FR2722213B1 - Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions - Google Patents

Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions

Info

Publication number
FR2722213B1
FR2722213B1 FR9408279A FR9408279A FR2722213B1 FR 2722213 B1 FR2722213 B1 FR 2722213B1 FR 9408279 A FR9408279 A FR 9408279A FR 9408279 A FR9408279 A FR 9408279A FR 2722213 B1 FR2722213 B1 FR 2722213B1
Authority
FR
France
Prior art keywords
vacuum
creating
processing
ion beam
energy ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9408279A
Other languages
English (en)
Other versions
FR2722213A1 (fr
Inventor
Louis Wartski
Veronique Roy
Christian Schwebel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasmion
Original Assignee
Plasmion
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasmion filed Critical Plasmion
Priority to FR9408279A priority Critical patent/FR2722213B1/fr
Priority to US08/765,348 priority patent/US5754008A/en
Priority to PCT/FR1995/000900 priority patent/WO1996001490A1/fr
Priority to JP8503710A priority patent/JPH10506220A/ja
Priority to EP95925012A priority patent/EP0769201A1/fr
Publication of FR2722213A1 publication Critical patent/FR2722213A1/fr
Application granted granted Critical
Publication of FR2722213B1 publication Critical patent/FR2722213B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/0817—Microwaves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/083—Beam forming

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
FR9408279A 1994-07-05 1994-07-05 Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions Expired - Fee Related FR2722213B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR9408279A FR2722213B1 (fr) 1994-07-05 1994-07-05 Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions
US08/765,348 US5754008A (en) 1994-07-05 1995-07-05 Device for creating a beam of adjustable-energy ions particularly for sequential vacuum treatment of surfaces with large dimensions
PCT/FR1995/000900 WO1996001490A1 (fr) 1994-07-05 1995-07-05 Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions
JP8503710A JPH10506220A (ja) 1994-07-05 1995-07-05 特に、大きい表面の連続真空処理用のエネルギー調節可能なイオンビーム発生装置
EP95925012A EP0769201A1 (fr) 1994-07-05 1995-07-05 Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9408279A FR2722213B1 (fr) 1994-07-05 1994-07-05 Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions

Publications (2)

Publication Number Publication Date
FR2722213A1 FR2722213A1 (fr) 1996-01-12
FR2722213B1 true FR2722213B1 (fr) 1996-09-20

Family

ID=9465003

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9408279A Expired - Fee Related FR2722213B1 (fr) 1994-07-05 1994-07-05 Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions

Country Status (5)

Country Link
US (1) US5754008A (fr)
EP (1) EP0769201A1 (fr)
JP (1) JPH10506220A (fr)
FR (1) FR2722213B1 (fr)
WO (1) WO1996001490A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2349005B (en) * 1999-01-27 2003-07-02 Jacqueline Anne Moore Directional pedestrian information aid
US6375790B1 (en) 1999-07-19 2002-04-23 Epion Corporation Adaptive GCIB for smoothing surfaces
US6873113B2 (en) 2000-04-13 2005-03-29 Tokyo Electron Limited Stand alone plasma vacuum pump
US6729850B2 (en) 2001-10-31 2004-05-04 Tokyo Electron Limited Applied plasma duct system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
US4894546A (en) * 1987-03-11 1990-01-16 Nihon Shinku Gijutsu Kabushiki Kaisha Hollow cathode ion sources
DE3803355A1 (de) * 1988-02-05 1989-08-17 Leybold Ag Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage
JP2546357B2 (ja) * 1988-11-11 1996-10-23 日新電機株式会社 プラズマ発生装置およびそれを用いたイオン源
US4906900A (en) * 1989-04-03 1990-03-06 Board Of Trustees Operating Michigan State University Coaxial cavity type, radiofrequency wave, plasma generating apparatus
JPH03111577A (ja) * 1989-09-26 1991-05-13 Idemitsu Petrochem Co Ltd マイクロ波プラズマ発生装置およびそれを利用するダイヤモンド膜の製造方法
DE4037091C2 (de) * 1990-11-22 1996-06-20 Leybold Ag Vorrichtung für die Erzeugung eines homogenen Mikrowellenfeldes
US5218210A (en) * 1992-02-18 1993-06-08 Eaton Corporation Broad beam flux density control

Also Published As

Publication number Publication date
WO1996001490A1 (fr) 1996-01-18
US5754008A (en) 1998-05-19
EP0769201A1 (fr) 1997-04-23
JPH10506220A (ja) 1998-06-16
FR2722213A1 (fr) 1996-01-12

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Legal Events

Date Code Title Description
ST Notification of lapse