FI98000B - Valonherkkä tallennuselementti - Google Patents

Valonherkkä tallennuselementti

Info

Publication number
FI98000B
FI98000B FI900510A FI900510A FI98000B FI 98000 B FI98000 B FI 98000B FI 900510 A FI900510 A FI 900510A FI 900510 A FI900510 A FI 900510A FI 98000 B FI98000 B FI 98000B
Authority
FI
Finland
Prior art keywords
light sensitive
registration element
sensitive registration
light
sensitive
Prior art date
Application number
FI900510A
Other languages
English (en)
Swedish (sv)
Other versions
FI900510A0 (fi
FI98000C (fi
Inventor
Wolfgang Huemmer
Walter Dobler
Dieter Littmann
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of FI900510A0 publication Critical patent/FI900510A0/fi
Application granted granted Critical
Publication of FI98000B publication Critical patent/FI98000B/fi
Publication of FI98000C publication Critical patent/FI98000C/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
FI900510A 1989-02-24 1990-02-01 Valonherkkä tallennuselementti FI98000C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3905765 1989-02-24
DE3905765A DE3905765A1 (de) 1989-02-24 1989-02-24 Lichtempfindliches aufzeichnungselement

Publications (3)

Publication Number Publication Date
FI900510A0 FI900510A0 (fi) 1990-02-01
FI98000B true FI98000B (fi) 1996-12-13
FI98000C FI98000C (fi) 1997-03-25

Family

ID=6374857

Family Applications (1)

Application Number Title Priority Date Filing Date
FI900510A FI98000C (fi) 1989-02-24 1990-02-01 Valonherkkä tallennuselementti

Country Status (6)

Country Link
US (1) US5112723A (fi)
EP (1) EP0384366B1 (fi)
JP (1) JP2845546B2 (fi)
DE (2) DE3905765A1 (fi)
FI (1) FI98000C (fi)
NO (1) NO177408C (fi)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5138125B1 (fi) * 1970-12-28 1976-10-20
CN1054320C (zh) * 1994-12-12 2000-07-12 中园修三 动物性废弃物的处理方法
US5912106A (en) * 1996-09-10 1999-06-15 Ciba Specialty Chemicals Corporation Method for improving photoimage quality
WO2015019616A1 (en) * 2013-08-07 2015-02-12 Toyo Gosei Co., Ltd. Reagent for enhancing generation of chemical species

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
US3556794A (en) * 1966-10-03 1971-01-19 Hughes Aircraft Co Method of inhibiting photopolymerization and products therefor
US3607691A (en) * 1968-07-09 1971-09-21 Technical Operations Inc System for the redox photopolymerization of vinyl monomers in the presence of periodates
JPS6032175B2 (ja) * 1977-05-18 1985-07-26 バスフ アクチェン ゲゼルシャフト 版木及びレリ−フ版木を製造するために改良された光重合可能な物質
US4343885A (en) * 1978-05-09 1982-08-10 Dynachem Corporation Phototropic photosensitive compositions containing fluoran colorformer
DE2846647A1 (de) * 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
WO1983003687A1 (en) * 1982-04-07 1983-10-27 Ito, Kengo Image-forming photo-sensitive material
JPS5986045A (ja) * 1982-11-05 1984-05-18 Nippon Soda Co Ltd 永久レジスト用光硬化性樹脂組成物
JPS60165647A (ja) * 1984-02-08 1985-08-28 Hitachi Chem Co Ltd 光重合性組成物
GB2189496B (en) * 1986-04-23 1989-11-29 Hitachi Chemical Co Ltd Photopolymerizable composition
US4849930A (en) * 1987-02-25 1989-07-18 Westinghouse Electric Corp. Method of compactly storing digital data
DE3719871A1 (de) * 1987-06-13 1988-12-29 Basf Ag Durch photopolymerisation vernetzbare heisspraegeplatten
DE3808952A1 (de) * 1988-03-17 1989-10-05 Basf Ag Lichtempfindliche, photopolymerisierbare druckplatte

Also Published As

Publication number Publication date
EP0384366A3 (de) 1991-10-16
NO900867L (no) 1990-08-27
DE59008448D1 (de) 1995-03-23
FI900510A0 (fi) 1990-02-01
FI98000C (fi) 1997-03-25
EP0384366A2 (de) 1990-08-29
DE3905765A1 (de) 1990-08-30
US5112723A (en) 1992-05-12
EP0384366B1 (de) 1995-02-15
JPH032757A (ja) 1991-01-09
JP2845546B2 (ja) 1999-01-13
NO177408B (no) 1995-05-29
NO900867D0 (no) 1990-02-23
NO177408C (no) 1995-09-06

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Legal Events

Date Code Title Description
BB Publication of examined application
MM Patent lapsed

Owner name: BASF AKTIENGESELLSCHAFT