UA94098C2 - Технологическая печь и подобное оборудование - Google Patents
Технологическая печь и подобное оборудованиеInfo
- Publication number
- UA94098C2 UA94098C2 UAA200812518A UAA200812518A UA94098C2 UA 94098 C2 UA94098 C2 UA 94098C2 UA A200812518 A UAA200812518 A UA A200812518A UA A200812518 A UAA200812518 A UA A200812518A UA 94098 C2 UA94098 C2 UA 94098C2
- Authority
- UA
- Ukraine
- Prior art keywords
- furnace
- reactive gas
- heating system
- heating
- present
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 abstract 5
- 239000007789 gas Substances 0.000 abstract 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 238000000926 separation method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Furnace Details (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Печь для химической инфильтрации или химического осаждения из газовой фазы содержит внешний кожух (12, 12'), реакционную камеру (14, 14'), нагревательную систему (22) для нагрева по меньшей мере реакционной камеры и систему циркуляций газа-реагента. Между внутренней стороной внешнего кожуха печи и внешней стороной реакционной камеры образовывается первый объем. Другой объем образовывается внутри реакционной камеры. Первый объем, разделенный на первую часть, которая образовывает зону нагрева и в которой размещена нагревательная система, и другую часть, в которой присутствует газ-реагент. Зона нагрева герметически изолирована от газа-реагента в другой части. Печь дополнительно содержит систему (34) циркуляции инертного газа, выполненную и размещенную с возможностью подачи инертного газа в зону нагрева. Об�
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0651455A FR2900226B1 (fr) | 2006-04-25 | 2006-04-25 | Four de traitement ou analogue |
Publications (1)
Publication Number | Publication Date |
---|---|
UA94098C2 true UA94098C2 (ru) | 2011-04-11 |
Family
ID=37116170
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
UAA200812518A UA94098C2 (ru) | 2006-04-25 | 2007-04-24 | Технологическая печь и подобное оборудование |
Country Status (15)
Country | Link |
---|---|
US (1) | US20070256639A1 (ru) |
EP (1) | EP1849889A1 (ru) |
JP (1) | JP5567332B2 (ru) |
KR (1) | KR20080111154A (ru) |
CN (1) | CN101063195A (ru) |
AU (1) | AU2007242730B2 (ru) |
BR (1) | BRPI0711411A2 (ru) |
CA (1) | CA2649986A1 (ru) |
FR (1) | FR2900226B1 (ru) |
IL (1) | IL194837A0 (ru) |
MX (1) | MX2008013643A (ru) |
RU (1) | RU2421544C2 (ru) |
TW (1) | TW200746876A (ru) |
UA (1) | UA94098C2 (ru) |
WO (1) | WO2007122225A1 (ru) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101178046B1 (ko) * | 2009-03-23 | 2012-08-29 | 한국실리콘주식회사 | 폴리실리콘 제조용 화학기상증착 반응기 |
CN102374780A (zh) * | 2010-08-12 | 2012-03-14 | 北京大方科技有限责任公司 | 一种平焰炉的结构设计方案 |
WO2013055967A1 (en) * | 2011-10-12 | 2013-04-18 | Integrated Photovoltaic, Inc. | Photovoltaic substrate |
CN102534567B (zh) * | 2012-03-21 | 2014-01-15 | 中微半导体设备(上海)有限公司 | 控制化学气相沉积腔室内的基底加热的装置及方法 |
FR2993044B1 (fr) * | 2012-07-04 | 2014-08-08 | Herakles | Dispositif de chargement et installation pour la densification de preformes poreuses tronconiques et empilables |
FR2993555B1 (fr) * | 2012-07-19 | 2015-02-20 | Herakles | Installation d'infiltration chimique en phase vapeur a haute capacite de chargement |
CN102889791B (zh) * | 2012-09-27 | 2014-11-19 | 北京七星华创电子股份有限公司 | 炉体排风控制装置 |
CN105862013B (zh) * | 2016-06-17 | 2018-07-06 | 南京大学 | 一种应用于小型mocvd系统的高温加热装置 |
CN107151779B (zh) * | 2017-05-27 | 2019-04-16 | 西华大学 | 渗氮可控的零污染离子氮化装置 |
CN109197927B (zh) * | 2018-08-31 | 2020-12-04 | 东莞市华美食品有限公司 | 一种基于物联网控制的食品智能烘烤系统 |
CN110242969B (zh) * | 2019-05-23 | 2020-12-01 | 北京科技大学 | 一种焚硫炉 |
CN115094402B (zh) * | 2022-06-24 | 2023-04-11 | 清华大学 | 一种立式双温区-双通道化学气相沉积设备 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE393967B (sv) * | 1974-11-29 | 1977-05-31 | Sateko Oy | Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket |
FR2594119B1 (fr) * | 1986-02-10 | 1988-06-03 | Europ Propulsion | Installation pour l'infiltration chimique en phase vapeur d'un materiau refractaire autre que le carbone |
US5062386A (en) * | 1987-07-27 | 1991-11-05 | Epitaxy Systems, Inc. | Induction heated pancake epitaxial reactor |
JPH07108836B2 (ja) * | 1991-02-01 | 1995-11-22 | 株式会社日本生産技術研究所 | 減圧cvd装置 |
US5536918A (en) * | 1991-08-16 | 1996-07-16 | Tokyo Electron Sagami Kabushiki Kaisha | Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers |
JPH05214540A (ja) * | 1992-02-05 | 1993-08-24 | Hitachi Ltd | Cvd反応のモニタ方法 |
US5447294A (en) * | 1993-01-21 | 1995-09-05 | Tokyo Electron Limited | Vertical type heat treatment system |
FR2714076B1 (fr) * | 1993-12-16 | 1996-03-15 | Europ Propulsion | Procédé de densification de substrats poreux par infiltration chimique en phase vapeur de carbure de silicium. |
WO2000049199A1 (en) * | 1999-02-19 | 2000-08-24 | Gt Equipment Technologies Inc. | Method and apparatus for chemical vapor deposition of polysilicon |
US6228174B1 (en) * | 1999-03-26 | 2001-05-08 | Ichiro Takahashi | Heat treatment system using ring-shaped radiation heater elements |
CA2386382A1 (en) * | 2000-02-18 | 2001-08-23 | G.T. Equipment Technologies, Inc. | Method and apparatus for chemical vapor deposition of polysilicon |
US7220312B2 (en) * | 2002-03-13 | 2007-05-22 | Micron Technology, Inc. | Methods for treating semiconductor substrates |
JP4263024B2 (ja) * | 2003-06-05 | 2009-05-13 | 株式会社ヒューモラボラトリー | 炭素薄膜の製造方法および製造装置 |
-
2006
- 2006-04-25 FR FR0651455A patent/FR2900226B1/fr active Active
-
2007
- 2007-04-23 US US11/738,532 patent/US20070256639A1/en not_active Abandoned
- 2007-04-24 MX MX2008013643A patent/MX2008013643A/es active IP Right Grant
- 2007-04-24 UA UAA200812518A patent/UA94098C2/ru unknown
- 2007-04-24 RU RU2008143663/02A patent/RU2421544C2/ru active
- 2007-04-24 CA CA002649986A patent/CA2649986A1/en not_active Abandoned
- 2007-04-24 KR KR1020087028502A patent/KR20080111154A/ko not_active Application Discontinuation
- 2007-04-24 BR BRPI0711411-7A patent/BRPI0711411A2/pt not_active IP Right Cessation
- 2007-04-24 WO PCT/EP2007/053973 patent/WO2007122225A1/en active Application Filing
- 2007-04-24 JP JP2009507056A patent/JP5567332B2/ja not_active Expired - Fee Related
- 2007-04-24 AU AU2007242730A patent/AU2007242730B2/en not_active Ceased
- 2007-04-25 EP EP07106956A patent/EP1849889A1/en not_active Withdrawn
- 2007-04-25 CN CNA2007101047077A patent/CN101063195A/zh active Pending
- 2007-04-25 TW TW096114641A patent/TW200746876A/zh unknown
-
2008
- 2008-10-22 IL IL194837A patent/IL194837A0/en unknown
Also Published As
Publication number | Publication date |
---|---|
FR2900226A1 (fr) | 2007-10-26 |
US20070256639A1 (en) | 2007-11-08 |
JP5567332B2 (ja) | 2014-08-06 |
TW200746876A (en) | 2007-12-16 |
WO2007122225A1 (en) | 2007-11-01 |
CN101063195A (zh) | 2007-10-31 |
JP2009534541A (ja) | 2009-09-24 |
RU2421544C2 (ru) | 2011-06-20 |
AU2007242730B2 (en) | 2012-02-23 |
MX2008013643A (es) | 2008-11-10 |
RU2008143663A (ru) | 2010-05-27 |
BRPI0711411A2 (pt) | 2011-11-01 |
IL194837A0 (en) | 2009-08-03 |
EP1849889A1 (en) | 2007-10-31 |
KR20080111154A (ko) | 2008-12-22 |
AU2007242730A1 (en) | 2007-11-01 |
FR2900226B1 (fr) | 2017-09-29 |
CA2649986A1 (en) | 2007-11-01 |
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