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Sony Corp
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Sony Corp
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Application filed by Sony CorpfiledCriticalSony Corp
Publication of FR2334200A1publicationCriticalpatent/FR2334200A1/fr
Application grantedgrantedCritical
Publication of FR2334200B1publicationCriticalpatent/FR2334200B1/fr
Verfahren zum herstellen von oxidschichten auf aus silizium oder anderem oxidierbarem material bestehenden substratscheiben in extrem trockener sauerstoffatmosphaere bzw. in sauerstoffatmosphaere mit chlorwasserstoffgas-zusaetzen