FI123539B - ALD-reaktori, menetelmä ALD-reaktorin lataamiseksi ja tuotantolinja - Google Patents

ALD-reaktori, menetelmä ALD-reaktorin lataamiseksi ja tuotantolinja Download PDF

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Publication number
FI123539B
FI123539B FI20095126A FI20095126A FI123539B FI 123539 B FI123539 B FI 123539B FI 20095126 A FI20095126 A FI 20095126A FI 20095126 A FI20095126 A FI 20095126A FI 123539 B FI123539 B FI 123539B
Authority
FI
Finland
Prior art keywords
reaction chamber
substrate
plate
ald reactor
chamber
Prior art date
Application number
FI20095126A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Other versions
FI20095126A0 (fi
FI20095126L (fi
Inventor
Pekka Soininen
Jarmo Skarp
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20095126A priority Critical patent/FI123539B/fi
Publication of FI20095126A0 publication Critical patent/FI20095126A0/fi
Priority to EA201171016A priority patent/EA026239B1/ru
Priority to US13/143,317 priority patent/US20110274837A1/en
Priority to EP10738250.9A priority patent/EP2393961A4/de
Priority to CN2010800068019A priority patent/CN102308021B/zh
Priority to PCT/FI2010/050080 priority patent/WO2010089461A1/en
Priority to TW099103757A priority patent/TW201038765A/zh
Publication of FI20095126L publication Critical patent/FI20095126L/fi
Application granted granted Critical
Publication of FI123539B publication Critical patent/FI123539B/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45517—Confinement of gases to vicinity of substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FI20095126A 2009-02-09 2009-02-09 ALD-reaktori, menetelmä ALD-reaktorin lataamiseksi ja tuotantolinja FI123539B (fi)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FI20095126A FI123539B (fi) 2009-02-09 2009-02-09 ALD-reaktori, menetelmä ALD-reaktorin lataamiseksi ja tuotantolinja
EA201171016A EA026239B1 (ru) 2009-02-09 2010-02-08 Реактор послойного атомного осаждения, способ загрузки этого реактора и технологическая линия
US13/143,317 US20110274837A1 (en) 2009-02-09 2010-02-08 Ald reactor, method for loading ald reactor, and production line
EP10738250.9A EP2393961A4 (de) 2009-02-09 2010-02-08 Atomlagenabscheidungsreaktor, verfahren zur beladung eines atomlagenabscheidungsreaktor und fertigungslinie
CN2010800068019A CN102308021B (zh) 2009-02-09 2010-02-08 Ald反应器，用来装载ald反应器的方法，和生产线
PCT/FI2010/050080 WO2010089461A1 (en) 2009-02-09 2010-02-08 Ald reactor, method for loading ald reactor, and production line
TW099103757A TW201038765A (en) 2009-02-09 2010-02-08 ALD reactor, method for loading ALD reactor, and production line

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20095126 2009-02-09
FI20095126A FI123539B (fi) 2009-02-09 2009-02-09 ALD-reaktori, menetelmä ALD-reaktorin lataamiseksi ja tuotantolinja

Publications (3)

Publication Number Publication Date
FI20095126A0 FI20095126A0 (fi) 2009-02-09
FI20095126L FI20095126L (fi) 2010-08-10
FI123539B true FI123539B (fi) 2013-06-28

Family

ID=40404629

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20095126A FI123539B (fi) 2009-02-09 2009-02-09 ALD-reaktori, menetelmä ALD-reaktorin lataamiseksi ja tuotantolinja

Country Status (7)

Country Link
US (1) US20110274837A1 (de)
EP (1) EP2393961A4 (de)
CN (1) CN102308021B (de)
EA (1) EA026239B1 (de)
FI (1) FI123539B (de)
TW (1) TW201038765A (de)
WO (1) WO2010089461A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI20115073A0 (fi) * 2011-01-26 2011-01-26 Beneq Oy Laitteisto, menetelmä ja reaktiokammio
EP2592173A3 (de) * 2011-11-08 2014-03-05 FHR Anlagenbau GmbH Anordnung und Verfahren zur Durchführung eines Niedertemperatur - ALD-Prozesses
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US10590535B2 (en) * 2017-07-26 2020-03-17 Asm Ip Holdings B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI118342B (fi) * 1999-05-10 2007-10-15 Asm Int Laite ohutkalvojen valmistamiseksi
US20020076481A1 (en) * 2000-12-15 2002-06-20 Chiang Tony P. Chamber pressure state-based control for a reactor
US20020129768A1 (en) * 2001-03-15 2002-09-19 Carpenter Craig M. Chemical vapor deposition apparatuses and deposition methods
US7138336B2 (en) * 2001-08-06 2006-11-21 Asm Genitech Korea Ltd. Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereof
US6916398B2 (en) * 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition
US6866746B2 (en) 2002-01-26 2005-03-15 Applied Materials, Inc. Clamshell and small volume chamber with fixed substrate support
US20040013803A1 (en) * 2002-07-16 2004-01-22 Applied Materials, Inc. Formation of titanium nitride films using a cyclical deposition process
US7601223B2 (en) * 2003-04-29 2009-10-13 Asm International N.V. Showerhead assembly and ALD methods
US20050252449A1 (en) * 2004-05-12 2005-11-17 Nguyen Son T Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US8211235B2 (en) * 2005-03-04 2012-07-03 Picosun Oy Apparatuses and methods for deposition of material on surfaces
US20070119371A1 (en) * 2005-11-04 2007-05-31 Paul Ma Apparatus and process for plasma-enhanced atomic layer deposition
US7615486B2 (en) * 2007-04-17 2009-11-10 Lam Research Corporation Apparatus and method for integrated surface treatment and deposition for copper interconnect
US7781031B2 (en) * 2006-12-06 2010-08-24 General Electric Company Barrier layer, composite article comprising the same, electroactive device, and method
US8043432B2 (en) * 2007-02-12 2011-10-25 Tokyo Electron Limited Atomic layer deposition systems and methods
US20090004405A1 (en) * 2007-06-29 2009-01-01 Applied Materials, Inc. Thermal Batch Reactor with Removable Susceptors
US20100037824A1 (en) * 2008-08-13 2010-02-18 Synos Technology, Inc. Plasma Reactor Having Injector

Also Published As

Publication number Publication date
TW201038765A (en) 2010-11-01
US20110274837A1 (en) 2011-11-10
FI20095126A0 (fi) 2009-02-09
WO2010089461A1 (en) 2010-08-12
CN102308021B (zh) 2013-11-06
EP2393961A4 (de) 2014-12-10
EP2393961A1 (de) 2011-12-14
CN102308021A (zh) 2012-01-04
EA201171016A1 (ru) 2012-02-28
FI20095126L (fi) 2010-08-10
EA026239B1 (ru) 2017-03-31

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