JP2001003157A5 - - Google Patents

Download PDF

Info

Publication number
JP2001003157A5
JP2001003157A5 JP1999176209A JP17620999A JP2001003157A5 JP 2001003157 A5 JP2001003157 A5 JP 2001003157A5 JP 1999176209 A JP1999176209 A JP 1999176209A JP 17620999 A JP17620999 A JP 17620999A JP 2001003157 A5 JP2001003157 A5 JP 2001003157A5
Authority
JP
Japan
Prior art keywords
optical thin
thin film
niobium
film
mol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999176209A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001003157A (ja
JP4298067B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP17620999A priority Critical patent/JP4298067B2/ja
Priority claimed from JP17620999A external-priority patent/JP4298067B2/ja
Publication of JP2001003157A publication Critical patent/JP2001003157A/ja
Publication of JP2001003157A5 publication Critical patent/JP2001003157A5/ja
Application granted granted Critical
Publication of JP4298067B2 publication Critical patent/JP4298067B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP17620999A 1999-06-23 1999-06-23 光学薄膜の成膜方法 Expired - Lifetime JP4298067B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17620999A JP4298067B2 (ja) 1999-06-23 1999-06-23 光学薄膜の成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17620999A JP4298067B2 (ja) 1999-06-23 1999-06-23 光学薄膜の成膜方法

Publications (3)

Publication Number Publication Date
JP2001003157A JP2001003157A (ja) 2001-01-09
JP2001003157A5 true JP2001003157A5 (fr) 2005-10-20
JP4298067B2 JP4298067B2 (ja) 2009-07-15

Family

ID=16009540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17620999A Expired - Lifetime JP4298067B2 (ja) 1999-06-23 1999-06-23 光学薄膜の成膜方法

Country Status (1)

Country Link
JP (1) JP4298067B2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7655214B2 (en) * 2003-02-26 2010-02-02 Cabot Corporation Phase formation of oxygen reduced valve metal oxides and granulation methods
DE102004049996A1 (de) * 2004-10-14 2006-04-20 Merck Patent Gmbh Aufdampfmaterial zur Herstellung hochbrechender Schichten
JP5284821B2 (ja) * 2008-03-03 2013-09-11 東邦チタニウム株式会社 金属酸化物蒸着材、その製造方法、および金属酸化物蒸着膜の製造方法

Similar Documents

Publication Publication Date Title
WO2004106582A3 (fr) Films et dispositifs de stockage et de conversion d'energie formes par metallisation sous vide physique de titane et d'oxydes de titane et de sous-oxydes
JPS55154565A (en) Surface-covered sintered hard alloy member
KR910006006A (ko) 질화물 함유 화합물의 다중층 피막 및 그의 생성방법
CA2216683A1 (fr) Poudre metallique et procede de fabrication correspondant
JPS6376325A (ja) X線リソグラフィ−用マスクのx線吸収体膜
KR930020174A (ko) 고굴절 광학 코팅물 제조용 증착물질
KR100817107B1 (ko) 박막 증착법을 이용한 컬러 타일 제조 방법
EP0328333A3 (fr) Procédé pour la fabrication de céramiques supraconductrices
EP1176625A3 (fr) Dispositif de pulvérisation
CA2298278A1 (fr) Film multicouches et procede pour sa fabrication
DE60136253D1 (de) Dauer magnet-dünnschicht und hestellungsverfahren
JP2001003157A5 (fr)
JPS6362863A (ja) 金色を呈する物品
GB1408883A (en) Production of tio2-layers by vapour deposition
GB1332878A (en) Method of producing firmly bonded wear-resistant coat9ngs of metal nitride or carbonitride on metal parts
JPH0336260A (ja) 外装品
JPH0499870A (ja) セラミックス被覆材料の製造方法
KR970705158A (ko) 자성박막 및 그 제조방법(magnetic thin film and production method therefor)
JPH02117123A (ja) 電解コンデンサ用陰極材料
JPH0625834A (ja) 気相膜の形成方法
JPH0314904B2 (fr)
JP3548582B2 (ja) 電極箔
JPS5538947A (en) Forming method of metallic compound coating
JPH0234770A (ja) 金色硬質窒化チタン膜の形成方法
JPS5330291A (en) X-ray counter electrode and its production