IT1009421B - Procedimento per l ottenimento di uno strato di mascheramento sensibile agli elettroni per l incisione in negativo - Google Patents

Procedimento per l ottenimento di uno strato di mascheramento sensibile agli elettroni per l incisione in negativo

Info

Publication number
IT1009421B
IT1009421B IT6808874A IT6808874A IT1009421B IT 1009421 B IT1009421 B IT 1009421B IT 6808874 A IT6808874 A IT 6808874A IT 6808874 A IT6808874 A IT 6808874A IT 1009421 B IT1009421 B IT 1009421B
Authority
IT
Italy
Prior art keywords
procedure
obtaining
masking layer
electron sensitive
sensitive masking
Prior art date
Application number
IT6808874A
Other languages
English (en)
Italian (it)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Application granted granted Critical
Publication of IT1009421B publication Critical patent/IT1009421B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
IT6808874A 1973-04-09 1974-04-04 Procedimento per l ottenimento di uno strato di mascheramento sensibile agli elettroni per l incisione in negativo IT1009421B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US34927673A 1973-04-09 1973-04-09

Publications (1)

Publication Number Publication Date
IT1009421B true IT1009421B (it) 1976-12-10

Family

ID=23371652

Family Applications (1)

Application Number Title Priority Date Filing Date
IT6808874A IT1009421B (it) 1973-04-09 1974-04-04 Procedimento per l ottenimento di uno strato di mascheramento sensibile agli elettroni per l incisione in negativo

Country Status (6)

Country Link
JP (1) JPS502939A (enrdf_load_stackoverflow)
BE (1) BE813367A (enrdf_load_stackoverflow)
DE (1) DE2416543A1 (enrdf_load_stackoverflow)
FR (1) FR2237226A1 (enrdf_load_stackoverflow)
IT (1) IT1009421B (enrdf_load_stackoverflow)
NL (1) NL7404549A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS6022633U (ja) * 1983-07-23 1985-02-16 天龍木材株式会社 木質床材
JPS62144343U (enrdf_load_stackoverflow) * 1986-03-06 1987-09-11
JPH0524769U (ja) * 1991-09-10 1993-03-30 チヨダウーテ株式会社 珪酸カルシウム板

Also Published As

Publication number Publication date
JPS502939A (enrdf_load_stackoverflow) 1975-01-13
FR2237226A1 (en) 1975-02-07
BE813367A (fr) 1974-07-31
NL7404549A (enrdf_load_stackoverflow) 1974-10-11
DE2416543A1 (de) 1974-10-24

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