FR2623304B1 - Appareil pour projeter par un systeme optique un dessin porte par un premier objet sur un second objet - Google Patents
Appareil pour projeter par un systeme optique un dessin porte par un premier objet sur un second objetInfo
- Publication number
- FR2623304B1 FR2623304B1 FR888816238A FR8816238A FR2623304B1 FR 2623304 B1 FR2623304 B1 FR 2623304B1 FR 888816238 A FR888816238 A FR 888816238A FR 8816238 A FR8816238 A FR 8816238A FR 2623304 B1 FR2623304 B1 FR 2623304B1
- Authority
- FR
- France
- Prior art keywords
- projecting
- optical system
- drawing carried
- carried
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59218571A JPS6198314A (ja) | 1984-10-19 | 1984-10-19 | オ−トフオ−カス機構 |
JP59258562A JPS61136227A (ja) | 1984-12-07 | 1984-12-07 | 投影装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2623304A1 FR2623304A1 (fr) | 1989-05-19 |
FR2623304B1 true FR2623304B1 (fr) | 1992-03-06 |
Family
ID=26522632
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR848419987A Expired - Lifetime FR2572197B1 (fr) | 1984-10-19 | 1984-12-28 | Appareil de projection |
FR888816238A Expired - Lifetime FR2623304B1 (fr) | 1984-10-19 | 1988-12-09 | Appareil pour projeter par un systeme optique un dessin porte par un premier objet sur un second objet |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR848419987A Expired - Lifetime FR2572197B1 (fr) | 1984-10-19 | 1984-12-28 | Appareil de projection |
Country Status (4)
Country | Link |
---|---|
US (1) | US4998821A (fr) |
DE (1) | DE3447488A1 (fr) |
FR (2) | FR2572197B1 (fr) |
GB (1) | GB2166879B (fr) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4864356A (en) * | 1987-04-21 | 1989-09-05 | Brother Kogyo Kabushiki Kaisha | Exposure device for image recording apparatus |
DE3733823A1 (de) * | 1987-10-07 | 1989-04-20 | Zeiss Carl Fa | Verfahren zur kompensation des einflusses von umweltparametern auf die abbildungseigenschaften eines optischen systems |
GB2249189B (en) * | 1990-10-05 | 1994-07-27 | Canon Kk | Exposure apparatus |
JPH05144701A (ja) * | 1991-11-22 | 1993-06-11 | Canon Inc | 投影露光装置及びそれを用いた半導体素子の製造方法 |
US5668589A (en) * | 1992-09-11 | 1997-09-16 | Fuji Photo Film Co., Ltd. | Thermal recording device with controller for correcting laser beam intensity |
US5995263A (en) * | 1993-11-12 | 1999-11-30 | Nikon Corporation | Projection exposure apparatus |
US7365513B1 (en) * | 1994-04-01 | 2008-04-29 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
JP3402850B2 (ja) * | 1995-05-09 | 2003-05-06 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
JP3634068B2 (ja) * | 1995-07-13 | 2005-03-30 | 株式会社ニコン | 露光方法及び装置 |
US6297871B1 (en) | 1995-09-12 | 2001-10-02 | Nikon Corporation | Exposure apparatus |
US6645701B1 (en) | 1995-11-22 | 2003-11-11 | Nikon Corporation | Exposure method and exposure apparatus |
KR100542414B1 (ko) * | 1996-03-27 | 2006-05-10 | 가부시키가이샤 니콘 | 노광장치및공조장치 |
US5870197A (en) * | 1996-10-24 | 1999-02-09 | Nikon Corporation | Precision stage interferometer system with local single air duct |
JP3689510B2 (ja) * | 1996-11-15 | 2005-08-31 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
GB2325528A (en) * | 1997-05-19 | 1998-11-25 | Ahead Optoelectronics Inc | Optical grating generating apparatus |
JP3278407B2 (ja) | 1998-02-12 | 2002-04-30 | キヤノン株式会社 | 投影露光装置及びデバイス製造方法 |
USH1972H1 (en) | 1998-10-06 | 2001-07-03 | Nikon Corporation | Autofocus system using common path interferometry |
US6654095B1 (en) | 1999-10-18 | 2003-11-25 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US6631038B1 (en) | 2000-08-10 | 2003-10-07 | Nikon Corporation | Catadioptric lens barrel structure having a plurality of connecting rods for positioning the lens barrel structure |
US6954255B2 (en) * | 2001-06-15 | 2005-10-11 | Canon Kabushiki Kaisha | Exposure apparatus |
US6934003B2 (en) | 2002-01-07 | 2005-08-23 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
JP2005079455A (ja) * | 2003-09-02 | 2005-03-24 | Toshiba Corp | 半導体装置の製造方法、及び露光システム |
US7352433B2 (en) | 2003-10-28 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4756984B2 (ja) * | 2005-10-07 | 2011-08-24 | キヤノン株式会社 | 露光装置、露光装置の制御方法およびデバイスの製造方法 |
DE102007034942A1 (de) * | 2007-04-05 | 2008-10-16 | Carl Zeiss Sms Gmbh | Vorrichtung zur Vermessung von Substraten |
CN102828166B (zh) * | 2012-08-24 | 2014-07-16 | 京东方科技集团股份有限公司 | 化学气相沉积维修设备 |
DE102013213525B3 (de) * | 2013-07-10 | 2014-08-21 | Carl Zeiss Sms Gmbh | Verfahren zum Kalibrieren eines Positionsmeßsystems und Positionsmeßsystem |
WO2016089449A1 (fr) * | 2014-12-01 | 2016-06-09 | Kla-Tencor Corporation | Appareil et procédé de fourniture d'environnement à régulation d'humidité permettant d'effectuer une mise en contact optique |
CN109219389B (zh) * | 2016-04-22 | 2022-07-12 | 菲特斯津公司 | 使用电子设备进行皮肤分析的系统和方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3722996A (en) * | 1971-01-04 | 1973-03-27 | Electromask Inc | Optical pattern generator or repeating projector or the like |
FR2330030A1 (fr) * | 1975-10-31 | 1977-05-27 | Thomson Csf | Nouvel appareil photorepeteur de masques de haute precision |
US4202623A (en) * | 1979-01-08 | 1980-05-13 | The Perkin-Elmer Corporation | Temperature compensated alignment system |
FR2477298B1 (fr) * | 1980-02-28 | 1987-05-29 | Optimetrix Corp | Positionneur de piece d'ouvrage adressable x-y possedant un detecteur de reperes d'adresse x-y perfectionne |
JPS57169244A (en) * | 1981-04-13 | 1982-10-18 | Canon Inc | Temperature controller for mask and wafer |
DD160756A3 (de) * | 1981-04-24 | 1984-02-29 | Gudrun Dietz | Anordnung zur verbesserung fotochemischer umsetzungsprozesse in fotoresistschichten |
JPS57192929A (en) * | 1981-05-25 | 1982-11-27 | Hitachi Ltd | Projector provided with automatic focusing function |
DE3122027C2 (de) * | 1981-06-03 | 1984-11-29 | Fa. Carl Zeiss, 7920 Heidenheim | Autofokussiereinrichtung für Objektive |
JPS5885338U (ja) * | 1981-12-07 | 1983-06-09 | 株式会社日立製作所 | 自動焦点装置 |
JPS58116735A (ja) * | 1981-12-29 | 1983-07-12 | Canon Inc | 投影焼付方法 |
JPS5999722A (ja) * | 1982-11-29 | 1984-06-08 | Canon Inc | 半導体焼付露光制御方法 |
EP0121969A3 (fr) * | 1983-03-15 | 1988-01-20 | Micronix Partners | Sytème lithographique |
US4690528A (en) * | 1983-10-05 | 1987-09-01 | Nippon Kogaku K. K. | Projection exposure apparatus |
US4669842A (en) * | 1983-12-08 | 1987-06-02 | Canon Kabushiki Kaisha | Projection optical device |
-
1984
- 1984-12-27 DE DE19843447488 patent/DE3447488A1/de active Granted
- 1984-12-28 FR FR848419987A patent/FR2572197B1/fr not_active Expired - Lifetime
- 1984-12-31 GB GB8432820A patent/GB2166879B/en not_active Expired
-
1988
- 1988-07-13 US US07/220,440 patent/US4998821A/en not_active Expired - Lifetime
- 1988-12-09 FR FR888816238A patent/FR2623304B1/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
FR2572197B1 (fr) | 1990-04-20 |
US4998821A (en) | 1991-03-12 |
GB8432820D0 (en) | 1985-02-06 |
GB2166879B (en) | 1989-06-07 |
FR2623304A1 (fr) | 1989-05-19 |
FR2572197A1 (fr) | 1986-04-25 |
DE3447488A1 (de) | 1986-05-07 |
GB2166879A (en) | 1986-05-14 |
DE3447488C2 (fr) | 1993-07-29 |
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