FR2708626A1 - Film ultramince transparent et conducteur et procédé pour sa fabrication. - Google Patents

Film ultramince transparent et conducteur et procédé pour sa fabrication.

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Publication number
FR2708626A1
FR2708626A1 FR9409519A FR9409519A FR2708626A1 FR 2708626 A1 FR2708626 A1 FR 2708626A1 FR 9409519 A FR9409519 A FR 9409519A FR 9409519 A FR9409519 A FR 9409519A FR 2708626 A1 FR2708626 A1 FR 2708626A1
Authority
FR
France
Prior art keywords
ultra
production
conductive film
thin transparent
transition metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR9409519A
Other languages
English (en)
Other versions
FR2708626B1 (fr
Inventor
Kiuchi Masato
Chayahara Akiyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIRECTOR GENERAL AGENCY IND
Original Assignee
DIRECTOR GENERAL AGENCY IND
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Filing date
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Application filed by DIRECTOR GENERAL AGENCY IND filed Critical DIRECTOR GENERAL AGENCY IND
Publication of FR2708626A1 publication Critical patent/FR2708626A1/fr
Application granted granted Critical
Publication of FR2708626B1 publication Critical patent/FR2708626B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
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    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
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    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
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    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
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    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
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    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31678Of metal
    • Y10T428/31681Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]

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Abstract

Film ultramince transparent et conducteur comprenant un métal de transition, formé sur un substrat, avec une épaisseur de film de 1 à 200 nm. Procédé pour la fabrication de films ultraminces transparents et conducteurs, qui comprend le dépôt en phase vapeur d'au moins un métal de transition vaporisé sur un substrat dans un état excité sous vide, de manière à former un film mince dudit métal de transition.
FR9409519A 1993-08-02 1994-08-01 Film ultramince transparent et conducteur et procédé pour sa fabrication. Expired - Fee Related FR2708626B1 (fr)

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JP21092993 1993-08-02

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FR2708626A1 true FR2708626A1 (fr) 1995-02-10
FR2708626B1 FR2708626B1 (fr) 1998-06-05

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DE (1) DE4427215A1 (fr)
FR (1) FR2708626B1 (fr)

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JPH0978228A (ja) * 1995-09-18 1997-03-25 Itochu Fine Chem Kk 薄膜樹脂マトリックスの製造方法
DE19900437B4 (de) * 1999-01-11 2009-04-23 Ehret, Hans-P. Verfahren und Vorrichtung zur Ionenimplantation in Festkörpern und/oder zur Beschichtung von Festkörperoberflächen sowie die Verwendung von Verfahren und Vorrichtung
WO2001006218A1 (fr) * 1999-07-16 2001-01-25 Honeywell Inc. Pixels de projection de scene ir zrn et hfn haute temperature
JP4166386B2 (ja) * 1999-09-30 2008-10-15 日本碍子株式会社 耐蝕性部材およびその製造方法
JP3510845B2 (ja) * 2000-08-29 2004-03-29 Hoya株式会社 反射防止膜を有する光学部材
AU756842B2 (en) * 2000-08-29 2003-01-23 Hoya Corporation Optical element having antireflection film
US7606274B2 (en) * 2001-09-20 2009-10-20 The Uab Research Foundation Mid-IR instrument for analyzing a gaseous sample and method for using the same
US8817830B2 (en) * 2002-09-19 2014-08-26 The Uab Research Foundation Saturable absorbers for Q-switching of middle infrared laser cavaties
JP2005504437A (ja) * 2001-09-20 2005-02-10 ユニバーシティ・オブ・アラバマ・アット・バーミンガム・リサーチ・ファウンデーション 中間赤外マイクロチップレーザ:飽和可能吸収体材料を有するZnS:Cr2+レーザ
JP4538410B2 (ja) * 2003-05-26 2010-09-08 日本曹達株式会社 透明導電膜付透光性基板の製造方法
US7164104B2 (en) * 2004-06-14 2007-01-16 Watlow Electric Manufacturing Company In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
EP2317562A1 (fr) * 2009-11-03 2011-05-04 Fundacio Privada Institut De Ciencies Fotoniques Électrodes métalliques multicouches pour l'optoélectronique
KR101712597B1 (ko) * 2015-05-15 2017-03-08 한국기계연구원 금속 박막 기판 및 이의 제조방법
EP3225717A1 (fr) * 2016-03-30 2017-10-04 HEC High End Coating GmbH Procede de fabrication de substrat revetu, substrat revetu et son utilisation

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US4109052A (en) * 1977-05-12 1978-08-22 E. I. Du Pont De Nemours And Company Electroconductive transparency
US4320169A (en) * 1979-08-31 1982-03-16 Teijin Limited Heat wave-reflective or electrically conductive laminated structure
US4719152A (en) * 1984-09-21 1988-01-12 Konishiroku Photo Industry Co., Ltd. Transparent conductive layer built-up material
US4886681A (en) * 1987-01-20 1989-12-12 International Business Machines Corporation Metal-polymer adhesion by low energy bombardment

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JPS61220417A (ja) * 1985-03-27 1986-09-30 Hitachi Ltd 半導体装置の製造方法
US4971853A (en) * 1988-05-04 1990-11-20 Syracuse University Laser directed chemical vapor deposition of transparent metal films
US5064520A (en) * 1989-02-15 1991-11-12 Hitachi, Ltd. Method and apparatus for forming a film
JPH02225346A (ja) * 1989-02-27 1990-09-07 Central Glass Co Ltd 熱線反射ガラス
JP2564197B2 (ja) * 1989-08-22 1996-12-18 トヨタ自動車株式会社 アモルファス金属膜及びその製造方法
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GB1307642A (en) * 1969-04-07 1973-02-21 Asahi Glass Co Ltd Electrically conductive glass articles
US4109052A (en) * 1977-05-12 1978-08-22 E. I. Du Pont De Nemours And Company Electroconductive transparency
US4320169A (en) * 1979-08-31 1982-03-16 Teijin Limited Heat wave-reflective or electrically conductive laminated structure
US4719152A (en) * 1984-09-21 1988-01-12 Konishiroku Photo Industry Co., Ltd. Transparent conductive layer built-up material
US4886681A (en) * 1987-01-20 1989-12-12 International Business Machines Corporation Metal-polymer adhesion by low energy bombardment

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B. GORANCHEV ETAL: "SOME PROPERTIES OF RF REACTIVELY SPUTTERED MAGNETIC FE-C FILMS", THIN SOLID FILMS, vol. 100, no. 3, February 1983 (1983-02-01), CH, pages 257 - 269, XP002023175 *

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US5804255A (en) 1998-09-08
FR2708626B1 (fr) 1998-06-05
US5786094A (en) 1998-07-28
DE4427215A1 (de) 1995-02-23

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