FR2371714A1 - Procede pour delimiter une surface sur un substrat, a l'aide d'un cache durcissable par irradiation, et article obtenu - Google Patents
Procede pour delimiter une surface sur un substrat, a l'aide d'un cache durcissable par irradiation, et article obtenuInfo
- Publication number
- FR2371714A1 FR2371714A1 FR7724367A FR7724367A FR2371714A1 FR 2371714 A1 FR2371714 A1 FR 2371714A1 FR 7724367 A FR7724367 A FR 7724367A FR 7724367 A FR7724367 A FR 7724367A FR 2371714 A1 FR2371714 A1 FR 2371714A1
- Authority
- FR
- France
- Prior art keywords
- substrate
- delimitate
- article obtained
- resist
- irradiation curable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71239476A | 1976-08-06 | 1976-08-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2371714A1 true FR2371714A1 (fr) | 1978-06-16 |
FR2371714B1 FR2371714B1 (US08080257-20111220-C00005.png) | 1980-07-11 |
Family
ID=24861928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7724367A Granted FR2371714A1 (fr) | 1976-08-06 | 1977-08-08 | Procede pour delimiter une surface sur un substrat, a l'aide d'un cache durcissable par irradiation, et article obtenu |
Country Status (11)
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2352007A1 (fr) * | 1976-05-21 | 1977-12-16 | Thomson Csf | Resine sensible aux electrons et procede de fabrication de ladite resine |
FR2382709A1 (fr) * | 1977-03-04 | 1978-09-29 | Thomson Csf | Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique |
US4279986A (en) * | 1977-06-01 | 1981-07-21 | Nippon Electric Co., Ltd. | Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization |
CS193322B1 (en) * | 1977-11-07 | 1979-10-31 | Jaroslav Kalal | Electron resisit |
US4208211A (en) * | 1978-05-23 | 1980-06-17 | Bell Telephone Laboratories, Incorporated | Fabrication based on radiation sensitive resists and related products |
US4225664A (en) * | 1979-02-22 | 1980-09-30 | Bell Telephone Laboratories, Incorporated | X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate) |
JPS5629231A (en) * | 1979-08-17 | 1981-03-24 | Hitachi Ltd | Radiation sensitive material and pattern forming method |
US4262081A (en) * | 1979-11-21 | 1981-04-14 | Bell Telephone Laboratories, Incorporated | Fabrication based on radiation sensitive resists of halo-alkyl styrene polymers |
US4332881A (en) * | 1980-07-28 | 1982-06-01 | Bell Telephone Laboratories, Incorporated | Resist adhesion in integrated circuit processing |
US4430419A (en) * | 1981-01-22 | 1984-02-07 | Nippon Telegraph & Telephone Public Corporation | Positive resist and method for manufacturing a pattern thereof |
DE3109728C2 (de) * | 1981-03-13 | 1986-08-14 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Herstellung von Resiststrukturen |
DE3109809C2 (de) * | 1981-03-13 | 1986-07-31 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Herstellung von Resiststrukturen |
JPS58168047A (ja) * | 1982-03-30 | 1983-10-04 | Somar Corp | 感光性材料 |
US4511757A (en) * | 1983-07-13 | 1985-04-16 | At&T Technologies, Inc. | Circuit board fabrication leading to increased capacity |
US4628022A (en) * | 1983-07-13 | 1986-12-09 | At&T Technologies, Inc. | Multilayer circuit board fabrication process and polymer insulator used therein |
US4795693A (en) * | 1983-07-13 | 1989-01-03 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Multilayer circuit board fabrication process |
JPS6039351U (ja) * | 1983-08-27 | 1985-03-19 | 株式会社新潟工器 | 消雪ノズル |
JPS6071368U (ja) * | 1983-10-25 | 1985-05-20 | 株式会社新潟工器 | 消雪用ノズル |
GB2163435B (en) * | 1984-07-11 | 1987-07-22 | Asahi Chemical Ind | Image-forming materials sensitive to high-energy beam |
JPS61104988A (ja) * | 1984-10-24 | 1986-05-23 | ダウ化工株式会社 | 蓄熱水槽の構造 |
US5024969A (en) * | 1990-02-23 | 1991-06-18 | Reche John J | Hybrid circuit structure fabrication methods using high energy electron beam curing |
US5565538A (en) * | 1994-09-21 | 1996-10-15 | Great Lakes Chemical Corporation | Dibromostyrene-glycidyl(meth)acrylate copolymers |
DE19813670C1 (de) | 1998-03-27 | 1999-07-08 | Daimler Chrysler Ag | Kraftfahrzeug mit einer den Rücksitzbereich vom Vordersitzbereich abtrennenden Trennwand |
US7198882B2 (en) * | 2001-11-20 | 2007-04-03 | Eastman Kodak Company | Adhesion promoting polymeric materials and planographic printing elements containing them |
GB0127713D0 (en) * | 2001-11-20 | 2002-01-09 | Eastman Kodak Co | Adhesion promoting polymeric materials and planographic printing elements containing them |
EP2343597B1 (en) * | 2003-04-02 | 2015-08-05 | Nissan Chemical Industries, Ltd. | Use of an underlayer coating forming composition for lithography |
US9002497B2 (en) * | 2003-07-03 | 2015-04-07 | Kla-Tencor Technologies Corp. | Methods and systems for inspection of wafers and reticles using designer intent data |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1423760A (fr) * | 1963-10-25 | 1966-01-07 | Kalle Ag | Matériel photosensible pour la réalisation photomécanique de formes d'impression et son procédé de fabrication |
FR1507602A (fr) * | 1966-01-07 | 1967-12-29 | Kalle Ag | Couche de reproduction photosensible |
US3885060A (en) * | 1968-08-23 | 1975-05-20 | Hitachi Ltd | Production of insolubilized organic polymers |
FR2341904A1 (fr) * | 1976-02-18 | 1977-09-16 | Hitachi Ltd | Matiere sensible aux radiations et procede de son utilisation |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1032392A (en) * | 1973-10-23 | 1978-06-06 | Eugene D. Feit | High energy radiation curable resist and preparatory process |
US3916035A (en) * | 1973-11-05 | 1975-10-28 | Texas Instruments Inc | Epoxy-polymer electron beam resists |
US3931435A (en) * | 1974-12-20 | 1976-01-06 | International Business Machines Corporation | Electron beam positive resists containing acetate polymers |
-
1977
- 1977-07-01 US US05/812,231 patent/US4130424A/en not_active Expired - Lifetime
- 1977-07-28 SE SE7708681A patent/SE420244B/xx not_active IP Right Cessation
- 1977-08-04 CA CA284,102A patent/CA1088737A/en not_active Expired
- 1977-08-05 IT IT68825/77A patent/IT1086540B/it active
- 1977-08-05 JP JP9346977A patent/JPS5320771A/ja active Granted
- 1977-08-05 GB GB32882/77A patent/GB1588892A/en not_active Expired
- 1977-08-05 BE BE179950A patent/BE857537A/xx not_active IP Right Cessation
- 1977-08-05 DE DE2735377A patent/DE2735377C2/de not_active Expired
- 1977-08-05 ES ES461397A patent/ES461397A1/es not_active Expired
- 1977-08-05 NL NLAANVRAGE7708693,A patent/NL170775C/xx not_active IP Right Cessation
- 1977-08-08 FR FR7724367A patent/FR2371714A1/fr active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1423760A (fr) * | 1963-10-25 | 1966-01-07 | Kalle Ag | Matériel photosensible pour la réalisation photomécanique de formes d'impression et son procédé de fabrication |
FR1507602A (fr) * | 1966-01-07 | 1967-12-29 | Kalle Ag | Couche de reproduction photosensible |
US3885060A (en) * | 1968-08-23 | 1975-05-20 | Hitachi Ltd | Production of insolubilized organic polymers |
FR2341904A1 (fr) * | 1976-02-18 | 1977-09-16 | Hitachi Ltd | Matiere sensible aux radiations et procede de son utilisation |
Also Published As
Publication number | Publication date |
---|---|
SE420244B (sv) | 1981-09-21 |
BE857537A (fr) | 1977-12-01 |
JPS5320771A (en) | 1978-02-25 |
DE2735377C2 (de) | 1983-06-23 |
NL170775C (nl) | 1982-12-16 |
FR2371714B1 (US08080257-20111220-C00005.png) | 1980-07-11 |
CA1088737A (en) | 1980-11-04 |
GB1588892A (en) | 1981-04-29 |
IT1086540B (it) | 1985-05-28 |
SE7708681L (sv) | 1978-02-07 |
DE2735377A1 (de) | 1978-02-09 |
NL7708693A (nl) | 1978-02-08 |
JPS5751654B2 (US08080257-20111220-C00005.png) | 1982-11-02 |
US4130424A (en) | 1978-12-19 |
NL170775B (nl) | 1982-07-16 |
ES461397A1 (es) | 1979-05-16 |
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