FR2639653B1 - PROCESS FOR LUMINESCENT DISCHARGE DEPOSITION OF MULTIPLE LAYERS OF AMORPHOUS MATERIALS HAVING A VARIABLE COMPOSITION - Google Patents

PROCESS FOR LUMINESCENT DISCHARGE DEPOSITION OF MULTIPLE LAYERS OF AMORPHOUS MATERIALS HAVING A VARIABLE COMPOSITION

Info

Publication number
FR2639653B1
FR2639653B1 FR898915349A FR8915349A FR2639653B1 FR 2639653 B1 FR2639653 B1 FR 2639653B1 FR 898915349 A FR898915349 A FR 898915349A FR 8915349 A FR8915349 A FR 8915349A FR 2639653 B1 FR2639653 B1 FR 2639653B1
Authority
FR
France
Prior art keywords
multiple layers
amorphous materials
variable composition
discharge deposition
luminescent discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR898915349A
Other languages
French (fr)
Other versions
FR2639653A1 (en
Inventor
Dario Della Sala
Ciro Ostrifate
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ENTRICERCHE SpA
Agip SpA
Original Assignee
ENTRICERCHE SpA
Agip SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ENTRICERCHE SpA, Agip SpA filed Critical ENTRICERCHE SpA
Publication of FR2639653A1 publication Critical patent/FR2639653A1/en
Application granted granted Critical
Publication of FR2639653B1 publication Critical patent/FR2639653B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
FR898915349A 1988-11-25 1989-11-22 PROCESS FOR LUMINESCENT DISCHARGE DEPOSITION OF MULTIPLE LAYERS OF AMORPHOUS MATERIALS HAVING A VARIABLE COMPOSITION Expired - Fee Related FR2639653B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8822731A IT1227877B (en) 1988-11-25 1988-11-25 PROCEDURE FOR PLASMA DEPOSITION OF MULTIPLE LAYERS SIZED AMORPHOUS VARIABLE COMPOSITION

Publications (2)

Publication Number Publication Date
FR2639653A1 FR2639653A1 (en) 1990-06-01
FR2639653B1 true FR2639653B1 (en) 1991-06-21

Family

ID=11199778

Family Applications (1)

Application Number Title Priority Date Filing Date
FR898915349A Expired - Fee Related FR2639653B1 (en) 1988-11-25 1989-11-22 PROCESS FOR LUMINESCENT DISCHARGE DEPOSITION OF MULTIPLE LAYERS OF AMORPHOUS MATERIALS HAVING A VARIABLE COMPOSITION

Country Status (12)

Country Link
JP (1) JPH02184023A (en)
BE (1) BE1003603A3 (en)
CH (1) CH677365A5 (en)
DE (1) DE3938956A1 (en)
DK (1) DK562789A (en)
ES (1) ES2019008A6 (en)
FR (1) FR2639653B1 (en)
GB (1) GB2225344B (en)
IT (1) IT1227877B (en)
LU (1) LU87626A1 (en)
NL (1) NL8902779A (en)
SE (1) SE8903769L (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2306510B (en) * 1995-11-02 1999-06-23 Univ Surrey Modification of metal surfaces
US6203898B1 (en) 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4485125A (en) * 1982-03-19 1984-11-27 Energy Conversion Devices, Inc. Method for continuously producing tandem amorphous photovoltaic cells
EP0106637B1 (en) * 1982-10-12 1988-02-17 National Research Development Corporation Infra red transparent optical components
JPS6066422A (en) * 1983-09-21 1985-04-16 Kanegafuchi Chem Ind Co Ltd Manufacture of semiconductor
KR890004881B1 (en) * 1983-10-19 1989-11-30 가부시기가이샤 히다찌세이사꾸쇼 Plasma treating method and device thereof
DE3577730D1 (en) * 1984-03-03 1990-06-21 Stc Plc COATING PROCESS.
US4616597A (en) * 1984-10-31 1986-10-14 Rca Corporation Apparatus for making a plasma coating
US4637895A (en) * 1985-04-01 1987-01-20 Energy Conversion Devices, Inc. Gas mixtures for the vapor deposition of semiconductor material
GB2175016B (en) * 1985-05-11 1990-01-24 Barr & Stroud Ltd Optical coating
US4719123A (en) * 1985-08-05 1988-01-12 Sanyo Electric Co., Ltd. Method for fabricating periodically multilayered film
JP2686928B2 (en) * 1985-08-26 1997-12-08 アンリツ株式会社 Silicon-germanium mixed crystal thin film conductor
JPH0651909B2 (en) * 1985-12-28 1994-07-06 キヤノン株式会社 Method of forming thin film multilayer structure
GB8620346D0 (en) * 1986-08-21 1986-10-01 Special Research Systems Ltd Chemical vapour deposition of films
US4887134A (en) * 1986-09-26 1989-12-12 Canon Kabushiki Kaisha Semiconductor device having a semiconductor region in which either the conduction or valence band remains flat while bandgap is continuously graded
CH668145A5 (en) * 1986-09-26 1988-11-30 Inst Microtechnique De L Unive PROCESS AND INSTALLATION FOR DEPOSITION OF HYDROGEN AMORPHOUS SILICON ON A SUBSTRATE IN A PLASMA ENCLOSURE.
DE58904540D1 (en) * 1988-03-24 1993-07-08 Siemens Ag METHOD AND DEVICE FOR PRODUCING SEMICONDUCTOR LAYERS CONSISTING OF AMORPHOUS SILICON-GERMANIUM ALLOYS BY GLIMMENT CHARGING TECHNOLOGY, ESPECIALLY FOR SOLAR CELLS.

Also Published As

Publication number Publication date
JPH02184023A (en) 1990-07-18
IT8822731A0 (en) 1988-11-25
IT1227877B (en) 1991-05-14
LU87626A1 (en) 1990-06-12
FR2639653A1 (en) 1990-06-01
GB2225344B (en) 1993-01-27
BE1003603A3 (en) 1992-05-05
NL8902779A (en) 1990-06-18
CH677365A5 (en) 1991-05-15
DK562789D0 (en) 1989-11-10
ES2019008A6 (en) 1991-05-16
GB8924713D0 (en) 1989-12-20
DK562789A (en) 1990-05-26
GB2225344A (en) 1990-05-30
SE8903769D0 (en) 1989-11-10
DE3938956A1 (en) 1990-05-31
SE8903769L (en) 1990-05-26

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Legal Events

Date Code Title Description
ST Notification of lapse