FR2900226B1 - Four de traitement ou analogue - Google Patents

Four de traitement ou analogue

Info

Publication number
FR2900226B1
FR2900226B1 FR0651455A FR0651455A FR2900226B1 FR 2900226 B1 FR2900226 B1 FR 2900226B1 FR 0651455 A FR0651455 A FR 0651455A FR 0651455 A FR0651455 A FR 0651455A FR 2900226 B1 FR2900226 B1 FR 2900226B1
Authority
FR
France
Prior art keywords
processing oven
oven
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR0651455A
Other languages
English (en)
Other versions
FR2900226A1 (fr
Inventor
Laurent Lanvin
Philippe Jouannard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Safran Landing Systems SAS
Original Assignee
Messier Bugatti SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Messier Bugatti SA filed Critical Messier Bugatti SA
Priority to FR0651455A priority Critical patent/FR2900226B1/fr
Priority to US11/738,532 priority patent/US20070256639A1/en
Priority to JP2009507056A priority patent/JP5567332B2/ja
Priority to MX2008013643A priority patent/MX2008013643A/es
Priority to PCT/EP2007/053973 priority patent/WO2007122225A1/fr
Priority to AU2007242730A priority patent/AU2007242730B2/en
Priority to BRPI0711411-7A priority patent/BRPI0711411A2/pt
Priority to RU2008143663/02A priority patent/RU2421544C2/ru
Priority to KR1020087028502A priority patent/KR20080111154A/ko
Priority to UAA200812518A priority patent/UA94098C2/ru
Priority to CA002649986A priority patent/CA2649986A1/fr
Priority to CNA2007101047077A priority patent/CN101063195A/zh
Priority to TW096114641A priority patent/TW200746876A/zh
Priority to EP07106956A priority patent/EP1849889A1/fr
Publication of FR2900226A1 publication Critical patent/FR2900226A1/fr
Priority to IL194837A priority patent/IL194837A0/en
Application granted granted Critical
Publication of FR2900226B1 publication Critical patent/FR2900226B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Furnace Details (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FR0651455A 2006-04-25 2006-04-25 Four de traitement ou analogue Active FR2900226B1 (fr)

Priority Applications (15)

Application Number Priority Date Filing Date Title
FR0651455A FR2900226B1 (fr) 2006-04-25 2006-04-25 Four de traitement ou analogue
US11/738,532 US20070256639A1 (en) 2006-04-25 2007-04-23 Process furnance or the like
UAA200812518A UA94098C2 (ru) 2006-04-25 2007-04-24 Технологическая печь и подобное оборудование
PCT/EP2007/053973 WO2007122225A1 (fr) 2006-04-25 2007-04-24 Four de traitement ou similaire
AU2007242730A AU2007242730B2 (en) 2006-04-25 2007-04-24 Process furnace or the like.
BRPI0711411-7A BRPI0711411A2 (pt) 2006-04-25 2007-04-24 forno de processo ou congêneres
RU2008143663/02A RU2421544C2 (ru) 2006-04-25 2007-04-24 Технологическая печь или подобное оборудование
KR1020087028502A KR20080111154A (ko) 2006-04-25 2007-04-24 처리로
JP2009507056A JP5567332B2 (ja) 2006-04-25 2007-04-24 Ｃｖｉ／ｃｖｄ炉
CA002649986A CA2649986A1 (fr) 2006-04-25 2007-04-24 Four de traitement ou similaire
MX2008013643A MX2008013643A (es) 2006-04-25 2007-04-24 Horno de proceso o similar.
CNA2007101047077A CN101063195A (zh) 2006-04-25 2007-04-25 处理用加热炉或者类似装置
TW096114641A TW200746876A (en) 2006-04-25 2007-04-25 Process furnace or the like
EP07106956A EP1849889A1 (fr) 2006-04-25 2007-04-25 Four de traitement ou analogue
IL194837A IL194837A0 (en) 2006-04-25 2008-10-22 Process furnace or the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0651455A FR2900226B1 (fr) 2006-04-25 2006-04-25 Four de traitement ou analogue

Publications (2)

Publication Number Publication Date
FR2900226A1 FR2900226A1 (fr) 2007-10-26
FR2900226B1 true FR2900226B1 (fr) 2017-09-29

Family

ID=37116170

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0651455A Active FR2900226B1 (fr) 2006-04-25 2006-04-25 Four de traitement ou analogue

Country Status (15)

Country Link
US (1) US20070256639A1 (fr)
EP (1) EP1849889A1 (fr)
JP (1) JP5567332B2 (fr)
KR (1) KR20080111154A (fr)
CN (1) CN101063195A (fr)
AU (1) AU2007242730B2 (fr)
BR (1) BRPI0711411A2 (fr)
CA (1) CA2649986A1 (fr)
FR (1) FR2900226B1 (fr)
IL (1) IL194837A0 (fr)
MX (1) MX2008013643A (fr)
RU (1) RU2421544C2 (fr)
TW (1) TW200746876A (fr)
UA (1) UA94098C2 (fr)
WO (1) WO2007122225A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101178046B1 (ko) * 2009-03-23 2012-08-29 한국실리콘주식회사 폴리실리콘 제조용 화학기상증착 반응기
CN102374780A (zh) * 2010-08-12 2012-03-14 北京大方科技有限责任公司 一种平焰炉的结构设计方案
WO2013055921A1 (fr) * 2011-10-12 2013-04-18 Integrated Photovoltaic, Inc. Système de dépôt
CN102534567B (zh) 2012-03-21 2014-01-15 中微半导体设备(上海)有限公司 控制化学气相沉积腔室内的基底加热的装置及方法
FR2993044B1 (fr) * 2012-07-04 2014-08-08 Herakles Dispositif de chargement et installation pour la densification de preformes poreuses tronconiques et empilables
FR2993555B1 (fr) * 2012-07-19 2015-02-20 Herakles Installation d'infiltration chimique en phase vapeur a haute capacite de chargement
CN102889791B (zh) * 2012-09-27 2014-11-19 北京七星华创电子股份有限公司 炉体排风控制装置
CN105862013B (zh) * 2016-06-17 2018-07-06 南京大学 一种应用于小型mocvd系统的高温加热装置
CN107151779B (zh) * 2017-05-27 2019-04-16 西华大学 渗氮可控的零污染离子氮化装置
CN109197927B (zh) * 2018-08-31 2020-12-04 东莞市华美食品有限公司 一种基于物联网控制的食品智能烘烤系统
CN110242969B (zh) * 2019-05-23 2020-12-01 北京科技大学 一种焚硫炉
CN115094402B (zh) * 2022-06-24 2023-04-11 清华大学 一种立式双温区-双通道化学气相沉积设备

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE393967B (sv) * 1974-11-29 1977-05-31 Sateko Oy Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket
FR2594119B1 (fr) * 1986-02-10 1988-06-03 Europ Propulsion Installation pour l'infiltration chimique en phase vapeur d'un materiau refractaire autre que le carbone
US5062386A (en) * 1987-07-27 1991-11-05 Epitaxy Systems, Inc. Induction heated pancake epitaxial reactor
JPH07108836B2 (ja) * 1991-02-01 1995-11-22 株式会社日本生産技術研究所 減圧ｃｖｄ装置
US5536918A (en) * 1991-08-16 1996-07-16 Tokyo Electron Sagami Kabushiki Kaisha Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers
JPH05214540A (ja) * 1992-02-05 1993-08-24 Hitachi Ltd Ｃｖｄ反応のモニタ方法
KR100251873B1 (ko) * 1993-01-21 2000-04-15 마쓰바 구니유키 종형 열처리 장치
FR2714076B1 (fr) * 1993-12-16 1996-03-15 Europ Propulsion Procédé de densification de substrats poreux par infiltration chimique en phase vapeur de carbure de silicium.
US6284312B1 (en) * 1999-02-19 2001-09-04 Gt Equipment Technologies Inc Method and apparatus for chemical vapor deposition of polysilicon
US6228174B1 (en) * 1999-03-26 2001-05-08 Ichiro Takahashi Heat treatment system using ring-shaped radiation heater elements
ATE350508T1 (de) * 2000-02-18 2007-01-15 Gt Solar Inc Cvd-verfahren und -vorrichtung zum abscheiden von polysilizium
US7220312B2 (en) * 2002-03-13 2007-05-22 Micron Technology, Inc. Methods for treating semiconductor substrates
JP4263024B2 (ja) * 2003-06-05 2009-05-13 株式会社ヒューモラボラトリー 炭素薄膜の製造方法および製造装置

Also Published As

Publication number Publication date
KR20080111154A (ko) 2008-12-22
RU2421544C2 (ru) 2011-06-20
TW200746876A (en) 2007-12-16
CA2649986A1 (fr) 2007-11-01
EP1849889A1 (fr) 2007-10-31
WO2007122225A1 (fr) 2007-11-01
AU2007242730B2 (en) 2012-02-23
UA94098C2 (ru) 2011-04-11
BRPI0711411A2 (pt) 2011-11-01
IL194837A0 (en) 2009-08-03
MX2008013643A (es) 2008-11-10
CN101063195A (zh) 2007-10-31
RU2008143663A (ru) 2010-05-27
JP2009534541A (ja) 2009-09-24
FR2900226A1 (fr) 2007-10-26
US20070256639A1 (en) 2007-11-08
AU2007242730A1 (en) 2007-11-01
JP5567332B2 (ja) 2014-08-06

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Effective date: 20120321

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Owner name: MESSIER-BUGATTI-DOWTY, FR

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