FR2741192B1 - Procede de conception et de fabrication de circuits integres et circuits integres realises selon ce procede - Google Patents
Procede de conception et de fabrication de circuits integres et circuits integres realises selon ce procedeInfo
- Publication number
- FR2741192B1 FR2741192B1 FR9609594A FR9609594A FR2741192B1 FR 2741192 B1 FR2741192 B1 FR 2741192B1 FR 9609594 A FR9609594 A FR 9609594A FR 9609594 A FR9609594 A FR 9609594A FR 2741192 B1 FR2741192 B1 FR 2741192B1
- Authority
- FR
- France
- Prior art keywords
- integrated circuits
- procedure
- design
- manufacturing process
- made according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012938 design process Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/923—Active solid-state devices, e.g. transistors, solid-state diodes with means to optimize electrical conductor current carrying capacity, e.g. particular conductor aspect ratio
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Optics & Photonics (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950040800A KR0182006B1 (ko) | 1995-11-10 | 1995-11-10 | 반도체 패키지 장치 및 몰딩물질에 의해 발생하는 기생용량의 산출방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2741192A1 FR2741192A1 (fr) | 1997-05-16 |
FR2741192B1 true FR2741192B1 (fr) | 2001-11-23 |
Family
ID=19433740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9609594A Expired - Fee Related FR2741192B1 (fr) | 1995-11-10 | 1996-07-30 | Procede de conception et de fabrication de circuits integres et circuits integres realises selon ce procede |
Country Status (7)
Country | Link |
---|---|
US (2) | US5808366A (fr) |
JP (1) | JPH09148428A (fr) |
KR (1) | KR0182006B1 (fr) |
CN (1) | CN1134841C (fr) |
FR (1) | FR2741192B1 (fr) |
GB (1) | GB2307101B (fr) |
TW (1) | TW320755B (fr) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0182006B1 (ko) * | 1995-11-10 | 1999-04-15 | 김광호 | 반도체 패키지 장치 및 몰딩물질에 의해 발생하는 기생용량의 산출방법 |
US6752584B2 (en) | 1996-07-15 | 2004-06-22 | Semitool, Inc. | Transfer devices for handling microelectronic workpieces within an environment of a processing machine and methods of manufacturing and using such devices in the processing of microelectronic workpieces |
US6749390B2 (en) | 1997-12-15 | 2004-06-15 | Semitool, Inc. | Integrated tools with transfer devices for handling microelectronic workpieces |
US6921467B2 (en) * | 1996-07-15 | 2005-07-26 | Semitool, Inc. | Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces |
US6749391B2 (en) | 1996-07-15 | 2004-06-15 | Semitool, Inc. | Microelectronic workpiece transfer devices and methods of using such devices in the processing of microelectronic workpieces |
TWI223678B (en) * | 1998-03-20 | 2004-11-11 | Semitool Inc | Process for applying a metal structure to a workpiece, the treated workpiece and a solution for electroplating copper |
US6565729B2 (en) * | 1998-03-20 | 2003-05-20 | Semitool, Inc. | Method for electrochemically depositing metal on a semiconductor workpiece |
US6497801B1 (en) * | 1998-07-10 | 2002-12-24 | Semitool Inc | Electroplating apparatus with segmented anode array |
US6161215A (en) * | 1998-08-31 | 2000-12-12 | Hewlett-Packard Company | Package routing of integrated circuit signals |
US6916412B2 (en) * | 1999-04-13 | 2005-07-12 | Semitool, Inc. | Adaptable electrochemical processing chamber |
US7585398B2 (en) * | 1999-04-13 | 2009-09-08 | Semitool, Inc. | Chambers, systems, and methods for electrochemically processing microfeature workpieces |
EP1194613A4 (fr) * | 1999-04-13 | 2006-08-23 | Semitool Inc | Processeur de pieces comportant une chambre de traitement a ecoulement de fluide de traitement ameliore |
US7020537B2 (en) * | 1999-04-13 | 2006-03-28 | Semitool, Inc. | Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
US7264698B2 (en) * | 1999-04-13 | 2007-09-04 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
US6368475B1 (en) * | 2000-03-21 | 2002-04-09 | Semitool, Inc. | Apparatus for electrochemically processing a microelectronic workpiece |
US7160421B2 (en) * | 1999-04-13 | 2007-01-09 | Semitool, Inc. | Turning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
US7438788B2 (en) * | 1999-04-13 | 2008-10-21 | Semitool, Inc. | Apparatus and methods for electrochemical processing of microelectronic workpieces |
US20030038035A1 (en) * | 2001-05-30 | 2003-02-27 | Wilson Gregory J. | Methods and systems for controlling current in electrochemical processing of microelectronic workpieces |
US7189318B2 (en) * | 1999-04-13 | 2007-03-13 | Semitool, Inc. | Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
US6623609B2 (en) | 1999-07-12 | 2003-09-23 | Semitool, Inc. | Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same |
US6862720B1 (en) * | 1999-10-28 | 2005-03-01 | National Semiconductor Corporation | Interconnect exhibiting reduced parasitic capacitance variation |
US20050183959A1 (en) * | 2000-04-13 | 2005-08-25 | Wilson Gregory J. | Tuning electrodes used in a reactor for electrochemically processing a microelectric workpiece |
US6366131B1 (en) | 2000-05-01 | 2002-04-02 | Hewlett-Packard Company | System and method for increasing a drive signal and decreasing a pin count |
AU2001259504A1 (en) * | 2000-05-24 | 2001-12-03 | Semitool, Inc. | Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece |
US7102763B2 (en) * | 2000-07-08 | 2006-09-05 | Semitool, Inc. | Methods and apparatus for processing microelectronic workpieces using metrology |
US6662091B2 (en) | 2001-06-29 | 2003-12-09 | Battelle Memorial Institute | Diagnostics/prognostics using wireless links |
EP1405044A1 (fr) | 2001-07-02 | 2004-04-07 | Battelle Memorial Institute | Module de microcapteurs intelligents |
KR100396900B1 (ko) * | 2001-12-11 | 2003-09-02 | 삼성전자주식회사 | 반도체 집적 회로의 배선 캐패시턴스 추출 방법 및 이를기록한 기록 매체 |
US6630360B2 (en) | 2002-01-10 | 2003-10-07 | Advanced Micro Devices, Inc. | Advanced process control (APC) of copper thickness for chemical mechanical planarization (CMP) optimization |
US20030159921A1 (en) * | 2002-02-22 | 2003-08-28 | Randy Harris | Apparatus with processing stations for manually and automatically processing microelectronic workpieces |
US6991710B2 (en) * | 2002-02-22 | 2006-01-31 | Semitool, Inc. | Apparatus for manually and automatically processing microelectronic workpieces |
US6893505B2 (en) * | 2002-05-08 | 2005-05-17 | Semitool, Inc. | Apparatus and method for regulating fluid flows, such as flows of electrochemical processing fluids |
US7114903B2 (en) * | 2002-07-16 | 2006-10-03 | Semitool, Inc. | Apparatuses and method for transferring and/or pre-processing microelectronic workpieces |
US20050092611A1 (en) * | 2003-11-03 | 2005-05-05 | Semitool, Inc. | Bath and method for high rate copper deposition |
CN102854398B (zh) * | 2012-08-23 | 2016-12-21 | 上海华虹宏力半导体制造有限公司 | 寄生电容的测量方法以及栅介质层厚度的计算方法 |
US11933863B2 (en) | 2020-07-27 | 2024-03-19 | Changxin Memory Technologies, Inc. | Method for measuring shortest distance between capacitances and method for evaluating capacitance manufacture procedure |
CN114001692B (zh) * | 2020-07-27 | 2023-04-07 | 长鑫存储技术有限公司 | 测量电容之间最短距离的方法及评价电容制程的方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3838442A (en) * | 1970-04-15 | 1974-09-24 | Ibm | Semiconductor structure having metallization inlaid in insulating layers and method for making same |
DE3164742D1 (en) * | 1980-09-22 | 1984-08-16 | Tokyo Shibaura Electric Co | Method of smoothing an insulating layer formed on a semiconductor body |
JPS5877245A (ja) * | 1981-11-02 | 1983-05-10 | Hitachi Ltd | 半導体集積回路装置 |
US4806504A (en) * | 1986-09-11 | 1989-02-21 | Fairchild Semiconductor Corporation | Planarization method |
US4884122A (en) * | 1988-08-05 | 1989-11-28 | General Electric Company | Method and configuration for testing electronic circuits and integrated circuit chips using a removable overlay layer |
JPH0770527B2 (ja) * | 1987-02-27 | 1995-07-31 | アメリカン テレフォン アンド テレグラフ カムパニー | デバイス作製方法 |
US4962063A (en) * | 1988-11-10 | 1990-10-09 | Applied Materials, Inc. | Multistep planarized chemical vapor deposition process with the use of low melting inorganic material for flowing while depositing |
DE68926344T2 (de) * | 1988-11-10 | 1996-09-05 | Applied Materials Inc | Planarisationsmethode für IC-Struktur |
US5068207A (en) * | 1990-04-30 | 1991-11-26 | At&T Bell Laboratories | Method for producing a planar surface in integrated circuit manufacturing |
EP0485086A1 (fr) * | 1990-10-31 | 1992-05-13 | AT&T Corp. | Couches diélectriques pour circuits intégrés |
JPH04237143A (ja) * | 1991-01-22 | 1992-08-25 | Rohm Co Ltd | 論理回路のレイアウトパターン検証方法 |
JPH04342129A (ja) * | 1991-05-17 | 1992-11-27 | Sony Corp | 層間絶縁膜の平坦化方法 |
JPH0828476B2 (ja) * | 1991-06-07 | 1996-03-21 | 富士通株式会社 | 半導体装置及びその製造方法 |
JP2695078B2 (ja) * | 1991-06-10 | 1997-12-24 | 株式会社東芝 | データ処理装置クロック信号の分配方法 |
US5236871A (en) * | 1992-04-29 | 1993-08-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method for producing a hybridization of detector array and integrated circuit for readout |
US5379231A (en) * | 1992-05-29 | 1995-01-03 | University Of Texas System | Method and apparatus for simulating a microelectric interconnect circuit |
JPH07501906A (ja) * | 1992-06-02 | 1995-02-23 | アジレント・テクノロジーズ・インク | マルチレベル相互接続技術のためのコンピュータ支援設計方法及び装置 |
US5500804A (en) * | 1993-12-08 | 1996-03-19 | International Business Machines Corporation | Method to optimize the wiring of multiple wiring media packages |
US5438022A (en) * | 1993-12-14 | 1995-08-01 | At&T Global Information Solutions Company | Method for using low dielectric constant material in integrated circuit fabrication |
JPH08162528A (ja) * | 1994-10-03 | 1996-06-21 | Sony Corp | 半導体装置の層間絶縁膜構造 |
WO1996036921A1 (fr) * | 1995-05-19 | 1996-11-21 | 3Com Corporation | Procede et appareil de liaison entre des bases de donnees de conception assistee par ordinateur et une base de donnees de machine a commande numerique |
US5694344A (en) * | 1995-06-15 | 1997-12-02 | Motorola, Inc. | Method for electrically modeling a semiconductor package |
US6376911B1 (en) * | 1995-08-23 | 2002-04-23 | International Business Machines Corporation | Planarized final passivation for semiconductor devices |
KR0182006B1 (ko) * | 1995-11-10 | 1999-04-15 | 김광호 | 반도체 패키지 장치 및 몰딩물질에 의해 발생하는 기생용량의 산출방법 |
US5761080A (en) * | 1995-11-22 | 1998-06-02 | International Business Machines Corporation | Method and apparatus for modeling capacitance in an integrated circuit |
-
1995
- 1995-11-10 KR KR1019950040800A patent/KR0182006B1/ko not_active IP Right Cessation
-
1996
- 1996-05-10 JP JP8116051A patent/JPH09148428A/ja active Pending
- 1996-07-02 GB GB9613883A patent/GB2307101B/en not_active Expired - Fee Related
- 1996-07-12 TW TW085108471A patent/TW320755B/zh not_active IP Right Cessation
- 1996-07-24 CN CNB961101768A patent/CN1134841C/zh not_active Expired - Lifetime
- 1996-07-30 FR FR9609594A patent/FR2741192B1/fr not_active Expired - Fee Related
- 1996-08-09 US US08/694,541 patent/US5808366A/en not_active Expired - Lifetime
-
1998
- 1998-03-31 US US09/052,249 patent/US6028986A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
TW320755B (fr) | 1997-11-21 |
GB9613883D0 (en) | 1996-09-04 |
US6028986A (en) | 2000-02-22 |
CN1150332A (zh) | 1997-05-21 |
FR2741192A1 (fr) | 1997-05-16 |
CN1134841C (zh) | 2004-01-14 |
KR970030683A (ko) | 1997-06-26 |
GB2307101A (en) | 1997-05-14 |
KR0182006B1 (ko) | 1999-04-15 |
US5808366A (en) | 1998-09-15 |
GB2307101B (en) | 2000-11-22 |
JPH09148428A (ja) | 1997-06-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property |
Owner name: MOSAID TECHNOLOGIES INCORPORATED, CA Effective date: 20111110 |
|
CA | Change of address |
Effective date: 20141021 |
|
CD | Change of name or company name |
Owner name: CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT IN, CA Effective date: 20141021 |
|
ST | Notification of lapse |
Effective date: 20160331 |