FR2378354A1 - Procede de fabrication de semiconducteurs de puissance a contacts presses - Google Patents

Procede de fabrication de semiconducteurs de puissance a contacts presses

Info

Publication number
FR2378354A1
FR2378354A1 FR7701433A FR7701433A FR2378354A1 FR 2378354 A1 FR2378354 A1 FR 2378354A1 FR 7701433 A FR7701433 A FR 7701433A FR 7701433 A FR7701433 A FR 7701433A FR 2378354 A1 FR2378354 A1 FR 2378354A1
Authority
FR
France
Prior art keywords
contact power
manufacturing process
power semiconductor
semiconductor manufacturing
press contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7701433A
Other languages
English (en)
Other versions
FR2378354B1 (fr
Inventor
Bernard Bourdon
Gaston Sifre
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alstom SA
Original Assignee
Alsthom Atlantique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alsthom Atlantique SA filed Critical Alsthom Atlantique SA
Priority to FR7701433A priority Critical patent/FR2378354A1/fr
Priority to BE1008619A priority patent/BE862496A/fr
Priority to IT3144277A priority patent/IT1089099B/it
Priority to GB45478A priority patent/GB1542229A/en
Priority to US05/868,242 priority patent/US4155155A/en
Priority to DE19782801153 priority patent/DE2801153A1/de
Priority to CA295,080A priority patent/CA1078528A/fr
Priority to NL7800684A priority patent/NL7800684A/xx
Publication of FR2378354A1 publication Critical patent/FR2378354A1/fr
Application granted granted Critical
Publication of FR2378354B1 publication Critical patent/FR2378354B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/02—Containers; Seals
    • H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • H01L23/043—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body
    • H01L23/051—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body another lead being formed by a cover plate parallel to the base plate, e.g. sandwich type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/71—Means for bonding not being attached to, or not being formed on, the surface to be connected
    • H01L24/72—Detachable connecting means consisting of mechanical auxiliary parts connecting the device, e.g. pressure contacts using springs or clips
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
    • H01L29/41716—Cathode or anode electrodes for thyristors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42308—Gate electrodes for thyristors
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    • H01L2924/01087—Francium [Fr]
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    • H01L2924/1305—Bipolar Junction Transistor [BJT]
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/018—Compensation doping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/02—Contacts, special

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thyristors (AREA)
  • Die Bonding (AREA)

Abstract

L'invention concerne un procédé de fabrication de semiconducteurs de puissance à contacts pressés. Les métallisations de contact les plus épaisses sont formées par application d'une couche métallique par sérigraphie sur une première couche métallique mince déposée par evaporation sous vide. Application à la réalisation de dispositifs de puissance à structure interdigitée.
FR7701433A 1977-01-19 1977-01-19 Procede de fabrication de semiconducteurs de puissance a contacts presses Granted FR2378354A1 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR7701433A FR2378354A1 (fr) 1977-01-19 1977-01-19 Procede de fabrication de semiconducteurs de puissance a contacts presses
BE1008619A BE862496A (fr) 1977-01-19 1977-12-30 Procede de fabrication de semiconducteurs de puissance a contacts presses
IT3144277A IT1089099B (it) 1977-01-19 1977-12-30 Procedimento di fabbricazione di semiconduttori di patenza a contatti pressati
GB45478A GB1542229A (en) 1977-01-19 1978-01-06 Method of manufacturing power semiconductors with pressure contacts
US05/868,242 US4155155A (en) 1977-01-19 1978-01-10 Method of manufacturing power semiconductors with pressed contacts
DE19782801153 DE2801153A1 (de) 1977-01-19 1978-01-12 Herstellungsverfahren fuer leistungshalbleiter mit pressanschluessen
CA295,080A CA1078528A (fr) 1977-01-19 1978-01-17 Procede de fabrication de semi-conducteurs de puissance a contacts presses
NL7800684A NL7800684A (nl) 1977-01-19 1978-01-19 Werkwijze voor het vervaardigen van een vermo- genshalfgeleider met drukkontakten en halfge- leider, verkregen onder toepassing van deze werkwijze.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7701433A FR2378354A1 (fr) 1977-01-19 1977-01-19 Procede de fabrication de semiconducteurs de puissance a contacts presses

Publications (2)

Publication Number Publication Date
FR2378354A1 true FR2378354A1 (fr) 1978-08-18
FR2378354B1 FR2378354B1 (fr) 1981-11-27

Family

ID=9185664

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7701433A Granted FR2378354A1 (fr) 1977-01-19 1977-01-19 Procede de fabrication de semiconducteurs de puissance a contacts presses

Country Status (8)

Country Link
US (1) US4155155A (fr)
BE (1) BE862496A (fr)
CA (1) CA1078528A (fr)
DE (1) DE2801153A1 (fr)
FR (1) FR2378354A1 (fr)
GB (1) GB1542229A (fr)
IT (1) IT1089099B (fr)
NL (1) NL7800684A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2517471A1 (fr) * 1981-12-02 1983-06-03 Silicium Semiconducteur Ssc Montage en boitier presse de composants de puissance a structure d'electrodes ramifiee
EP0098175A2 (fr) * 1982-06-30 1984-01-11 Kabushiki Kaisha Toshiba Dispositif semi-conducteur du type de contact à pression
EP0224141A2 (fr) * 1985-11-21 1987-06-03 General Electric Company Dispositifs de puissance à semi-conducteur

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4402004A (en) * 1978-01-07 1983-08-30 Tokyo Shibaura Denki Kabushiki Kaisha High current press pack semiconductor device having a mesa structure
JPS5929143B2 (ja) * 1978-01-07 1984-07-18 株式会社東芝 電力用半導体装置
JPS56131955A (en) * 1980-09-01 1981-10-15 Hitachi Ltd Semiconductor device
US4320571A (en) * 1980-10-14 1982-03-23 International Rectifier Corporation Stencil mask process for high power, high speed controlled rectifiers
DE3232837A1 (de) * 1982-09-03 1984-03-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen einer 2-ebenen-metallisierung fuer halbleiterbauelemente, insbesondere fuer leistungshalbleiterbauelemente wie thyristoren
JPS59121871A (ja) * 1982-12-28 1984-07-14 Toshiba Corp 半導体装置
JPS59134876A (ja) * 1983-01-20 1984-08-02 Mitsubishi Electric Corp 半導体装置
US4545610A (en) * 1983-11-25 1985-10-08 International Business Machines Corporation Method for forming elongated solder connections between a semiconductor device and a supporting substrate
US4616403A (en) * 1984-08-31 1986-10-14 Texas Instruments Incorporated Configuration of a metal insulator semiconductor with a processor based gate
DE3446789A1 (de) * 1984-12-21 1986-07-03 SEMIKRON Gesellschaft für Gleichrichterbau u. Elektronik mbH, 8500 Nürnberg Verfahren zum herstellen von halbleiterbauelementen
US4681655A (en) * 1986-11-24 1987-07-21 Microelectronics And Computer Technology Corporation Electrical interconnect support system with low dielectric constant
US5040051A (en) * 1988-12-05 1991-08-13 Sundstrand Corporation Hydrostatic clamp and method for compression type power semiconductors
US5043739A (en) * 1990-01-30 1991-08-27 The United States Of America As Represented By The United States Department Of Energy High frequency rectenna
JP2799252B2 (ja) * 1991-04-23 1998-09-17 三菱電機株式会社 Ｍｏｓ型半導体装置およびその製造方法
US7745301B2 (en) * 2005-08-22 2010-06-29 Terapede, Llc Methods and apparatus for high-density chip connectivity
US8957511B2 (en) * 2005-08-22 2015-02-17 Madhukar B. Vora Apparatus and methods for high-density chip connectivity
CN104600101A (zh) * 2015-02-03 2015-05-06 清华大学 一种集成门极换流晶闸管芯片的双门极接触环阴极面结构
CN106601701B (zh) * 2017-01-19 2023-03-28 贵州煜立电子科技有限公司 大功率二端表面引出脚电子元器件立体封装方法及结构
CN109979998B (zh) * 2018-12-27 2024-02-09 清华大学 具备高电流冲击耐受能力的集成门极换流晶闸管器件

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3007092A (en) * 1957-12-23 1961-10-31 Hughes Aircraft Co Semiconductor devices
LU37521A1 (fr) * 1958-08-11
US3222216A (en) * 1962-06-04 1965-12-07 Ibm Process for affixing ohmic contacts to photoconductor elements
US3453501A (en) * 1966-08-10 1969-07-01 Philco Ford Corp Metallization of silicon semiconductor devices for making ohmic connections thereto
US3545076A (en) * 1967-08-22 1970-12-08 Bosch Gmbh Robert Process of forming contacts on electrical parts,particularly silicon semiconductors
FR2254879B1 (fr) * 1973-12-12 1977-09-23 Alsthom Cgee
US3993515A (en) * 1975-03-31 1976-11-23 Rca Corporation Method of forming raised electrical contacts on a semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2517471A1 (fr) * 1981-12-02 1983-06-03 Silicium Semiconducteur Ssc Montage en boitier presse de composants de puissance a structure d'electrodes ramifiee
EP0080953A1 (fr) * 1981-12-02 1983-06-08 Le Silicium Semiconducteur Ssc Montage en boîtier pressé de composants de puissance à structure d'électrodes ramifiée
EP0098175A2 (fr) * 1982-06-30 1984-01-11 Kabushiki Kaisha Toshiba Dispositif semi-conducteur du type de contact à pression
EP0098175A3 (fr) * 1982-06-30 1985-10-23 Kabushiki Kaisha Toshiba Dispositif semi-conducteur du type de contact à pression
EP0224141A2 (fr) * 1985-11-21 1987-06-03 General Electric Company Dispositifs de puissance à semi-conducteur
EP0224141A3 (fr) * 1985-11-21 1989-06-14 General Electric Company Dispositifs de puissance à semi-conducteur

Also Published As

Publication number Publication date
GB1542229A (en) 1979-03-14
DE2801153A1 (de) 1978-07-20
US4155155A (en) 1979-05-22
BE862496A (fr) 1978-06-30
NL7800684A (nl) 1978-07-21
FR2378354B1 (fr) 1981-11-27
IT1089099B (it) 1985-06-10
CA1078528A (fr) 1980-05-27

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