FI890497A - Hiukkaslähde reaktiivista ionisäde-etsaus- tai plasmakerrostuslaitteistoa varten - Google Patents

Hiukkaslähde reaktiivista ionisäde-etsaus- tai plasmakerrostuslaitteistoa varten Download PDF

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Publication number
FI890497A
FI890497A FI890497A FI890497A FI890497A FI 890497 A FI890497 A FI 890497A FI 890497 A FI890497 A FI 890497A FI 890497 A FI890497 A FI 890497A FI 890497 A FI890497 A FI 890497A
Authority
FI
Finland
Prior art keywords
particle source
container
ion beam
reactive ion
plasma deposition
Prior art date
Application number
FI890497A
Other languages
English (en)
Swedish (sv)
Other versions
FI890497A0 (fi
FI95340B (fi
FI95340C (fi
Inventor
Werner Katzschner
Stefan Eichholz
Michael Geisler
Michael Jung
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Ag filed Critical Leybold Ag
Publication of FI890497A0 publication Critical patent/FI890497A0/fi
Publication of FI890497A publication Critical patent/FI890497A/fi
Publication of FI95340B publication Critical patent/FI95340B/fi
Application granted granted Critical
Publication of FI95340C publication Critical patent/FI95340C/fi

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
FI890497A 1988-02-05 1989-02-02 Hiukkaslähde reaktiivista ionisäde-etsaus- tai plasmakerrostuslaitteistoa varten FI95340C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3803355 1988-02-05
DE3803355A DE3803355A1 (de) 1988-02-05 1988-02-05 Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage

Publications (4)

Publication Number Publication Date
FI890497A0 FI890497A0 (fi) 1989-02-02
FI890497A true FI890497A (fi) 1989-08-06
FI95340B FI95340B (fi) 1995-09-29
FI95340C FI95340C (fi) 1996-01-10

Family

ID=6346638

Family Applications (1)

Application Number Title Priority Date Filing Date
FI890497A FI95340C (fi) 1988-02-05 1989-02-02 Hiukkaslähde reaktiivista ionisäde-etsaus- tai plasmakerrostuslaitteistoa varten

Country Status (7)

Country Link
US (1) US4987346A (fi)
EP (1) EP0326824B1 (fi)
JP (1) JPH02103932A (fi)
KR (1) KR920003019B1 (fi)
AT (1) ATE104089T1 (fi)
DE (2) DE3803355A1 (fi)
FI (1) FI95340C (fi)

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Also Published As

Publication number Publication date
FI890497A0 (fi) 1989-02-02
EP0326824A2 (de) 1989-08-09
ATE104089T1 (de) 1994-04-15
JPH02103932A (ja) 1990-04-17
DE58907368D1 (de) 1994-05-11
DE3803355C2 (fi) 1990-04-05
FI95340B (fi) 1995-09-29
FI95340C (fi) 1996-01-10
DE3803355A1 (de) 1989-08-17
EP0326824A3 (en) 1990-01-31
KR920003019B1 (ko) 1992-04-13
US4987346A (en) 1991-01-22
EP0326824B1 (de) 1994-04-06
KR890013968A (ko) 1989-09-26

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Owner name: LEYBOLD AKTIENGESELLSCHAFT