FR2149384A1 - Semiconductor component prodn - with automatic precision mask location esp for fets - Google Patents

Semiconductor component prodn - with automatic precision mask location esp for fets

Info

Publication number
FR2149384A1
FR2149384A1 FR7228653A FR7228653A FR2149384A1 FR 2149384 A1 FR2149384 A1 FR 2149384A1 FR 7228653 A FR7228653 A FR 7228653A FR 7228653 A FR7228653 A FR 7228653A FR 2149384 A1 FR2149384 A1 FR 2149384A1
Authority
FR
France
Prior art keywords
esp
fets
deposited
semiconductor component
windows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7228653A
Other languages
French (fr)
Other versions
FR2149384B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2149384A1 publication Critical patent/FR2149384A1/en
Application granted granted Critical
Publication of FR2149384B1 publication Critical patent/FR2149384B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

An insulating film of SiO or SiO2 is deposited on a Si substrate in the normal way and windows etched in it for the source and sink electrodes to be deposited on the exposed areas of the substrate, the windows having parallel adjacent edges. The contacts are then electroplated until there is an accurately controlled spread of metal over the edges of the windows. This defines the width of an exposed area of isthmus onto which the gate electrode finger is deposited, the distances from this third electrode to the source and sink regions thus being accurately defined.
FR7228653A 1971-08-19 1972-08-03 Semiconductor component prodn - with automatic precision mask location esp for fets Granted FR2149384A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1217971A CH529446A (en) 1971-08-19 1971-08-19 Self-aligning masking process, in particular for semiconductor surfaces

Publications (2)

Publication Number Publication Date
FR2149384A1 true FR2149384A1 (en) 1973-03-30
FR2149384B1 FR2149384B1 (en) 1974-07-12

Family

ID=4380613

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7228653A Granted FR2149384A1 (en) 1971-08-19 1972-08-03 Semiconductor component prodn - with automatic precision mask location esp for fets

Country Status (4)

Country Link
JP (1) JPS4831878A (en)
CH (1) CH529446A (en)
DE (1) DE2234189A1 (en)
FR (1) FR2149384A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1094517B (en) * 1978-04-28 1985-08-02 Componenti Elettronici Sgs Ate PROCEDURE FOR THE MANUFACTURE OF A FILIFORM RESISTIVE ELEMENT FOR INTEGRATED CIRCUIT
DE3426421A1 (en) * 1984-07-18 1986-01-23 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Process for fabricating a semiconductor configuration

Also Published As

Publication number Publication date
CH529446A (en) 1972-10-15
FR2149384B1 (en) 1974-07-12
DE2234189A1 (en) 1973-03-01
JPS4831878A (en) 1973-04-26

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Legal Events

Date Code Title Description
ST Notification of lapse