FI943894A - Plasmareaktor för ett beläggnings- eller etsningsförfarande - Google Patents

Plasmareaktor för ett beläggnings- eller etsningsförfarande Download PDF

Info

Publication number
FI943894A
FI943894A FI943894A FI943894A FI943894A FI 943894 A FI943894 A FI 943894A FI 943894 A FI943894 A FI 943894A FI 943894 A FI943894 A FI 943894A FI 943894 A FI943894 A FI 943894A
Authority
FI
Finland
Prior art keywords
coating
etching process
plasma reactor
reactor
plasma
Prior art date
Application number
FI943894A
Other languages
English (en)
Finnish (fi)
Other versions
FI117368B (sv
FI943894A0 (sv
Inventor
David Pearson
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Publication of FI943894A0 publication Critical patent/FI943894A0/sv
Publication of FI943894A publication Critical patent/FI943894A/sv
Application granted granted Critical
Publication of FI117368B publication Critical patent/FI117368B/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
FI943894A 1993-08-27 1994-08-24 Plasmareaktor för ett beläggnings- eller etsningsförfarande FI117368B (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9310301A FR2709397B1 (fr) 1993-08-27 1993-08-27 Réacteur à plasma pour un procédé de dépôt ou de gravure.
FR9310301 1993-08-27

Publications (3)

Publication Number Publication Date
FI943894A0 FI943894A0 (sv) 1994-08-24
FI943894A true FI943894A (sv) 1995-02-28
FI117368B FI117368B (sv) 2006-09-15

Family

ID=9450413

Family Applications (1)

Application Number Title Priority Date Filing Date
FI943894A FI117368B (sv) 1993-08-27 1994-08-24 Plasmareaktor för ett beläggnings- eller etsningsförfarande

Country Status (7)

Country Link
US (1) US5401318A (sv)
EP (1) EP0641014B1 (sv)
JP (1) JP3519790B2 (sv)
DE (1) DE69402139T2 (sv)
FI (1) FI117368B (sv)
FR (1) FR2709397B1 (sv)
NO (1) NO308636B1 (sv)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6475333B1 (en) * 1993-07-26 2002-11-05 Nihon Shinku Gijutsu Kabushiki Kaisha Discharge plasma processing device
DE4403125A1 (de) * 1994-02-02 1995-08-03 Fraunhofer Ges Forschung Vorrichtung zur Plasmaerzeugung
US6353206B1 (en) * 1996-05-30 2002-03-05 Applied Materials, Inc. Plasma system with a balanced source
JP2002008996A (ja) * 2000-06-23 2002-01-11 Mitsubishi Heavy Ind Ltd 給電アンテナ及び給電方法
US6402301B1 (en) 2000-10-27 2002-06-11 Lexmark International, Inc Ink jet printheads and methods therefor
US7098599B2 (en) 2000-12-27 2006-08-29 Japan Science & Technology Corporation Plasma generator
KR101479143B1 (ko) * 2010-11-30 2015-01-05 캐논 아네르바 가부시키가이샤 플라즈마 처리 장치
US20140144584A1 (en) * 2012-11-29 2014-05-29 Semes Co., Ltd. Plasma antenna and apparatus for generating plasma having the same
KR101468657B1 (ko) * 2012-12-28 2014-12-03 엘아이지에이디피 주식회사 유도 결합 플라즈마 처리 장치

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986006923A1 (en) * 1985-05-03 1986-11-20 The Australian National University Method and apparatus for producing large volume magnetoplasmas
US5091049A (en) * 1989-06-13 1992-02-25 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US4990229A (en) * 1989-06-13 1991-02-05 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5122251A (en) * 1989-06-13 1992-06-16 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
JPH0711047B2 (ja) * 1990-02-08 1995-02-08 住友軽金属工業株式会社 真空ろう付け用Ａｌ材料
JP2519364B2 (ja) * 1990-12-03 1996-07-31 アプライド マテリアルズ インコーポレイテッド Ｕｈｆ／ｖｈｆ共振アンテナ供給源を用いたプラズマリアクタ
US5280154A (en) * 1992-01-30 1994-01-18 International Business Machines Corporation Radio frequency induction plasma processing system utilizing a uniform field coil

Also Published As

Publication number Publication date
DE69402139T2 (de) 1997-07-03
FI117368B (sv) 2006-09-15
EP0641014A1 (fr) 1995-03-01
JP3519790B2 (ja) 2004-04-19
NO308636B1 (no) 2000-10-02
US5401318A (en) 1995-03-28
FI943894A0 (sv) 1994-08-24
DE69402139D1 (de) 1997-04-24
FR2709397A1 (fr) 1995-03-03
NO943139L (no) 1995-02-28
EP0641014B1 (fr) 1997-03-19
JPH0786191A (ja) 1995-03-31
NO943139D0 (no) 1994-08-25
FR2709397B1 (fr) 1995-09-22

Similar Documents

Publication Publication Date Title
DE69635972D1 (de) Plasma-Ätz-Verfahren
DE69426463T2 (de) Mikrowellenplasmareaktor
FI955542A0 (sv) Kolföreningar och förfaranden för framställning av ett icke-ledande substral för galvanisering
DE69627241D1 (de) Plasmabearbeitungsgerät
GB2224289B (en) Plasma coating process
NO941674D0 (no) Elektrode for anvendelde i en plasma-assistert kjemisk etseprosess
DE69322058D1 (de) Plasma-Ätzverfahren
EP0659927A3 (en) Process for the manufacture of a stain resistant carpet
DE68921286D1 (de) Anlage zur plasmachemischen Gasphasenabscheidung.
FI943894A (sv) Plasmareaktor för ett beläggnings- eller etsningsförfarande
EP0507183A3 (en) Process for selective deposition of a polymer coating
FI103585B1 (sv) Konstruktionsdel samt ett tillverkningsförfarande för denna
FI943184A (sv) Plasmareaktor för en beläggnings- eller etsningsprocess
GB2267291B (en) Plasma deposition process
GB2214870B (en) Plasma etching process
GB2157324B (en) A plasma chemical vapor deposition apparatus
GB9117887D0 (en) A process for cobering a substrate
FR2696969B1 (fr) Procédé d'étalonnage d'un robot.
FI101689B1 (sv) Förfarande för behandling av ett föremål
DE69233144D1 (de) Verfahren zur Plasmabeschichtung
GB2283461B (en) Process for Etching Indium-Tin Oxide Coatings
FI946024A (sv) Förfarande för inaktivering av ett katalasenzym
KR960700277A (ko) 담체 물질을 제조하는 방법(a process for forming a carrier material)
FI101697B1 (sv) Ett förfarande samt en anordning för bombering av glasskivor
KR900008714A (ko) 플라즈마 화학기상증착에 의한 박막제조방법

Legal Events

Date Code Title Description
FG Patent granted

Ref document number: 117368

Country of ref document: FI

MA Patent expired