DE69233144D1 - Verfahren zur Plasmabeschichtung - Google Patents

Verfahren zur Plasmabeschichtung

Info

Publication number
DE69233144D1
DE69233144D1 DE69233144T DE69233144T DE69233144D1 DE 69233144 D1 DE69233144 D1 DE 69233144D1 DE 69233144 T DE69233144 T DE 69233144T DE 69233144 T DE69233144 T DE 69233144T DE 69233144 D1 DE69233144 D1 DE 69233144D1
Authority
DE
Germany
Prior art keywords
coating process
plasma coating
plasma
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69233144T
Other languages
English (en)
Other versions
DE69233144T2 (de
Inventor
Gordon L Cann
Shepard, Jr
Frank L Mckevitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Celestech Inc
Original Assignee
Celestech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/698,538 external-priority patent/US5342660A/en
Priority claimed from US07/698,446 external-priority patent/US5204144A/en
Application filed by Celestech Inc filed Critical Celestech Inc
Publication of DE69233144D1 publication Critical patent/DE69233144D1/de
Application granted granted Critical
Publication of DE69233144T2 publication Critical patent/DE69233144T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/276—Diamond only using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/277—Diamond only using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE1992633144 1991-05-10 1992-05-08 Verfahren zur Plasmabeschichtung Expired - Fee Related DE69233144T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US698446 1991-05-10
US698538 1991-05-10
US07/698,538 US5342660A (en) 1991-05-10 1991-05-10 Method for plasma jet deposition
US07/698,446 US5204144A (en) 1991-05-10 1991-05-10 Method for plasma deposition on apertured substrates

Publications (2)

Publication Number Publication Date
DE69233144D1 true DE69233144D1 (de) 2003-09-04
DE69233144T2 DE69233144T2 (de) 2004-05-13

Family

ID=27106210

Family Applications (2)

Application Number Title Priority Date Filing Date
DE1992633144 Expired - Fee Related DE69233144T2 (de) 1991-05-10 1992-05-08 Verfahren zur Plasmabeschichtung
DE69231293T Expired - Fee Related DE69231293T2 (de) 1991-05-10 1992-05-08 Verfahren und vorrichtung zur plasmabeschichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69231293T Expired - Fee Related DE69231293T2 (de) 1991-05-10 1992-05-08 Verfahren und vorrichtung zur plasmabeschichtung

Country Status (5)

Country Link
EP (3) EP0583374B1 (de)
JP (2) JP3350929B2 (de)
CA (2) CA2102781C (de)
DE (2) DE69233144T2 (de)
WO (1) WO1992020464A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4437053A1 (de) * 1994-10-18 1996-02-08 Widia Gmbh WC-Hartlegierung, Verfahren zu seiner Herstellung und seiner Verwendung
US5587207A (en) * 1994-11-14 1996-12-24 Gorokhovsky; Vladimir I. Arc assisted CVD coating and sintering method
US5753045A (en) * 1995-01-25 1998-05-19 Balzers Aktiengesellschaft Vacuum treatment system for homogeneous workpiece processing
EP0724026B1 (de) * 1995-01-25 1999-10-13 Balzers Aktiengesellschaft Verfahren zur reaktiven Schichtabscheidung
US5762715A (en) * 1995-06-07 1998-06-09 Saint-Gobain/Norton Industrial Ceramics Corporation Segmented substrate for improved ARC-JET diamond deposition
CN109371379B (zh) * 2018-12-03 2021-05-11 湖南顶立科技有限公司 一种沉积装置及制备热解炭的方法
EP4076719A1 (de) * 2019-12-20 2022-10-26 Crystaphase Products Inc. Rücksättigung von gas in einen flüssigkeitszufuhrstrom

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4261650A (en) * 1978-12-18 1981-04-14 International Business Machines Corporation Method for producing uniform parallel alignment in liquid crystal cells
US4292342A (en) * 1980-05-09 1981-09-29 Motorola, Inc. High pressure plasma deposition of silicon
US4487162A (en) * 1980-11-25 1984-12-11 Cann Gordon L Magnetoplasmadynamic apparatus for the separation and deposition of materials
US4505947A (en) * 1982-07-14 1985-03-19 The Standard Oil Company (Ohio) Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasma
JPS5921026A (ja) * 1982-07-28 1984-02-02 Hitachi Ltd 半導体製造装置
JPS5943861A (ja) * 1982-09-03 1984-03-12 Ulvac Corp ル−バ−式化学的蒸着装置
DE3422718A1 (de) * 1984-06-19 1986-01-09 Plasmainvent AG, Zug Vakuum-plasma-beschichtungsanlage
JPS63107898A (ja) * 1986-10-23 1988-05-12 Natl Inst For Res In Inorg Mater プラズマを用いるダイヤモンドの合成法
JP2783796B2 (ja) * 1987-05-22 1998-08-06 キヤノン株式会社 堆積膜形成装置及びプラズマ処理装置
JPH01157498A (ja) * 1987-12-14 1989-06-20 Natl Inst For Res In Inorg Mater 高温プラズマによるダイヤモンドの製造法
JPH01242141A (ja) * 1988-03-23 1989-09-27 Hitachi Ltd 高気圧マイクロ波プラズマ反応装置
JPH01312008A (ja) * 1988-06-11 1989-12-15 Nkk Corp 金属間化合物合金材の製造方法
JP2841715B2 (ja) * 1989-06-21 1998-12-24 株式会社日本自動車部品総合研究所 ダイヤモンド膜の製造装置および製造方法
US5094878A (en) * 1989-06-21 1992-03-10 Nippon Soken, Inc. Process for forming diamond film
JPH0780718B2 (ja) * 1989-08-04 1995-08-30 トヨタ自動車株式会社 ダイヤモンドの合成方法および合成装置

Also Published As

Publication number Publication date
DE69231293D1 (de) 2000-08-31
CA2102781C (en) 2003-11-18
EP0969120B1 (de) 2003-07-30
JP3350929B2 (ja) 2002-11-25
JP2003041373A (ja) 2003-02-13
EP1302248A2 (de) 2003-04-16
EP0583374A4 (de) 1995-05-03
EP0583374B1 (de) 2000-07-26
CA2443497A1 (en) 1992-11-26
JP3470715B2 (ja) 2003-11-25
DE69233144T2 (de) 2004-05-13
WO1992020464A1 (en) 1992-11-26
EP0969120A3 (de) 2000-04-12
EP1302248A3 (de) 2003-07-09
DE69231293T2 (de) 2001-03-15
EP0583374A1 (de) 1994-02-23
EP0969120A2 (de) 2000-01-05
CA2102781A1 (en) 1992-11-11
JPH06510566A (ja) 1994-11-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee