ATE42351T1 - Verfahren zur selektiven metallisierung eines werkstuecks. - Google Patents

Verfahren zur selektiven metallisierung eines werkstuecks.

Info

Publication number
ATE42351T1
ATE42351T1 AT85303287T AT85303287T ATE42351T1 AT E42351 T1 ATE42351 T1 AT E42351T1 AT 85303287 T AT85303287 T AT 85303287T AT 85303287 T AT85303287 T AT 85303287T AT E42351 T1 ATE42351 T1 AT E42351T1
Authority
AT
Austria
Prior art keywords
copper
selected areas
coating
plate
conducting plate
Prior art date
Application number
AT85303287T
Other languages
English (en)
Inventor
Chungshin Lee
John Fronduto
Peter Oettinger
Original Assignee
Thermo Electron Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thermo Electron Corp filed Critical Thermo Electron Corp
Application granted granted Critical
Publication of ATE42351T1 publication Critical patent/ATE42351T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1033—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials by laser or spark ablation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005—Apparatus specially adapted for electrolytic conversion coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
    • C25D5/44—Aluminium
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00—Chemistry: electrical and wave energy
    • Y10S204/07—Current distribution within the bath
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00—Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/918—Use of wave energy or electrical discharge during pretreatment of substrate or post-treatment of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Electromagnetism (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT85303287T 1984-06-28 1985-05-09 Verfahren zur selektiven metallisierung eines werkstuecks. ATE42351T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/625,765 US4519876A (en) 1984-06-28 1984-06-28 Electrolytic deposition of metals on laser-conditioned surfaces
EP85303287A EP0166517B1 (de) 1984-06-28 1985-05-09 Verfahren zur selektiven Metallisierung eines Werkstücks

Publications (1)

Publication Number Publication Date
ATE42351T1 true ATE42351T1 (de) 1989-05-15

Family

ID=24507497

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85303287T ATE42351T1 (de) 1984-06-28 1985-05-09 Verfahren zur selektiven metallisierung eines werkstuecks.

Country Status (5)

Country Link
US (1) US4519876A (de)
EP (1) EP0166517B1 (de)
JP (1) JPS6123784A (de)
AT (1) ATE42351T1 (de)
DE (1) DE3569583D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4835704A (en) * 1986-12-29 1989-05-30 General Electric Company Adaptive lithography system to provide high density interconnect
DE3717653A1 (de) * 1987-05-26 1988-12-08 Hoechst Ag Verfahren zur selektiven additivkorrektur von fehlstellen in kopierschichten
DE3717652A1 (de) * 1987-05-26 1988-12-08 Hoechst Ag Einstufiges elektrochemisches bilderzeugungsverfahren fuer reproduktionsschichten
BE1002606A6 (fr) * 1988-11-30 1991-04-09 Centre Rech Metallurgique Procede de fabrication d'un cylindre de laminoir.
US5192581A (en) * 1989-08-10 1993-03-09 Microelectronics And Computer Technology Corporation Protective layer for preventing electroless deposition on a dielectric
US4981715A (en) * 1989-08-10 1991-01-01 Microelectronics And Computer Technology Corporation Method of patterning electroless plated metal on a polymer substrate
US5084299A (en) * 1989-08-10 1992-01-28 Microelectronics And Computer Technology Corporation Method for patterning electroless plated metal on a polymer substrate
US6113772A (en) * 1998-03-13 2000-09-05 Agfa-Gevaert, N.V. Method for making lithographic printing plates based on electroplating
EP0941838B1 (de) * 1998-03-13 2003-02-19 Agfa-Gevaert GT-Verfahren zur Herstellung von lithographischen Druckplatten durch Elektroplattieren
SG76591A1 (en) * 1999-02-27 2000-11-21 Aem Tech Engineers Pte Ltd Method for selective plating of a metal substrate using laser developed masking layer and apparatus for carrying out the method
WO2001034408A1 (en) * 1999-11-11 2001-05-17 Koninklijke Philips Electronics N.V. Marking of an anodized layer of an aluminium object
EP1302567A1 (de) * 2001-10-11 2003-04-16 FRANZ Oberflächentechnik GmbH & Co KG Beschichtungsverfahren für Leichtmetalllegierungen
ATE259005T1 (de) * 2001-10-11 2004-02-15 Franz Oberflaechentechnik Gmbh Erzeugung eines metallisch leitfähigen oberflächenbereichs auf oxidierten al-mg- legierungen
TWI554651B (zh) 2012-06-22 2016-10-21 蘋果公司 白色外觀陽極氧化膜及其形成方法
US9493876B2 (en) 2012-09-14 2016-11-15 Apple Inc. Changing colors of materials
US9181629B2 (en) 2013-10-30 2015-11-10 Apple Inc. Methods for producing white appearing metal oxide films by positioning reflective particles prior to or during anodizing processes
US9839974B2 (en) 2013-11-13 2017-12-12 Apple Inc. Forming white metal oxide films by oxide structure modification or subsurface cracking

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3335072A (en) * 1964-06-01 1967-08-08 Martin Marietta Corp Process of preparing lithographic plates
GB1138084A (en) * 1966-07-22 1968-12-27 Standard Telephones Cables Ltd Method of vapour depositing a material in the form of a pattern
US3506545A (en) * 1967-02-14 1970-04-14 Ibm Method for plating conductive patterns with high resolution
US3506779A (en) * 1967-04-03 1970-04-14 Bell Telephone Labor Inc Laser beam typesetter
US3574657A (en) * 1967-12-14 1971-04-13 Fmc Corp Polymeric images formed by heat
US3664737A (en) * 1971-03-23 1972-05-23 Ibm Printing plate recording by direct exposure
DE2543820C2 (de) * 1975-10-01 1984-10-31 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung von Flachdruckformen mittels Laserstrahlen
DE2607207C2 (de) * 1976-02-23 1983-07-14 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen
US4217183A (en) * 1979-05-08 1980-08-12 International Business Machines Corporation Method for locally enhancing electroplating rates
FR2513273B1 (fr) * 1981-07-24 1990-02-09 Inoue Japax Res Procede et appareil d'electro-deposition d'un metal sur une piece par utilisation d'un faisceau laser ou un faisceau lumineux thermique analogue
US4431707A (en) * 1982-12-27 1984-02-14 International Business Machines Corporation Plating anodized aluminum substrates

Also Published As

Publication number Publication date
EP0166517B1 (de) 1989-04-19
US4519876A (en) 1985-05-28
EP0166517A1 (de) 1986-01-02
DE3569583D1 (en) 1989-05-24
JPS6123784A (ja) 1986-02-01

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties