FI943894A - Plasmareaktori kerrostusmenetelmää tai gravyyria varten - Google Patents

Plasmareaktori kerrostusmenetelmää tai gravyyria varten Download PDF

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Publication number
FI943894A
FI943894A FI943894A FI943894A FI943894A FI 943894 A FI943894 A FI 943894A FI 943894 A FI943894 A FI 943894A FI 943894 A FI943894 A FI 943894A FI 943894 A FI943894 A FI 943894A
Authority
FI
Finland
Prior art keywords
coating
etching process
plasma reactor
reactor
plasma
Prior art date
Application number
FI943894A
Other languages
English (en)
Swedish (sv)
Other versions
FI117368B (fi
FI943894A0 (fi
Inventor
David Pearson
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Publication of FI943894A0 publication Critical patent/FI943894A0/fi
Publication of FI943894A publication Critical patent/FI943894A/fi
Application granted granted Critical
Publication of FI117368B publication Critical patent/FI117368B/fi

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
FI943894A 1993-08-27 1994-08-24 Plasmareaktori päällystys- tai syövytysmenetelmää varten FI117368B (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9310301A FR2709397B1 (fr) 1993-08-27 1993-08-27 Réacteur à plasma pour un procédé de dépôt ou de gravure.
FR9310301 1993-08-27

Publications (3)

Publication Number Publication Date
FI943894A0 FI943894A0 (fi) 1994-08-24
FI943894A true FI943894A (fi) 1995-02-28
FI117368B FI117368B (fi) 2006-09-15

Family

ID=9450413

Family Applications (1)

Application Number Title Priority Date Filing Date
FI943894A FI117368B (fi) 1993-08-27 1994-08-24 Plasmareaktori päällystys- tai syövytysmenetelmää varten

Country Status (7)

Country Link
US (1) US5401318A (fi)
EP (1) EP0641014B1 (fi)
JP (1) JP3519790B2 (fi)
DE (1) DE69402139T2 (fi)
FI (1) FI117368B (fi)
FR (1) FR2709397B1 (fi)
NO (1) NO308636B1 (fi)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6475333B1 (en) * 1993-07-26 2002-11-05 Nihon Shinku Gijutsu Kabushiki Kaisha Discharge plasma processing device
DE4403125A1 (de) * 1994-02-02 1995-08-03 Fraunhofer Ges Forschung Vorrichtung zur Plasmaerzeugung
US6353206B1 (en) * 1996-05-30 2002-03-05 Applied Materials, Inc. Plasma system with a balanced source
JP2002008996A (ja) * 2000-06-23 2002-01-11 Mitsubishi Heavy Ind Ltd 給電アンテナ及び給電方法
US6402301B1 (en) 2000-10-27 2002-06-11 Lexmark International, Inc Ink jet printheads and methods therefor
WO2002056649A1 (fr) 2000-12-27 2002-07-18 Japan Science And Technology Corporation Generateur plasma
WO2012073449A1 (ja) * 2010-11-30 2012-06-07 キヤノンアネルバ株式会社 プラズマ処理装置
US20140144584A1 (en) * 2012-11-29 2014-05-29 Semes Co., Ltd. Plasma antenna and apparatus for generating plasma having the same
KR101468657B1 (ko) * 2012-12-28 2014-12-03 엘아이지에이디피 주식회사 유도 결합 플라즈마 처리 장치

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1247757A (en) * 1985-05-03 1988-12-28 The Australian National University Method and apparatus for producing large volume magnetoplasmas
US4990229A (en) * 1989-06-13 1991-02-05 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5091049A (en) * 1989-06-13 1992-02-25 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
US5122251A (en) * 1989-06-13 1992-06-16 Plasma & Materials Technologies, Inc. High density plasma deposition and etching apparatus
JPH0711047B2 (ja) * 1990-02-08 1995-02-08 住友軽金属工業株式会社 真空ろう付け用Ａｌ材料
JP2519364B2 (ja) * 1990-12-03 1996-07-31 アプライド マテリアルズ インコーポレイテッド Ｕｈｆ／ｖｈｆ共振アンテナ供給源を用いたプラズマリアクタ
US5280154A (en) * 1992-01-30 1994-01-18 International Business Machines Corporation Radio frequency induction plasma processing system utilizing a uniform field coil

Also Published As

Publication number Publication date
EP0641014B1 (fr) 1997-03-19
JPH0786191A (ja) 1995-03-31
NO943139L (no) 1995-02-28
US5401318A (en) 1995-03-28
NO943139D0 (no) 1994-08-25
FR2709397B1 (fr) 1995-09-22
EP0641014A1 (fr) 1995-03-01
JP3519790B2 (ja) 2004-04-19
FR2709397A1 (fr) 1995-03-03
FI117368B (fi) 2006-09-15
FI943894A0 (fi) 1994-08-24
DE69402139T2 (de) 1997-07-03
DE69402139D1 (de) 1997-04-24
NO308636B1 (no) 2000-10-02

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