FR2838563B1 - Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille - Google Patents
Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grilleInfo
- Publication number
- FR2838563B1 FR2838563B1 FR0204690A FR0204690A FR2838563B1 FR 2838563 B1 FR2838563 B1 FR 2838563B1 FR 0204690 A FR0204690 A FR 0204690A FR 0204690 A FR0204690 A FR 0204690A FR 2838563 B1 FR2838563 B1 FR 2838563B1
- Authority
- FR
- France
- Prior art keywords
- volatile
- single layer
- electrically programmable
- conductive device
- grid material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000463 material Substances 0.000 title 1
- 239000002356 single layer Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66825—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a floating gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
- H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
- H10B41/60—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates the control gate being a doped region, e.g. single-poly memory cell
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0204690A FR2838563B1 (fr) | 2002-04-15 | 2002-04-15 | Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille |
FR0209454A FR2838554B1 (fr) | 2002-04-15 | 2002-07-25 | Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille, et plan memoire correspondant |
JP2003585189A JP4662529B2 (ja) | 2002-04-15 | 2003-01-31 | 半導体メモリ・デバイス |
US10/511,712 US7333362B2 (en) | 2002-04-15 | 2003-01-31 | Electrically erasable and programmable, non-volatile semiconductor memory device having a single layer of gate material, and corresponding memory plane |
EP03709915A EP1495496B1 (fr) | 2002-04-15 | 2003-01-31 | Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille, et plan memoire correspondant |
AT03709915T ATE449424T1 (de) | 2002-04-15 | 2003-01-31 | Elektrisch löschbare und programmiebare nichtflüchtige halbleiterspeicheranordnung mit einschichtigem gatematerial und entsprechende speicherfläche |
PCT/FR2003/000311 WO2003088366A1 (fr) | 2002-04-15 | 2003-01-31 | Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille, et plan memoire correspondant |
DE60330130T DE60330130D1 (de) | 2002-04-15 | 2003-01-31 | Elektrisch löschbare und programmiebare nichtflüchtige halbleiterspeicheranordnung mit einschichtigem gatematerial und entsprechende speicherfläche |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0204690A FR2838563B1 (fr) | 2002-04-15 | 2002-04-15 | Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2838563A1 FR2838563A1 (fr) | 2003-10-17 |
FR2838563B1 true FR2838563B1 (fr) | 2004-07-09 |
Family
ID=28459844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0204690A Expired - Fee Related FR2838563B1 (fr) | 2002-04-15 | 2002-04-15 | Dispositif semiconducteur de memoire, non volatile, programmable et effacable electriquement, a une seule couche de materiau de grille |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2838563B1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101930982B (zh) * | 2010-07-07 | 2012-04-18 | 中国电子科技集团公司第五十八研究所 | 基于flotox结构的抗辐射eeprom存储单元结构 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2596695B2 (ja) * | 1993-05-07 | 1997-04-02 | インターナショナル・ビジネス・マシーンズ・コーポレイション | Eeprom |
US5761121A (en) * | 1996-10-31 | 1998-06-02 | Programmable Microelectronics Corporation | PMOS single-poly non-volatile memory structure |
US6025625A (en) * | 1999-02-25 | 2000-02-15 | Worldwide Semiconductor Manufacturing Corporation | Single-poly EEPROM cell structure operations and array architecture |
JP2002541669A (ja) * | 1999-03-31 | 2002-12-03 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 不揮発性メモリセルを有する半導体デバイス |
-
2002
- 2002-04-15 FR FR0204690A patent/FR2838563B1/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2838563A1 (fr) | 2003-10-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |
Effective date: 20091231 |