FR2808027B1 - Procede de preparation d'un revetement anti-reflechissant - Google Patents

Procede de preparation d'un revetement anti-reflechissant

Info

Publication number
FR2808027B1
FR2808027B1 FR0106011A FR0106011A FR2808027B1 FR 2808027 B1 FR2808027 B1 FR 2808027B1 FR 0106011 A FR0106011 A FR 0106011A FR 0106011 A FR0106011 A FR 0106011A FR 2808027 B1 FR2808027 B1 FR 2808027B1
Authority
FR
France
Prior art keywords
reflective coating
preparing
substrate
polymer
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0106011A
Other languages
English (en)
Other versions
FR2808027A1 (fr
Inventor
Min Ho Jung
Sung Eun Hong
Jae Chang Jung
Geun Su Lee
Ki Ho Baik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hyundai Electronics Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Industries Co Ltd filed Critical Hyundai Electronics Industries Co Ltd
Publication of FR2808027A1 publication Critical patent/FR2808027A1/fr
Application granted granted Critical
Publication of FR2808027B1 publication Critical patent/FR2808027B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

L'invention concerne un procédé de préparation d'un revêtement anti-réfléchissant sur un substrat, ledit procédé comprenant les étapes de :(a) mélange d'un solvant organique et d'un polymère de revêtement anti-réfléchissant pour obtenir une solution de polymère de revêtement anti-réfléchissant au moins partiellement dissoute;(b) application de ladite solution de polymère de revêtement anti-réfléchissant sur un substrat; et(c) chauffage dudit substrat revêtu pour former un substrat revêtu d'un polymère anti-réfléchissant.
FR0106011A 1999-12-23 2001-05-04 Procede de preparation d'un revetement anti-reflechissant Expired - Fee Related FR2808027B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-1999-0061344A KR100427440B1 (ko) 1999-12-23 1999-12-23 유기 반사방지 화합물 및 그의 제조방법

Publications (2)

Publication Number Publication Date
FR2808027A1 FR2808027A1 (fr) 2001-10-26
FR2808027B1 true FR2808027B1 (fr) 2006-01-20

Family

ID=19628987

Family Applications (2)

Application Number Title Priority Date Filing Date
FR0016962A Expired - Fee Related FR2802935B1 (fr) 1999-12-23 2000-12-22 Polymeres de revetement anti-reflechissant organiques et leur preparation
FR0106011A Expired - Fee Related FR2808027B1 (fr) 1999-12-23 2001-05-04 Procede de preparation d'un revetement anti-reflechissant

Family Applications Before (1)

Application Number Title Priority Date Filing Date
FR0016962A Expired - Fee Related FR2802935B1 (fr) 1999-12-23 2000-12-22 Polymeres de revetement anti-reflechissant organiques et leur preparation

Country Status (10)

Country Link
US (1) US6548613B2 (fr)
JP (1) JP3960750B2 (fr)
KR (1) KR100427440B1 (fr)
CN (1) CN1200014C (fr)
DE (1) DE10063263A1 (fr)
FR (2) FR2802935B1 (fr)
GB (1) GB2357511B (fr)
IT (1) IT1320867B1 (fr)
NL (1) NL1016942C2 (fr)
TW (1) TWI265934B (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100687851B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100574486B1 (ko) * 2000-06-30 2006-04-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721181B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100687850B1 (ko) * 2000-06-30 2007-02-27 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100721182B1 (ko) * 2000-06-30 2007-05-23 주식회사 하이닉스반도체 유기반사방지막 조성물 및 그의 제조방법
KR100480235B1 (ko) * 2002-07-18 2005-04-06 주식회사 하이닉스반도체 유기 반사방지막 조성물 및 이를 이용한 포토레지스트의패턴 형성 방법
US7056826B2 (en) * 2003-01-07 2006-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Method of forming copper interconnects
KR101156973B1 (ko) * 2005-03-02 2012-06-20 주식회사 동진쎄미켐 유기 반사방지막 형성용 유기 중합체 및 이를 포함하는 유기 조성물
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US7666575B2 (en) 2006-10-18 2010-02-23 Az Electronic Materials Usa Corp Antireflective coating compositions
KR100870746B1 (ko) * 2006-11-27 2008-11-26 삼성전자주식회사 패턴 형성 방법 및 이를 이용한 커패시터 제조 방법
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
CN101622296B (zh) 2007-02-27 2013-10-16 Az电子材料美国公司 硅基抗反射涂料组合物
WO2015150508A1 (fr) * 2014-04-04 2015-10-08 Basf Se Compositions aqueuses polymériques
WO2015189095A1 (fr) * 2014-06-13 2015-12-17 Basf Se Polyuréthanes à émission d'aldéhyde réduite
KR102662122B1 (ko) * 2016-06-01 2024-04-30 주식회사 동진쎄미켐 네거티브 톤 현상 공정에 이용되는 유기 반사방지막 형성용 조성물

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3100077A1 (de) 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4822718A (en) 1982-09-30 1989-04-18 Brewer Science, Inc. Light absorbing coating
US5674648A (en) 1984-08-06 1997-10-07 Brewer Science, Inc. Anti-reflective coating
US5525457A (en) 1994-12-09 1996-06-11 Japan Synthetic Rubber Co., Ltd. Reflection preventing film and process for forming resist pattern using the same
DE19516470A1 (de) * 1995-05-05 1996-11-07 Roehm Gmbh Verfahren zur Herstellung von Oximmethacrylaten
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
US5948847A (en) * 1996-12-13 1999-09-07 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic patterning
JP3854367B2 (ja) * 1997-06-04 2006-12-06 Ａｚエレクトロニックマテリアルズ株式会社 光吸収性ポリマー、光吸収膜形成性組成物及び光吸収膜とそれを用いた反射防止膜
US5919599A (en) * 1997-09-30 1999-07-06 Brewer Science, Inc. Thermosetting anti-reflective coatings at deep ultraviolet
JP4053631B2 (ja) * 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 反射防止膜又は光吸収膜用組成物及びこれに用いる重合体
US6190839B1 (en) * 1998-01-15 2001-02-20 Shipley Company, L.L.C. High conformality antireflective coating compositions
KR100363695B1 (ko) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 유기난반사방지중합체및그의제조방법
KR100465864B1 (ko) * 1999-03-15 2005-01-24 주식회사 하이닉스반도체 유기 난반사방지 중합체 및 그의 제조방법
KR100395904B1 (ko) * 1999-04-23 2003-08-27 주식회사 하이닉스반도체 유기 반사방지 중합체 및 그의 제조방법
KR100310252B1 (ko) * 1999-06-22 2001-11-14 박종섭 유기 반사방지 중합체 및 그의 제조방법
KR100355604B1 (ko) * 1999-12-23 2002-10-12 주식회사 하이닉스반도체 난반사 방지막용 중합체와 그 제조방법

Also Published As

Publication number Publication date
FR2802935A1 (fr) 2001-06-29
GB2357511B (en) 2003-04-02
JP2001192422A (ja) 2001-07-17
KR20010057925A (ko) 2001-07-05
GB2357511A (en) 2001-06-27
TWI265934B (en) 2006-11-11
IT1320867B1 (it) 2003-12-10
FR2808027A1 (fr) 2001-10-26
US20010034427A1 (en) 2001-10-25
ITTO20001220A1 (it) 2002-06-22
JP3960750B2 (ja) 2007-08-15
CN1308089A (zh) 2001-08-15
GB0031419D0 (en) 2001-02-07
CN1200014C (zh) 2005-05-04
NL1016942A1 (nl) 2001-06-26
DE10063263A1 (de) 2001-06-28
NL1016942C2 (nl) 2002-05-01
FR2802935B1 (fr) 2003-03-28
KR100427440B1 (ko) 2004-04-17
US6548613B2 (en) 2003-04-15
ITTO20001220A0 (it) 2000-12-22

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Legal Events

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ST Notification of lapse

Effective date: 20160831