FR2708626A1 - Film ultramince transparent et conducteur et procédé pour sa fabrication. - Google Patents
Film ultramince transparent et conducteur et procédé pour sa fabrication.Info
- Publication number
- FR2708626A1 FR2708626A1 FR9409519A FR9409519A FR2708626A1 FR 2708626 A1 FR2708626 A1 FR 2708626A1 FR 9409519 A FR9409519 A FR 9409519A FR 9409519 A FR9409519 A FR 9409519A FR 2708626 A1 FR2708626 A1 FR 2708626A1
- Authority
- FR
- France
- Prior art keywords
- ultra
- production
- conductive film
- thin transparent
- transition metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
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- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Health & Medical Sciences (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing Of Electric Cables (AREA)
- Non-Insulated Conductors (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
Film ultramince transparent et conducteur comprenant un métal de transition, formé sur un substrat, avec une épaisseur de film de 1 à 200 nm. Procédé pour la fabrication de films ultraminces transparents et conducteurs, qui comprend le dépôt en phase vapeur d'au moins un métal de transition vaporisé sur un substrat dans un état excité sous vide, de manière à former un film mince dudit métal de transition.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21092993 | 1993-08-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2708626A1 true FR2708626A1 (fr) | 1995-02-10 |
FR2708626B1 FR2708626B1 (fr) | 1998-06-05 |
Family
ID=16597421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9409519A Expired - Fee Related FR2708626B1 (fr) | 1993-08-02 | 1994-08-01 | Film ultramince transparent et conducteur et procédé pour sa fabrication. |
Country Status (3)
Country | Link |
---|---|
US (2) | US5804255A (fr) |
DE (1) | DE4427215A1 (fr) |
FR (1) | FR2708626B1 (fr) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0978228A (ja) * | 1995-09-18 | 1997-03-25 | Itochu Fine Chem Kk | 薄膜樹脂マトリックスの製造方法 |
DE19900437B4 (de) * | 1999-01-11 | 2009-04-23 | Ehret, Hans-P. | Verfahren und Vorrichtung zur Ionenimplantation in Festkörpern und/oder zur Beschichtung von Festkörperoberflächen sowie die Verwendung von Verfahren und Vorrichtung |
WO2001006218A1 (fr) * | 1999-07-16 | 2001-01-25 | Honeywell Inc. | Pixels de projection de scene ir zrn et hfn haute temperature |
JP4166386B2 (ja) * | 1999-09-30 | 2008-10-15 | 日本碍子株式会社 | 耐蝕性部材およびその製造方法 |
JP3510845B2 (ja) * | 2000-08-29 | 2004-03-29 | Hoya株式会社 | 反射防止膜を有する光学部材 |
CA2355021C (fr) * | 2000-08-29 | 2004-11-02 | Hoya Corporation | Element optique muni d'une pellicule antireflet |
US8817830B2 (en) * | 2002-09-19 | 2014-08-26 | The Uab Research Foundation | Saturable absorbers for Q-switching of middle infrared laser cavaties |
CA2783176C (fr) * | 2001-09-20 | 2014-05-20 | The Uab Research Foundation | Laser a microcircuit fonctionnant dans l'infrarouge moyen: laser zns:cr2+ avec milieu d'absorption saturable |
US7606274B2 (en) * | 2001-09-20 | 2009-10-20 | The Uab Research Foundation | Mid-IR instrument for analyzing a gaseous sample and method for using the same |
CN1795516B (zh) * | 2003-05-26 | 2014-10-22 | 日本曹达株式会社 | 带有透明导电膜的透光性基板 |
US7164104B2 (en) * | 2004-06-14 | 2007-01-16 | Watlow Electric Manufacturing Company | In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same |
EP2317562A1 (fr) * | 2009-11-03 | 2011-05-04 | Fundacio Privada Institut De Ciencies Fotoniques | Électrodes métalliques multicouches pour l'optoélectronique |
US20170175249A1 (en) * | 2015-05-15 | 2017-06-22 | Korea Institute Of Machinery & Materials | Thin metal film substrate and method for preparing the same |
EP3228727A3 (fr) * | 2016-03-30 | 2018-01-24 | HEC High End Coating GmbH | Procédé de fabrication de substrat revêtu, substrat revêtu et son utilisation |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1307642A (en) * | 1969-04-07 | 1973-02-21 | Asahi Glass Co Ltd | Electrically conductive glass articles |
US4109052A (en) * | 1977-05-12 | 1978-08-22 | E. I. Du Pont De Nemours And Company | Electroconductive transparency |
US4320169A (en) * | 1979-08-31 | 1982-03-16 | Teijin Limited | Heat wave-reflective or electrically conductive laminated structure |
US4719152A (en) * | 1984-09-21 | 1988-01-12 | Konishiroku Photo Industry Co., Ltd. | Transparent conductive layer built-up material |
US4886681A (en) * | 1987-01-20 | 1989-12-12 | International Business Machines Corporation | Metal-polymer adhesion by low energy bombardment |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3694337A (en) * | 1971-01-04 | 1972-09-26 | Nippon Sheet Glass Co Ltd | Sputtering method for manufacturing transparent,heat ray reflecting glass |
JPS6115967A (ja) * | 1984-06-29 | 1986-01-24 | Sumitomo Electric Ind Ltd | 表面処理方法 |
JPS61220417A (ja) * | 1985-03-27 | 1986-09-30 | Hitachi Ltd | 半導体装置の製造方法 |
US4971853A (en) * | 1988-05-04 | 1990-11-20 | Syracuse University | Laser directed chemical vapor deposition of transparent metal films |
US5064520A (en) * | 1989-02-15 | 1991-11-12 | Hitachi, Ltd. | Method and apparatus for forming a film |
JPH02225346A (ja) * | 1989-02-27 | 1990-09-07 | Central Glass Co Ltd | 熱線反射ガラス |
JP2564197B2 (ja) * | 1989-08-22 | 1996-12-18 | トヨタ自動車株式会社 | アモルファス金属膜及びその製造方法 |
JP2775647B2 (ja) * | 1989-11-17 | 1998-07-16 | 宇部興産株式会社 | メタライズドポリイミドフィルムの製法 |
US5173354A (en) * | 1990-12-13 | 1992-12-22 | Cornell Research Foundation, Inc. | Non-beading, thin-film, metal-coated ceramic substrate |
DE4130930A1 (de) * | 1991-09-13 | 1993-03-25 | Flachglas Ag | Vorsatzaggregat fuer bildschirme oder dergleichen |
EP0536664B1 (fr) * | 1991-10-07 | 1997-01-15 | Sumitomo Metal Industries, Ltd. | Procédé pour la formation d'une couche mince |
JPH06102401A (ja) * | 1992-09-22 | 1994-04-15 | Matsushita Electric Ind Co Ltd | 反射防止膜の形成方法 |
-
1994
- 1994-08-01 FR FR9409519A patent/FR2708626B1/fr not_active Expired - Fee Related
- 1994-08-01 DE DE4427215A patent/DE4427215A1/de not_active Ceased
-
1996
- 1996-02-29 US US08/608,673 patent/US5804255A/en not_active Expired - Fee Related
- 1996-04-29 US US08/639,710 patent/US5786094A/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1307642A (en) * | 1969-04-07 | 1973-02-21 | Asahi Glass Co Ltd | Electrically conductive glass articles |
US4109052A (en) * | 1977-05-12 | 1978-08-22 | E. I. Du Pont De Nemours And Company | Electroconductive transparency |
US4320169A (en) * | 1979-08-31 | 1982-03-16 | Teijin Limited | Heat wave-reflective or electrically conductive laminated structure |
US4719152A (en) * | 1984-09-21 | 1988-01-12 | Konishiroku Photo Industry Co., Ltd. | Transparent conductive layer built-up material |
US4886681A (en) * | 1987-01-20 | 1989-12-12 | International Business Machines Corporation | Metal-polymer adhesion by low energy bombardment |
Non-Patent Citations (1)
Title |
---|
B. GORANCHEV ETAL: "SOME PROPERTIES OF RF REACTIVELY SPUTTERED MAGNETIC FE-C FILMS", THIN SOLID FILMS, vol. 100, no. 3, February 1983 (1983-02-01), CH, pages 257 - 269, XP002023175 * |
Also Published As
Publication number | Publication date |
---|---|
US5786094A (en) | 1998-07-28 |
DE4427215A1 (de) | 1995-02-23 |
FR2708626B1 (fr) | 1998-06-05 |
US5804255A (en) | 1998-09-08 |
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