 用于将其上具有低k介电材料的半导体晶片再循环的组合物和方法
JP4642001B2 (ja) * 2006-10-24 2011-03-02 関東化学株式会社 フォトレジスト残渣及びポリマー残渣除去液組成物
US20100124713A1 (en) * 2008-11-17 2010-05-20 Xerox Corporation Toners including carbon nanotubes dispersed in a polymer matrix
US8431516B2 (en) * 2009-10-24 2013-04-30 Wai Mun Lee Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid
BR112014014222A2 (pt) * 2011-12-13 2017-06-13 Ecolab Usa Inc métodos e composições para lavagem de louças comerciais concentrados
US9058976B2 (en) * 2012-11-06 2015-06-16 International Business Machines Corporation Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof
JP2015005660A (ja) 2013-06-21 2015-01-08 東京エレクトロン株式会社 酸化タンタル膜の除去方法および除去装置
KR101700636B1 (ko) * 2015-04-17 2017-01-31 재원산업 주식회사 접착제 제거용 조성물 및 이를 이용한 박형 웨이퍼의 제조방법
GB2554635A (en) * 2016-08-03 2018-04-11 Northwick Park Institute For Medical Res Ltd Bioreactors and methods for processing biological material
WO2018061582A1 (ja) * 2016-09-29 2018-04-05 富士フイルム株式会社 処理液および積層体の処理方法

Also Published As

Publication number Publication date
EP3646371A1 (fr) 2020-05-06
JP7206269B2 (ja) 2023-01-17
FR3068509A1 (fr) 2019-01-04
WO2019002789A1 (fr) 2019-01-03
MY205007A (en) 2024-09-27
KR20200026258A (ko) 2020-03-10
EP3646371B1 (fr) 2021-04-14
KR102617800B1 (ko) 2023-12-27
US11075073B2 (en) 2021-07-27
JP2020526046A (ja) 2020-08-27
TWI776909B (zh) 2022-09-11
CN110892511A (zh) 2020-03-17
TW201905240A (zh) 2019-02-01
US20200335326A1 (en) 2020-10-22

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