KR900012393A - 발광소자 - Google Patents

발광소자

Info

Publication number
KR900012393A
KR900012393A KR1019900000481A KR900000481A KR900012393A KR 900012393 A KR900012393 A KR 900012393A KR 1019900000481 A KR1019900000481 A KR 1019900000481A KR 900000481 A KR900000481 A KR 900000481A KR 900012393 A KR900012393 A KR 900012393A
Authority
KR
South Korea
Prior art keywords
light emitting
emitting element
light
emitting
Prior art date
Application number
KR1019900000481A
Other languages
English (en)
Other versions
KR930010732B1 (ko
Inventor
다다시 나루사와
Original Assignee
마쯔시다덴기산교 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마쯔시다덴기산교 가부시기가이샤 filed Critical 마쯔시다덴기산교 가부시기가이샤
Publication of KR900012393A publication Critical patent/KR900012393A/ko
Application granted granted Critical
Publication of KR930010732B1 publication Critical patent/KR930010732B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/0955—Processes or apparatus for excitation, e.g. pumping using pumping by high energy particles
    • H01S3/0959—Processes or apparatus for excitation, e.g. pumping using pumping by high energy particles by an electron beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Lasers (AREA)
  • Lasers (AREA)
  • Led Devices (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
KR1019900000481A 1989-01-17 1990-01-16 발광소자 KR930010732B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP820489A JP2548352B2 (ja) 1989-01-17 1989-01-17 発光素子およびその製造方法
JP1-8204 1989-01-17

Publications (2)

Publication Number Publication Date
KR900012393A true KR900012393A (ko) 1990-08-04
KR930010732B1 KR930010732B1 (ko) 1993-11-08

Family

ID=11686724

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900000481A KR930010732B1 (ko) 1989-01-17 1990-01-16 발광소자

Country Status (5)

Country Link
US (1) US5119386A (ko)
EP (1) EP0379325B1 (ko)
JP (1) JP2548352B2 (ko)
KR (1) KR930010732B1 (ko)
DE (1) DE69020367T2 (ko)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2661566B1 (fr) * 1990-04-25 1995-03-31 Commissariat Energie Atomique Laser compact a semi-conducteur du type a pompage electronique.
JP2757596B2 (ja) * 1991-07-18 1998-05-25 松下電器産業株式会社 発光素子
US5536193A (en) 1991-11-07 1996-07-16 Microelectronics And Computer Technology Corporation Method of making wide band gap field emitter
US5679043A (en) 1992-03-16 1997-10-21 Microelectronics And Computer Technology Corporation Method of making a field emitter
US5659224A (en) 1992-03-16 1997-08-19 Microelectronics And Computer Technology Corporation Cold cathode display device
US6127773A (en) 1992-03-16 2000-10-03 Si Diamond Technology, Inc. Amorphic diamond film flat field emission cathode
US5543684A (en) 1992-03-16 1996-08-06 Microelectronics And Computer Technology Corporation Flat panel display based on diamond thin films
US5449970A (en) 1992-03-16 1995-09-12 Microelectronics And Computer Technology Corporation Diode structure flat panel display
US5763997A (en) 1992-03-16 1998-06-09 Si Diamond Technology, Inc. Field emission display device
US5675216A (en) 1992-03-16 1997-10-07 Microelectronics And Computer Technololgy Corp. Amorphic diamond film flat field emission cathode
FR2690005B1 (fr) * 1992-04-10 1994-05-20 Commissariat A Energie Atomique Canon a electrons compact comportant une source d'electrons a micropointes et laser a semi-conducteur utilisant ce canon pour le pompage electronique.
WO1994015369A1 (en) * 1992-12-22 1994-07-07 Research Corporation Technologies, Inc. Group ii-vi compound semiconductor light emitting devices and an ohmic contact therefor
KR100366191B1 (ko) 1993-11-04 2003-03-15 에스아이 다이아몬드 테크놀로지, 인코포레이티드 플랫패널디스플레이시스템및구성소자의제조방법
US6204834B1 (en) 1994-08-17 2001-03-20 Si Diamond Technology, Inc. System and method for achieving uniform screen brightness within a matrix display
US5531880A (en) * 1994-09-13 1996-07-02 Microelectronics And Computer Technology Corporation Method for producing thin, uniform powder phosphor for display screens
US5628659A (en) * 1995-04-24 1997-05-13 Microelectronics And Computer Corporation Method of making a field emission electron source with random micro-tip structures
US6296740B1 (en) 1995-04-24 2001-10-02 Si Diamond Technology, Inc. Pretreatment process for a surface texturing process
DE19531455A1 (de) * 1995-08-26 1997-02-27 Gms Ges Fuer Mes Und Systemtec Strahlungsgepumpter Festkörper-Farbstofflaser
KR101288673B1 (ko) * 2010-06-03 2013-07-22 우시오덴키 가부시키가이샤 자외선 조사장치
JP5383912B2 (ja) * 2010-06-23 2014-01-08 株式会社日立製作所 電子線励起型発光装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890503A (en) * 1968-11-29 1975-06-17 Hewlett Packard Co Stimulated emission light source pumped by electron beam of field emission initiated vacuum arc
JPS4862392A (ko) * 1971-12-06 1973-08-31
US3803510A (en) * 1972-09-27 1974-04-09 Rca Corp Electron-beam pumped laser with extended life
JPS5199464A (ko) * 1975-02-28 1976-09-02 Hitachi Ltd
FR2432213A1 (fr) * 1978-07-25 1980-02-22 Labo Electronique Physique Procede pour souder un objet en sulfure de zinc fritte a un objet en verre, ceramique ou metal, produit obtenu et utilisation dudit produit
NL8300631A (nl) * 1983-02-21 1984-09-17 Philips Nv Inrichting voor het opwekken van coherente straling.
NL8400632A (nl) * 1984-02-29 1985-09-16 Philips Nv Inrichting voor het opwekken van elektromagnetische straling.
EP0184250B1 (en) * 1984-12-04 1992-09-02 Koninklijke Philips Electronics N.V. Electron-beam-pumped semiconductor laser and array

Also Published As

Publication number Publication date
DE69020367T2 (de) 1996-02-29
US5119386A (en) 1992-06-02
KR930010732B1 (ko) 1993-11-08
EP0379325A2 (en) 1990-07-25
JP2548352B2 (ja) 1996-10-30
JPH02188980A (ja) 1990-07-25
DE69020367D1 (de) 1995-08-03
EP0379325A3 (en) 1991-03-20
EP0379325B1 (en) 1995-06-28

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 19961105

Year of fee payment: 4

LAPS Lapse due to unpaid annual fee