FR2371772A1 - Dispositif a faisceau ionique - Google Patents
Dispositif a faisceau ioniqueInfo
- Publication number
- FR2371772A1 FR2371772A1 FR7733365A FR7733365A FR2371772A1 FR 2371772 A1 FR2371772 A1 FR 2371772A1 FR 7733365 A FR7733365 A FR 7733365A FR 7733365 A FR7733365 A FR 7733365A FR 2371772 A1 FR2371772 A1 FR 2371772A1
- Authority
- FR
- France
- Prior art keywords
- ions
- beam device
- solid material
- emitted
- excitation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Dispositif à faisceau ionique dans lequel un faisceau d'ions d'excitation, émis par une source d'ions gazeuse, est appliqué à un matériau solide qui constitue une source d'ions solides et dans lequel les ions du matériau solide, émis par ce matériau solide sous l'effet de l'application du faisceau des ions d'excitation, sont extraits par une électrode d'extraction et appliqués sur un échantillon.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51138328A JPS5812978B2 (ja) | 1976-11-19 | 1976-11-19 | イオン線装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2371772A1 true FR2371772A1 (fr) | 1978-06-16 |
FR2371772B1 FR2371772B1 (fr) | 1981-01-30 |
Family
ID=15219324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7733365A Granted FR2371772A1 (fr) | 1976-11-19 | 1977-11-07 | Dispositif a faisceau ionique |
Country Status (3)
Country | Link |
---|---|
US (1) | US4163153A (fr) |
JP (1) | JPS5812978B2 (fr) |
FR (1) | FR2371772A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0162468A1 (fr) * | 1984-05-25 | 1985-11-27 | Hitachi, Ltd. | Dispositif d'implantation d'ions avec un micro-rayon |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4251725A (en) * | 1979-08-06 | 1981-02-17 | Honeywell Inc. | Programmed sample pyrolysis for mass spectrometer |
JPS58158837A (ja) * | 1982-03-16 | 1983-09-21 | Jeol Ltd | イオン源 |
JPS58158844A (ja) * | 1982-03-17 | 1983-09-21 | Jeol Ltd | イオン銃 |
JPS6197557A (ja) * | 1984-10-19 | 1986-05-16 | Kawasaki Steel Corp | 二次イオン質量分析装置 |
JPS617556A (ja) * | 1985-05-30 | 1986-01-14 | Hitachi Ltd | 二次イオン質量分析計 |
US4968888A (en) * | 1989-07-05 | 1990-11-06 | The United States Of America As Represented By The United States Department Of Energy | Pulsed field sample neutralization |
JPH03245447A (ja) * | 1990-02-23 | 1991-11-01 | Hitachi Ltd | セシウム集束イオンビーム形成方法 |
EP2272547B1 (fr) * | 2009-06-23 | 2017-01-11 | Biotronik VI Patent AG | Appareil de formation d'images et procédé de commande de sa faible puissance |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3508045A (en) * | 1968-07-12 | 1970-04-21 | Applied Res Lab | Analysis by bombardment with chemically reactive ions |
BE758925A (fr) * | 1969-11-14 | 1971-04-16 | Bayer Ag | Procede pour l'analyse des surfaces de corps solides par spectrometrie de masse |
US3973121A (en) * | 1972-12-29 | 1976-08-03 | Fite Wade L | Detector for heavy ions following mass analysis |
-
1976
- 1976-11-19 JP JP51138328A patent/JPS5812978B2/ja not_active Expired
-
1977
- 1977-11-07 FR FR7733365A patent/FR2371772A1/fr active Granted
- 1977-11-17 US US05/852,203 patent/US4163153A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0162468A1 (fr) * | 1984-05-25 | 1985-11-27 | Hitachi, Ltd. | Dispositif d'implantation d'ions avec un micro-rayon |
Also Published As
Publication number | Publication date |
---|---|
US4163153A (en) | 1979-07-31 |
FR2371772B1 (fr) | 1981-01-30 |
JPS5364089A (en) | 1978-06-08 |
JPS5812978B2 (ja) | 1983-03-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |