JP2001003157A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001003157A5 JP2001003157A5 JP1999176209A JP17620999A JP2001003157A5 JP 2001003157 A5 JP2001003157 A5 JP 2001003157A5 JP 1999176209 A JP1999176209 A JP 1999176209A JP 17620999 A JP17620999 A JP 17620999A JP 2001003157 A5 JP2001003157 A5 JP 2001003157A5
- Authority
- JP
- Japan
- Prior art keywords
- optical thin
- thin film
- niobium
- film
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical Effects 0.000 claims 9
- 239000010409 thin film Substances 0.000 claims 9
- ZKATWMILCYLAPD-UHFFFAOYSA-N Niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims 8
- 239000000463 material Substances 0.000 claims 7
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 5
- 229910052758 niobium Inorganic materials 0.000 claims 5
- 239000010955 niobium Substances 0.000 claims 5
- 239000010408 film Substances 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 3
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000001704 evaporation Methods 0.000 claims 2
- 238000005755 formation reaction Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 125000004430 oxygen atoms Chemical group O* 0.000 claims 2
- 230000003635 deoxygenating Effects 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17620999A JP4298067B2 (ja) | 1999-06-23 | 1999-06-23 | 光学薄膜の成膜方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17620999A JP4298067B2 (ja) | 1999-06-23 | 1999-06-23 | 光学薄膜の成膜方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001003157A JP2001003157A (ja) | 2001-01-09 |
JP2001003157A5 true JP2001003157A5 (fr) | 2005-10-20 |
JP4298067B2 JP4298067B2 (ja) | 2009-07-15 |
Family
ID=16009540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17620999A Expired - Lifetime JP4298067B2 (ja) | 1999-06-23 | 1999-06-23 | 光学薄膜の成膜方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4298067B2 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7655214B2 (en) * | 2003-02-26 | 2010-02-02 | Cabot Corporation | Phase formation of oxygen reduced valve metal oxides and granulation methods |
DE102004049996A1 (de) * | 2004-10-14 | 2006-04-20 | Merck Patent Gmbh | Aufdampfmaterial zur Herstellung hochbrechender Schichten |
JP5284821B2 (ja) * | 2008-03-03 | 2013-09-11 | 東邦チタニウム株式会社 | 金属酸化物蒸着材、その製造方法、および金属酸化物蒸着膜の製造方法 |
-
1999
- 1999-06-23 JP JP17620999A patent/JP4298067B2/ja not_active Expired - Lifetime
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2004106582A3 (fr) | Films et dispositifs de stockage et de conversion d'energie formes par metallisation sous vide physique de titane et d'oxydes de titane et de sous-oxydes | |
JPS55154565A (en) | Surface-covered sintered hard alloy member | |
KR910006006A (ko) | 질화물 함유 화합물의 다중층 피막 및 그의 생성방법 | |
CA2216683A1 (fr) | Poudre metallique et procede de fabrication correspondant | |
JPS6376325A (ja) | X線リソグラフィ−用マスクのx線吸収体膜 | |
KR930020174A (ko) | 고굴절 광학 코팅물 제조용 증착물질 | |
KR100817107B1 (ko) | 박막 증착법을 이용한 컬러 타일 제조 방법 | |
EP0328333A3 (fr) | Procédé pour la fabrication de céramiques supraconductrices | |
EP1176625A3 (fr) | Dispositif de pulvérisation | |
CA2298278A1 (fr) | Film multicouches et procede pour sa fabrication | |
DE60136253D1 (de) | Dauer magnet-dünnschicht und hestellungsverfahren | |
JP2001003157A5 (fr) | ||
JPS6362863A (ja) | 金色を呈する物品 | |
GB1408883A (en) | Production of tio2-layers by vapour deposition | |
GB1332878A (en) | Method of producing firmly bonded wear-resistant coat9ngs of metal nitride or carbonitride on metal parts | |
JPH0336260A (ja) | 外装品 | |
JPH0499870A (ja) | セラミックス被覆材料の製造方法 | |
KR970705158A (ko) | 자성박막 및 그 제조방법(magnetic thin film and production method therefor) | |
JPH02117123A (ja) | 電解コンデンサ用陰極材料 | |
JPH0625834A (ja) | 気相膜の形成方法 | |
JPH0314904B2 (fr) | ||
JP3548582B2 (ja) | 電極箔 | |
JPS5538947A (en) | Forming method of metallic compound coating | |
JPH0234770A (ja) | 金色硬質窒化チタン膜の形成方法 | |
JPS5330291A (en) | X-ray counter electrode and its production |