FI913175A7 - Foerfarande foer framstaellning av polymerer och kopolymerer med laog optisk taethet foer fotoresist- och optiska anvaendningar. - Google Patents

Foerfarande foer framstaellning av polymerer och kopolymerer med laog optisk taethet foer fotoresist- och optiska anvaendningar. Download PDF

Info

Publication number
FI913175A7
FI913175A7 FI913175A FI913175A FI913175A7 FI 913175 A7 FI913175 A7 FI 913175A7 FI 913175 A FI913175 A FI 913175A FI 913175 A FI913175 A FI 913175A FI 913175 A7 FI913175 A7 FI 913175A7
Authority
FI
Finland
Prior art keywords
och
foer
taethet
optiska
kopolymerer
Prior art date
Application number
FI913175A
Other languages
English (en)
Finnish (fi)
Other versions
FI913175A0 (fi
Inventor
Michael T Sheehan
James H Rea
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27415527&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=FI913175(A7) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US07/706,601 external-priority patent/US5239015A/en
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of FI913175A0 publication Critical patent/FI913175A0/fi
Publication of FI913175A7 publication Critical patent/FI913175A7/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
FI913175A 1990-06-29 1991-06-28 Foerfarande foer framstaellning av polymerer och kopolymerer med laog optisk taethet foer fotoresist- och optiska anvaendningar. FI913175A7 (fi)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US54834490A 1990-06-29 1990-06-29
US60484790A 1990-10-26 1990-10-26
US07/706,601 US5239015A (en) 1990-06-29 1991-05-28 Process for making low optical density polymers and copolymers for photoresists and optical applications

Publications (2)

Publication Number Publication Date
FI913175A0 FI913175A0 (fi) 1991-06-28
FI913175A7 true FI913175A7 (fi) 1991-12-30

Family

ID=27415527

Family Applications (1)

Application Number Title Priority Date Filing Date
FI913175A FI913175A7 (fi) 1990-06-29 1991-06-28 Foerfarande foer framstaellning av polymerer och kopolymerer med laog optisk taethet foer fotoresist- och optiska anvaendningar.

Country Status (17)

Country Link
EP (1) EP0466359B2 (cs)
JP (1) JP3022932B2 (cs)
KR (1) KR100201375B1 (cs)
CN (1) CN1057847A (cs)
AT (1) ATE192753T1 (cs)
AU (1) AU7945691A (cs)
CS (1) CS184091A3 (cs)
DE (1) DE69132181T3 (cs)
FI (1) FI913175A7 (cs)
HU (1) HUT64986A (cs)
IE (1) IE64029B1 (cs)
IL (1) IL98605A (cs)
NO (1) NO178155C (cs)
PH (1) PH30779A (cs)
PL (1) PL290835A1 (cs)
SG (1) SG46518A1 (cs)
TW (1) TW219368B (cs)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4300209A1 (de) * 1993-01-07 1994-07-14 Basf Ag Verfahren zur Herstellung von p-Hydroxystyrolpolymerisaten und deren Verwendung
US5324788A (en) * 1993-04-30 1994-06-28 Eastman Kodak Company Thermosetting coating compositions
KR100332915B1 (ko) * 1997-12-23 2002-10-25 주식회사 포스코 접착력 및 내식성이 개선된 강판 피복용 스티렌 고분자 킬레이트 접착제 제조방법
TWI226339B (en) 1999-03-26 2005-01-11 Shinetsu Chemical Co High molecular weight compound and the method to prepare the same
JP2002302515A (ja) 2001-04-04 2002-10-18 Gun Ei Chem Ind Co Ltd レジスト用高分子化合物の製造方法
TWI267697B (en) * 2001-06-28 2006-12-01 Tokyo Ohka Kogyo Co Ltd Chemical amplified type positive resist component and resist packed-layer material and forming method of resist pattern and manufacturing method of semiconductor device
US7343225B2 (en) * 2005-06-03 2008-03-11 Univation Technologies, Llc Method for reducing off-grade product production during reaction transitions
KR101375894B1 (ko) * 2009-08-21 2014-03-18 닛뽕소다 가부시키가이샤 변성 폴리실록산 화합물의 제조 방법
KR102245076B1 (ko) * 2020-08-26 2021-04-28 로움하이텍 주식회사 비닐페놀계 중합체의 제조방법
KR102245074B1 (ko) * 2020-09-17 2021-04-28 로움하이텍 주식회사 비닐페놀계 중합체의 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB948961A (en) * 1960-01-22 1964-02-05 Nat Res Dev Polymers derived from polyvinyl phenol
EP0277721A3 (en) * 1987-01-28 1989-03-15 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol)
US4898916A (en) * 1987-03-05 1990-02-06 Hoechst Celanese Corporation Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification
EP0353339A3 (en) * 1988-08-02 1990-05-09 Hoechst Aktiengesellschaft A process for the production of poly(3-mono or 3,5-disubstituted-4-acetoxystryrenes), their copolymers and hydrolysis thereof

Also Published As

Publication number Publication date
IE912267A1 (en) 1992-01-01
PH30779A (en) 1997-10-17
EP0466359B2 (en) 2003-07-23
TW219368B (cs) 1994-01-21
KR100201375B1 (ko) 1999-06-15
KR920000807A (ko) 1992-01-29
HUT64986A (en) 1994-03-28
DE69132181T2 (de) 2000-12-14
IL98605A (en) 1995-03-15
IL98605A0 (en) 1992-07-15
CN1057847A (zh) 1992-01-15
PL290835A1 (en) 1992-03-23
AU7945691A (en) 1992-01-02
IE64029B1 (en) 1995-06-28
NO912557D0 (no) 1991-06-28
EP0466359A3 (en) 1992-07-01
JP3022932B2 (ja) 2000-03-21
EP0466359B1 (en) 2000-05-10
EP0466359A2 (en) 1992-01-15
FI913175A0 (fi) 1991-06-28
DE69132181T3 (de) 2004-05-06
NO178155B (no) 1995-10-23
SG46518A1 (en) 1998-02-20
ATE192753T1 (de) 2000-05-15
CS184091A3 (en) 1992-03-18
DE69132181D1 (de) 2000-06-15
JPH04279608A (ja) 1992-10-05
HU911969D0 (en) 1991-12-30
NO178155C (no) 1996-01-31
NO912557L (no) 1991-12-30

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