FR2443512A1 - Bain pour le depot sans courant d'etain sur des substrats, procede de mise en oeuvre dudit bain et objets ainsi obtenus - Google Patents
Bain pour le depot sans courant d'etain sur des substrats, procede de mise en oeuvre dudit bain et objets ainsi obtenusInfo
- Publication number
- FR2443512A1 FR2443512A1 FR7924249A FR7924249A FR2443512A1 FR 2443512 A1 FR2443512 A1 FR 2443512A1 FR 7924249 A FR7924249 A FR 7924249A FR 7924249 A FR7924249 A FR 7924249A FR 2443512 A1 FR2443512 A1 FR 2443512A1
- Authority
- FR
- France
- Prior art keywords
- bath
- tin
- objects
- substrates
- implementing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008021 deposition Effects 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 title 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 abstract 2
- 230000003197 catalytic effect Effects 0.000 abstract 1
- 239000003638 chemical reducing agent Substances 0.000 abstract 1
- 238000007323 disproportionation reaction Methods 0.000 abstract 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NLAANVRAGE7811816,A NL184695C (nl) | 1978-12-04 | 1978-12-04 | Bad voor het stroomloos neerslaan van tin op substraten. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2443512A1 true FR2443512A1 (fr) | 1980-07-04 |
| FR2443512B1 FR2443512B1 (cg-RX-API-DMAC7.html) | 1983-11-25 |
Family
ID=19831991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7924249A Granted FR2443512A1 (fr) | 1978-12-04 | 1979-09-28 | Bain pour le depot sans courant d'etain sur des substrats, procede de mise en oeuvre dudit bain et objets ainsi obtenus |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4269625A (cg-RX-API-DMAC7.html) |
| JP (1) | JPS5579864A (cg-RX-API-DMAC7.html) |
| AT (1) | AT364890B (cg-RX-API-DMAC7.html) |
| CA (1) | CA1124008A (cg-RX-API-DMAC7.html) |
| DE (1) | DE2947821A1 (cg-RX-API-DMAC7.html) |
| ES (1) | ES486519A0 (cg-RX-API-DMAC7.html) |
| FI (1) | FI66026C (cg-RX-API-DMAC7.html) |
| FR (1) | FR2443512A1 (cg-RX-API-DMAC7.html) |
| GB (1) | GB2039534B (cg-RX-API-DMAC7.html) |
| IT (1) | IT1126457B (cg-RX-API-DMAC7.html) |
| NL (1) | NL184695C (cg-RX-API-DMAC7.html) |
| SE (1) | SE445744B (cg-RX-API-DMAC7.html) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4508601A (en) * | 1982-09-07 | 1985-04-02 | Toyo Kohan Co., Ltd. | Process for producing a thin tin and zinc plated steel sheet |
| NL8403033A (nl) * | 1984-10-05 | 1986-05-01 | Philips Nv | Werkwijze voor het autokatalytisch vertinnen van voorwerpen van koper of een koperlegering. |
| IL85555A (en) * | 1988-02-25 | 1991-11-21 | Bromine Compounds Ltd | Method and medium for the coating of metals with tin |
| FI95816C (fi) * | 1989-05-04 | 1996-03-25 | Ad Tech Holdings Ltd | Antimikrobinen esine ja menetelmä sen valmistamiseksi |
| DE69327163T2 (de) * | 1992-06-02 | 2000-04-20 | Ibiden Co. Ltd. | Mit loetmetall vorbeschichtete leiterplatte und verfahren zur herstellung |
| US5562950A (en) * | 1994-03-24 | 1996-10-08 | Novamax Technologies, Inc. | Tin coating composition and method |
| DE19653765A1 (de) * | 1996-12-23 | 1998-06-25 | Km Europa Metal Ag | Innen verzinntes Kupferrohr und Verfahren zur Beschichtung eines Kupferrohrs |
| US6645549B1 (en) * | 1999-04-22 | 2003-11-11 | Parlex Corporation | Process for providing bond enhancement and an etch resist in the fabrication of printed circuit boards |
| US6838114B2 (en) * | 2002-05-24 | 2005-01-04 | Micron Technology, Inc. | Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
| US6821347B2 (en) | 2002-07-08 | 2004-11-23 | Micron Technology, Inc. | Apparatus and method for depositing materials onto microelectronic workpieces |
| US6955725B2 (en) | 2002-08-15 | 2005-10-18 | Micron Technology, Inc. | Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
| US6818249B2 (en) * | 2003-03-03 | 2004-11-16 | Micron Technology, Inc. | Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces |
| US7335396B2 (en) | 2003-04-24 | 2008-02-26 | Micron Technology, Inc. | Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers |
| JP2005022956A (ja) * | 2003-07-02 | 2005-01-27 | Rohm & Haas Electronic Materials Llc | セラミックの金属化 |
| US7344755B2 (en) | 2003-08-21 | 2008-03-18 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers |
| US7235138B2 (en) | 2003-08-21 | 2007-06-26 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
| US7422635B2 (en) | 2003-08-28 | 2008-09-09 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
| US7056806B2 (en) | 2003-09-17 | 2006-06-06 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces |
| US7282239B2 (en) * | 2003-09-18 | 2007-10-16 | Micron Technology, Inc. | Systems and methods for depositing material onto microfeature workpieces in reaction chambers |
| US7323231B2 (en) * | 2003-10-09 | 2008-01-29 | Micron Technology, Inc. | Apparatus and methods for plasma vapor deposition processes |
| US7581511B2 (en) | 2003-10-10 | 2009-09-01 | Micron Technology, Inc. | Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
| US7647886B2 (en) * | 2003-10-15 | 2010-01-19 | Micron Technology, Inc. | Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
| US7258892B2 (en) * | 2003-12-10 | 2007-08-21 | Micron Technology, Inc. | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
| US7906393B2 (en) * | 2004-01-28 | 2011-03-15 | Micron Technology, Inc. | Methods for forming small-scale capacitor structures |
| US7584942B2 (en) * | 2004-03-31 | 2009-09-08 | Micron Technology, Inc. | Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers |
| US8133554B2 (en) | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
| US7699932B2 (en) | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
| US7156470B1 (en) * | 2004-06-28 | 2007-01-02 | Wright James P | Wheel trim hub cover |
| US20060237138A1 (en) * | 2005-04-26 | 2006-10-26 | Micron Technology, Inc. | Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes |
| EP1793013B1 (en) * | 2005-12-05 | 2017-07-19 | Rohm and Haas Electronic Materials LLC | Metallization of dielectrics |
| FI123373B (fi) * | 2008-06-06 | 2013-03-15 | Outotec Oyj | Tiivistyslaite |
| FI122225B (fi) | 2009-08-04 | 2011-10-14 | Outotec Oyj | Tiivistyslaite |
| JP5975996B2 (ja) | 2010-09-03 | 2016-08-23 | オーエムジー エレクトロニク ケミカルズ,エルエルシー | 無電解ニッケル合金めっき浴およびそれを析出させる方法 |
| CN102925878B (zh) * | 2012-10-25 | 2014-09-24 | 南京大地冷冻食品有限公司 | 一种常温化学锡镀液 |
| FI124937B (fi) | 2012-12-20 | 2015-03-31 | Outotec Oyj | Tiivistyslaite |
| US10214823B2 (en) | 2013-03-15 | 2019-02-26 | United Technnologies Corporation | Bimetallic zincating processing for enhanced adhesion of aluminum on aluminum alloys |
| US20150101935A1 (en) | 2013-10-14 | 2015-04-16 | United Technologies Corporation | Apparatus and method for ionic liquid electroplating |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1521440B2 (de) * | 1964-06-24 | 1970-11-26 | Verfahren zum Stabilisieren von Bädern für die stromlose reduktive Metallabscheidung. Aren: Photocircuits Corp., Glen Cove, N.Y. (V.St.A.) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US921943A (en) * | 1907-06-27 | 1909-05-18 | Meaker Co | Process for electrically coating with tin or allied metals. |
| CH284092A (de) * | 1950-03-16 | 1952-07-15 | Braunschweiger Huettenwerk Ges | Verfahren zum Verzinnen der Lauffläche von Lagerschalen oder Lagerbüchsen. |
| US2822325A (en) * | 1955-02-11 | 1958-02-04 | Metal & Thermit Corp | Process of, and composition for cleaning and tinning |
| US3072498A (en) * | 1961-02-28 | 1963-01-08 | Texaco Inc | Method of tin plating copper |
| US3274021A (en) * | 1962-04-27 | 1966-09-20 | M & T Chemicals Inc | Stannate coating bath and method of coating aluminum with tin |
| US3637386A (en) * | 1967-05-02 | 1972-01-25 | Philips Corp | Metallizing solution for intensifying layers of metallic, imaged nuclei |
| US3616291A (en) * | 1969-09-16 | 1971-10-26 | Vulcan Materials Co | Stannous solutions containing hydroxy carboxylic acid ions their preparation and their use in plating tin on conductive surfaces particularly on aluminum |
| US3870526A (en) * | 1973-09-20 | 1975-03-11 | Us Army | Electroless deposition of copper and copper-tin alloys |
| JPS54141341A (en) * | 1978-04-26 | 1979-11-02 | Shinko Electric Ind Co | Nonelectrolytic tin plating solution |
-
1978
- 1978-12-04 NL NLAANVRAGE7811816,A patent/NL184695C/xx not_active IP Right Cessation
-
1979
- 1979-09-28 FR FR7924249A patent/FR2443512A1/fr active Granted
- 1979-11-13 US US06/093,484 patent/US4269625A/en not_active Expired - Lifetime
- 1979-11-27 CA CA340,706A patent/CA1124008A/en not_active Expired
- 1979-11-28 DE DE19792947821 patent/DE2947821A1/de active Granted
- 1979-11-30 AT AT0761579A patent/AT364890B/de not_active IP Right Cessation
- 1979-11-30 SE SE7909906A patent/SE445744B/sv not_active IP Right Cessation
- 1979-11-30 GB GB7941506A patent/GB2039534B/en not_active Expired
- 1979-11-30 FI FI793761A patent/FI66026C/fi not_active IP Right Cessation
- 1979-11-30 IT IT27764/79A patent/IT1126457B/it active
- 1979-12-01 JP JP15500079A patent/JPS5579864A/ja active Granted
- 1979-12-01 ES ES486519A patent/ES486519A0/es active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1521440B2 (de) * | 1964-06-24 | 1970-11-26 | Verfahren zum Stabilisieren von Bädern für die stromlose reduktive Metallabscheidung. Aren: Photocircuits Corp., Glen Cove, N.Y. (V.St.A.) |
Also Published As
| Publication number | Publication date |
|---|---|
| IT7927764A0 (it) | 1979-11-30 |
| GB2039534B (en) | 1983-04-13 |
| SE445744B (sv) | 1986-07-14 |
| ATA761579A (de) | 1981-04-15 |
| JPS629670B2 (cg-RX-API-DMAC7.html) | 1987-03-02 |
| GB2039534A (en) | 1980-08-13 |
| FI66026C (fi) | 1984-08-10 |
| NL184695C (nl) | 1989-10-02 |
| IT1126457B (it) | 1986-05-21 |
| FR2443512B1 (cg-RX-API-DMAC7.html) | 1983-11-25 |
| DE2947821C2 (cg-RX-API-DMAC7.html) | 1988-04-21 |
| SE7909906L (sv) | 1980-06-05 |
| CA1124008A (en) | 1982-05-25 |
| NL7811816A (nl) | 1980-06-06 |
| ES8104430A1 (es) | 1981-04-16 |
| NL184695B (nl) | 1989-05-01 |
| AT364890B (de) | 1981-11-25 |
| DE2947821A1 (de) | 1980-06-19 |
| FI66026B (fi) | 1984-04-30 |
| FI793761A7 (fi) | 1980-06-05 |
| JPS5579864A (en) | 1980-06-16 |
| ES486519A0 (es) | 1981-04-16 |
| US4269625A (en) | 1981-05-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |