FR2382091A1 - Procede et dispositif de formation d'un faisceau electronique de taille variable - Google Patents

Procede et dispositif de formation d'un faisceau electronique de taille variable

Info

Publication number
FR2382091A1
FR2382091A1 FR7800742A FR7800742A FR2382091A1 FR 2382091 A1 FR2382091 A1 FR 2382091A1 FR 7800742 A FR7800742 A FR 7800742A FR 7800742 A FR7800742 A FR 7800742A FR 2382091 A1 FR2382091 A1 FR 2382091A1
Authority
FR
France
Prior art keywords
forming
image
variable size
opening
varying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7800742A
Other languages
English (en)
French (fr)
Other versions
FR2382091B1 (en:Method
Inventor
Hans C Pfeiffer
Philip M Ryan
Edward V Weber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2382091A1 publication Critical patent/FR2382091A1/fr
Application granted granted Critical
Publication of FR2382091B1 publication Critical patent/FR2382091B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
FR7800742A 1977-02-23 1978-01-05 Procede et dispositif de formation d'un faisceau electronique de taille variable Granted FR2382091A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US77123577A 1977-02-23 1977-02-23

Publications (2)

Publication Number Publication Date
FR2382091A1 true FR2382091A1 (fr) 1978-09-22
FR2382091B1 FR2382091B1 (en:Method) 1982-04-09

Family

ID=25091155

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7800742A Granted FR2382091A1 (fr) 1977-02-23 1978-01-05 Procede et dispositif de formation d'un faisceau electronique de taille variable

Country Status (9)

Country Link
JP (1) JPS53124078A (en:Method)
BR (1) BR7801031A (en:Method)
CA (1) CA1166766A (en:Method)
DE (1) DE2805371C2 (en:Method)
FR (1) FR2382091A1 (en:Method)
GB (1) GB1587852A (en:Method)
IT (1) IT1158434B (en:Method)
NL (1) NL7802010A (en:Method)
SE (1) SE437441B (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0053225A1 (en) * 1980-11-28 1982-06-09 International Business Machines Corporation Electron beam system and method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS543476A (en) * 1977-06-09 1979-01-11 Jeol Ltd Electron beam exposure device
GB1598219A (en) * 1977-08-10 1981-09-16 Ibm Electron beam system
JPS5679429A (en) * 1979-12-03 1981-06-30 Chiyou Lsi Gijutsu Kenkyu Kumiai Electron beam exposure process
US4423305A (en) * 1981-07-30 1983-12-27 International Business Machines Corporation Method and apparatus for controlling alignment of an electron beam of a variable shape
JPS5928336A (ja) * 1982-08-09 1984-02-15 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成法
CN116441562B (zh) * 2023-06-16 2023-08-15 西安赛隆增材技术股份有限公司 一种电子束的束斑的校准装置及校准方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1926849A1 (de) * 1968-05-27 1969-12-11 Tno Vorrichtung zur Registrierung mit Elektronenstrahlen
FR2340616A1 (fr) * 1976-02-05 1977-09-02 Western Electric Co Procede et appareil d'irradiation d'une surface
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3801792A (en) * 1973-05-23 1974-04-02 Bell Telephone Labor Inc Electron beam apparatus
JPS5251871A (en) * 1975-10-23 1977-04-26 Rikagaku Kenkyusho Projecting method for charge particle beams
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
JPS5320391A (en) * 1976-08-09 1978-02-24 Becton Dickinson Co Blood inspection apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1926849A1 (de) * 1968-05-27 1969-12-11 Tno Vorrichtung zur Registrierung mit Elektronenstrahlen
FR2340616A1 (fr) * 1976-02-05 1977-09-02 Western Electric Co Procede et appareil d'irradiation d'une surface
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0053225A1 (en) * 1980-11-28 1982-06-09 International Business Machines Corporation Electron beam system and method

Also Published As

Publication number Publication date
JPS5424833B2 (en:Method) 1979-08-23
CA1166766A (en) 1984-05-01
DE2805371A1 (de) 1978-08-24
JPS53124078A (en) 1978-10-30
GB1587852A (en) 1981-04-08
BR7801031A (pt) 1978-12-12
DE2805371C2 (de) 1984-02-16
SE7801728L (sv) 1978-08-24
SE437441B (sv) 1985-02-25
FR2382091B1 (en:Method) 1982-04-09
NL7802010A (nl) 1978-08-25
IT1158434B (it) 1987-02-18
IT7820143A0 (it) 1978-02-10

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