FR2237226A1 - Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer - Google Patents

Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer

Info

Publication number
FR2237226A1
FR2237226A1 FR7410722A FR7410722A FR2237226A1 FR 2237226 A1 FR2237226 A1 FR 2237226A1 FR 7410722 A FR7410722 A FR 7410722A FR 7410722 A FR7410722 A FR 7410722A FR 2237226 A1 FR2237226 A1 FR 2237226A1
Authority
FR
France
Prior art keywords
polydiallylorthophthalate
resist layer
electron sensitive
formation
negative resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
FR7410722A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2237226A1 publication Critical patent/FR2237226A1/fr
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7410722A 1973-04-09 1974-03-28 Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer Pending FR2237226A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US34927673A 1973-04-09 1973-04-09

Publications (1)

Publication Number Publication Date
FR2237226A1 true FR2237226A1 (en) 1975-02-07

Family

ID=23371652

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7410722A Pending FR2237226A1 (en) 1973-04-09 1974-03-28 Negative resist formation - using polydiallylorthophthalate electron sensitive resist layer

Country Status (6)

Country Link
JP (1) JPS502939A (enrdf_load_stackoverflow)
BE (1) BE813367A (enrdf_load_stackoverflow)
DE (1) DE2416543A1 (enrdf_load_stackoverflow)
FR (1) FR2237226A1 (enrdf_load_stackoverflow)
IT (1) IT1009421B (enrdf_load_stackoverflow)
NL (1) NL7404549A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS6022633U (ja) * 1983-07-23 1985-02-16 天龍木材株式会社 木質床材
JPS62144343U (enrdf_load_stackoverflow) * 1986-03-06 1987-09-11
JPH0524769U (ja) * 1991-09-10 1993-03-30 チヨダウーテ株式会社 珪酸カルシウム板

Also Published As

Publication number Publication date
IT1009421B (it) 1976-12-10
JPS502939A (enrdf_load_stackoverflow) 1975-01-13
BE813367A (fr) 1974-07-31
NL7404549A (enrdf_load_stackoverflow) 1974-10-11
DE2416543A1 (de) 1974-10-24

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