FR2414565A1 - Procede d'electrodeposition de cuivre - Google Patents

Procede d'electrodeposition de cuivre

Info

Publication number
FR2414565A1
FR2414565A1 FR7900765A FR7900765A FR2414565A1 FR 2414565 A1 FR2414565 A1 FR 2414565A1 FR 7900765 A FR7900765 A FR 7900765A FR 7900765 A FR7900765 A FR 7900765A FR 2414565 A1 FR2414565 A1 FR 2414565A1
Authority
FR
France
Prior art keywords
copper
support
electrodeposition process
copper electrodeposition
copper foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7900765A
Other languages
English (en)
Other versions
FR2414565B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gould Inc
Original Assignee
Gould Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gould Inc filed Critical Gould Inc
Publication of FR2414565A1 publication Critical patent/FR2414565A1/fr
Application granted granted Critical
Publication of FR2414565B1 publication Critical patent/FR2414565B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0147—Carriers and holders
    • H05K2203/0152—Temporary metallic carrier, e.g. for transferring material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0315—Oxidising metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0723—Electroplating, e.g. finish plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0726—Electroforming, i.e. electroplating on a metallic carrier thereby forming a self-supporting structure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

L'invention a pour objet un procédé perfectionné d'électrodéposition de cuivre notamment sur un support temporaire tel qu un support d'aluminium. On soumet la surface du support à un traitement préalable et ensuite on dépose par voie électrolytique une feuille de cuivre en utilisant un seul stade de cuivrage, le bain de revêtement acide contenant des ions cuivre, nitrate et fluorure et pouvant fonctionner à une seule densité de courant. La feuille de cuivre ainsi obtenue peut être utilisée pour la fabrication de circuits imprimés.
FR7900765A 1978-01-16 1979-01-12 Procede d'electrodeposition de cuivre Expired FR2414565B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/869,687 US4169018A (en) 1978-01-16 1978-01-16 Process for electroforming copper foil

Publications (2)

Publication Number Publication Date
FR2414565A1 true FR2414565A1 (fr) 1979-08-10
FR2414565B1 FR2414565B1 (fr) 1985-06-28

Family

ID=25354080

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7900765A Expired FR2414565B1 (fr) 1978-01-16 1979-01-12 Procede d'electrodeposition de cuivre

Country Status (11)

Country Link
US (1) US4169018A (fr)
JP (1) JPS6030751B2 (fr)
BR (1) BR7900244A (fr)
CA (1) CA1167406A (fr)
DE (1) DE2856682C2 (fr)
FR (1) FR2414565B1 (fr)
GB (1) GB2012307B (fr)
IT (1) IT1114330B (fr)
LU (1) LU80788A1 (fr)
NL (1) NL185528C (fr)
SE (1) SE446348B (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4468293A (en) * 1982-03-05 1984-08-28 Olin Corporation Electrochemical treatment of copper for improving its bond strength
US4515671A (en) * 1983-01-24 1985-05-07 Olin Corporation Electrochemical treatment of copper for improving its bond strength
US4530739A (en) * 1984-03-09 1985-07-23 Energy Conversion Devices, Inc. Method of fabricating an electroplated substrate
US4565607A (en) * 1984-03-09 1986-01-21 Energy Conversion Devices, Inc. Method of fabricating an electroplated substrate
US5403465A (en) * 1990-05-30 1995-04-04 Gould Inc. Electrodeposited copper foil and process for making same using electrolyte solutions having controlled additions of chloride ions and organic additives
ATE151474T1 (de) * 1990-05-30 1997-04-15 Gould Electronics Inc Elektroplattierte kupferfolie und deren herstellung unter verwendung elektrolytischer lösungen mit niedrigen konzentrationen von chlor ionen
US5431803A (en) * 1990-05-30 1995-07-11 Gould Electronics Inc. Electrodeposited copper foil and process for making same
US5527998A (en) * 1993-10-22 1996-06-18 Sheldahl, Inc. Flexible multilayer printed circuit boards and methods of manufacture
KR0157889B1 (ko) * 1995-07-24 1999-02-01 문정환 선택적 구리 증착방법
MY138743A (en) 1996-05-13 2009-07-31 Mitsui Mining & Smelting Co High tensile strength electrodeposited copper foil and the production process of the same
WO1998036107A1 (fr) * 1997-02-14 1998-08-20 Dover Industrial Chrome, Inc. Dispositif et procede de placage
SG101924A1 (en) * 1998-10-19 2004-02-27 Mitsui Mining & Smelting Co Composite material used in making printed wiring boards
EP0996318B1 (fr) * 1998-10-19 2006-04-19 Mitsui Mining & Smelting Co., Ltd. Nouvelle feuille composite, procédé de sa production et laminé revêtu de cuivre
SG100612A1 (en) * 1998-10-21 2003-12-26 Mitsui Mining & Smelting Co Novel composite foil, process for producing the same and copper-clad laminate
US6224737B1 (en) 1999-08-19 2001-05-01 Taiwan Semiconductor Manufacturing Company Method for improvement of gap filling capability of electrochemical deposition of copper
US6354916B1 (en) * 2000-02-11 2002-03-12 Nu Tool Inc. Modified plating solution for plating and planarization and process utilizing same
US6350364B1 (en) 2000-02-18 2002-02-26 Taiwan Semiconductor Manufacturing Company Method for improvement of planarity of electroplated copper
EP1225253A1 (fr) * 2001-01-22 2002-07-24 DSL Dresden Material-Innovation GmbH Pocédé continu d'électroformage de bande pour électrodes de pile et mandrin utilisé dans ce procédé d'électroformage
US6893742B2 (en) * 2001-02-15 2005-05-17 Olin Corporation Copper foil with low profile bond enhancement
US7132158B2 (en) * 2003-10-22 2006-11-07 Olin Corporation Support layer for thin copper foil
EP1897973A1 (fr) * 2006-09-07 2008-03-12 Enthone, Inc. Dépôt d'un polymère conducteur et métallisation de substrats non conducteurs
US8366901B2 (en) 2006-09-07 2013-02-05 Enthone Inc. Deposition of conductive polymer and metallization of non-conductive substrates
US7875900B2 (en) * 2008-12-01 2011-01-25 Celsia Technologies Taiwan, Inc. Thermally conductive structure of LED and manufacturing method thereof
US20130264214A1 (en) * 2012-04-04 2013-10-10 Rohm And Haas Electronic Materials Llc Metal plating for ph sensitive applications
US10040271B1 (en) 2015-10-02 2018-08-07 Global Solar Energy, Inc. Metalization of flexible polymer sheets
US10131998B2 (en) 2015-10-02 2018-11-20 Global Solar Energy, Inc. Metalization of flexible polymer sheets

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2871172A (en) * 1955-11-02 1959-01-27 James T N Atkinson Electro-plating of metals

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2882209A (en) * 1957-05-20 1959-04-14 Udylite Res Corp Electrodeposition of copper from an acid bath
US3634205A (en) * 1968-09-27 1972-01-11 Bunker Ramo Method of plating a uniform copper layer on an apertured printed circuit board
BE788117A (fr) * 1971-08-30 1973-02-28 Perstorp Ab Procede de production d'elements pour circuits imprimes
US3998601A (en) * 1973-12-03 1976-12-21 Yates Industries, Inc. Thin foil
CA1044636A (fr) * 1974-01-07 1978-12-19 Betty L. Berdan Formation de nodules sur une surface metallique
US3969199A (en) * 1975-07-07 1976-07-13 Gould Inc. Coating aluminum with a strippable copper deposit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2871172A (en) * 1955-11-02 1959-01-27 James T N Atkinson Electro-plating of metals

Also Published As

Publication number Publication date
LU80788A1 (fr) 1979-05-16
NL7900311A (nl) 1979-07-18
GB2012307B (en) 1982-06-30
SE446348B (sv) 1986-09-01
JPS6030751B2 (ja) 1985-07-18
BR7900244A (pt) 1979-08-14
NL185528C (nl) 1990-05-01
DE2856682C2 (de) 1986-07-31
US4169018A (en) 1979-09-25
FR2414565B1 (fr) 1985-06-28
SE7900329L (sv) 1979-07-17
GB2012307A (en) 1979-07-25
IT7947609A0 (it) 1979-01-12
JPS54101725A (en) 1979-08-10
DE2856682A1 (de) 1979-07-19
IT1114330B (it) 1986-01-27
CA1167406A (fr) 1984-05-15

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TP Transmission of property
ST Notification of lapse