ES8400608A1 - Procedimiento para la preparacion de un patron de fotorresina. - Google Patents
Procedimiento para la preparacion de un patron de fotorresina.Info
- Publication number
- ES8400608A1 ES8400608A1 ES515332A ES515332A ES8400608A1 ES 8400608 A1 ES8400608 A1 ES 8400608A1 ES 515332 A ES515332 A ES 515332A ES 515332 A ES515332 A ES 515332A ES 8400608 A1 ES8400608 A1 ES 8400608A1
- Authority
- ES
- Spain
- Prior art keywords
- radiation
- compound
- groups
- copying material
- polymeric binder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/224—Anti-weld compositions; Braze stop-off compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polymerisation Methods In General (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Epoxy Resins (AREA)
- Developing Agents For Electrophotography (AREA)
- Polyurethanes Or Polyureas (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Graft Or Block Polymers (AREA)
- Pinball Game Machines (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Prostheses (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
PROCEDIMIENTO PARA LA PREPARACION DE UN PATRON DE FOTORRESINA.SE LAMINA UN MATERIAL DE COPIA FOTOPOLIMERIZABLE A BASE DE UN SUSTRATO PROVISIONAL TRANSPARENTE Y FLEXIBLE Y DE UNA CAPA TERMOPLASTICA TRANSFERIBLE FOTOPOLIMERIZABLE, QUE CONTIENE, UN COMPUESTO CON DOS GRUPOS ETILENICAMENTE INSATURADOS EN POSICION TERMINAL, CAPAZ DE FORMAR UN POLIMERO RETICULADO MEDIANTE POLIMERIZACION POR ADICION DE RADICALES, UN AGLUTINANTE POLIMERICO, UN INDICADOR DE FOTOPOLIMERIZACION Y UN COMPUESTO TERMICAMENTE RETICULABLE CON EL AGLUTINANTE Y QUE CONTIENE AL MENOS TRES GRUPOS EPOXI,LAMINANDOSE CON PRESION Y CALENTAMIENTO SOBRE UN SUSTRATO PERMANENTE. SE EXPONE BAJO UN PATRON, SE RETIRA EL SUSTRATO PROVISIONAL, SE TRANSFORMA EN IMAGEN LA CAPA FOTOPOLIMERIZABLE DEJADA AL DESCUBIERTO Y LA IMAGEN REVELADA SE CALIENTA DURANTE 10 A 60 MINUTOS A UNA TEMPERATURA DE 80 A 150JC PARA RETICULAR LA CAPA FOTOPOLIMERIZABLE.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19813134123 DE3134123A1 (de) | 1981-08-28 | 1981-08-28 | Durch strahlung polymerisierbares gemisch und daraushergestelltes photopolymerisierbares kopiermaterial |
Publications (2)
Publication Number | Publication Date |
---|---|
ES515332A0 ES515332A0 (es) | 1983-11-01 |
ES8400608A1 true ES8400608A1 (es) | 1983-11-01 |
Family
ID=6140362
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES515332A Expired ES8400608A1 (es) | 1981-08-28 | 1982-08-27 | Procedimiento para la preparacion de un patron de fotorresina. |
Country Status (15)
Country | Link |
---|---|
US (1) | US4438189A (es) |
EP (1) | EP0073444B1 (es) |
JP (1) | JPS5842040A (es) |
KR (1) | KR880002535B1 (es) |
AT (1) | ATE18470T1 (es) |
AU (1) | AU552582B2 (es) |
CA (1) | CA1185389A (es) |
DE (2) | DE3134123A1 (es) |
ES (1) | ES8400608A1 (es) |
FI (1) | FI73841C (es) |
HK (1) | HK28187A (es) |
IL (1) | IL66659A (es) |
MY (1) | MY8700458A (es) |
SG (1) | SG6787G (es) |
ZA (1) | ZA825843B (es) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5990846A (ja) * | 1982-11-16 | 1984-05-25 | Toray Ind Inc | 感放射線材料 |
JPS59218441A (ja) * | 1983-04-25 | 1984-12-08 | Nippon Soda Co Ltd | 発色性感光性樹脂組成物 |
DE3328285A1 (de) * | 1983-08-05 | 1985-02-21 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von lichtgehaerteten schichten mit definierter haerte |
DE3329443A1 (de) * | 1983-08-16 | 1985-03-07 | Hoechst Ag, 6230 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes kopiermaterial |
US4476215A (en) * | 1983-11-25 | 1984-10-09 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist composition |
ATE37242T1 (de) * | 1984-02-10 | 1988-09-15 | Ciba Geigy Ag | Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung. |
DE3412992A1 (de) * | 1984-04-06 | 1985-10-24 | Hoechst Ag, 6230 Frankfurt | Durch strahlung polymerisierbares gemisch und verfahren zum aufbringen von markierungen auf eine loetstopresistschicht |
DE3418190A1 (de) * | 1984-05-16 | 1985-11-21 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Verfahren zur datenspeicherung in und datenauslesung aus resistschichten |
US4600683A (en) * | 1985-04-22 | 1986-07-15 | International Business Machines Corp. | Cross-linked polyalkenyl phenol based photoresist compositions |
US4931381A (en) * | 1985-08-12 | 1990-06-05 | Hoechst Celanese Corporation | Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment |
US5256522A (en) * | 1985-08-12 | 1993-10-26 | Hoechst Celanese Corporation | Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing |
US5217840A (en) * | 1985-08-12 | 1993-06-08 | Hoechst Celanese Corporation | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom |
DE3662952D1 (en) * | 1985-08-12 | 1989-05-24 | Hoechst Celanese Corp | Process for obtaining negative images from positive photoresists |
US4755446A (en) * | 1987-01-12 | 1988-07-05 | E. I. Du Pont De Nemours And Company | Photosensitive compositions containing microcapsules concentrated in surface layer |
JPH0717737B2 (ja) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法 |
US5178988A (en) * | 1988-09-13 | 1993-01-12 | Amp-Akzo Corporation | Photoimageable permanent resist |
US5070002A (en) * | 1988-09-13 | 1991-12-03 | Amp-Akzo Corporation | Photoimageable permanent resist |
US5114830A (en) * | 1988-10-28 | 1992-05-19 | W. R. Grace & Co.-Conn. | Solder mask resins having improved stability containing a multifunctional epoxide and a partial ester or styrene-maleic anhydride copolymer |
DE3931467A1 (de) * | 1989-09-21 | 1991-04-04 | Hoechst Ag | Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske |
US5217847A (en) * | 1989-10-25 | 1993-06-08 | Hercules Incorporated | Liquid solder mask composition |
US5153102A (en) * | 1990-08-10 | 1992-10-06 | Industrial Technology Research Institute | Alkalline-solution-developable liquid photographic composition |
US5206116A (en) * | 1991-03-04 | 1993-04-27 | Shipley Company Inc. | Light-sensitive composition for use as a soldermask and process |
GB9105561D0 (en) * | 1991-03-15 | 1991-05-01 | Coates Brothers Plc | Image formation |
GB2257549B (en) * | 1991-07-06 | 1995-05-03 | Motorola Israel Ltd | Modular data/control equipment |
JP2706859B2 (ja) * | 1991-07-30 | 1998-01-28 | 富士写真フイルム株式会社 | 光硬化性樹脂組成物、保護層の形成方法及びカラーフイルター |
GB2259916A (en) * | 1991-09-27 | 1993-03-31 | Coates Brothers Plc | Solder-resist, heat-curable compositions |
JP2989064B2 (ja) * | 1991-12-16 | 1999-12-13 | 日本ゼオン株式会社 | 金属蒸着膜のパターン形成方法 |
EP0628180B1 (en) * | 1992-02-24 | 1998-09-16 | E.I. Du Pont De Nemours And Company | Pliable, aqueous processable, photoimageable permanent coatings for printed circuits |
US5643657A (en) * | 1995-04-28 | 1997-07-01 | E. I. Du Pont De Nemours And Company | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits |
JPH08319456A (ja) * | 1995-04-28 | 1996-12-03 | E I Du Pont De Nemours & Co | 印刷回路用の水系処理可能な軟質の光画像化可能耐久被覆材 |
US6482551B1 (en) * | 1998-03-24 | 2002-11-19 | Inphase Technologies | Optical article and process for forming article |
ATE302231T1 (de) * | 2001-12-06 | 2005-09-15 | Huntsman Adv Mat Switzerland | Wärmehärtbare harzzusammensetzung |
BR0214764B1 (pt) * | 2001-12-06 | 2012-09-04 | composição de resina e seu uso, circuito impresso e unidade de acondicionamento. | |
US20080202811A1 (en) * | 2003-09-15 | 2008-08-28 | Konstandinos Zamfes | Drilling Cutting Analyzer System and Methods of Applications |
US20050082468A1 (en) * | 2003-09-15 | 2005-04-21 | Konstandinos Zamfes | Drilling Cutting Analyzer System and methods of applications. |
JP4401262B2 (ja) * | 2004-02-02 | 2010-01-20 | 富士フイルム株式会社 | 平版印刷版原版 |
US20060154180A1 (en) | 2005-01-07 | 2006-07-13 | Kannurpatti Anandkumar R | Imaging element for use as a recording element and process of using the imaging element |
JP2006301404A (ja) * | 2005-04-22 | 2006-11-02 | Tokyo Ohka Kogyo Co Ltd | 現像液組成物およびその製造方法、ならびにレジストパターンの形成方法 |
US7618766B2 (en) * | 2005-12-21 | 2009-11-17 | E. I. Du Pont De Nemours And Company | Flame retardant photoimagable coverlay compositions and methods relating thereto |
US7846639B2 (en) | 2006-06-30 | 2010-12-07 | E. I. Du Pont De Nemours And Company | Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element |
US7527915B2 (en) * | 2006-07-19 | 2009-05-05 | E. I. Du Pont De Nemours And Company | Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto |
US7780801B2 (en) | 2006-07-26 | 2010-08-24 | International Business Machines Corporation | Flux composition and process for use thereof |
GB2525041B (en) | 2014-04-11 | 2021-11-03 | Sam Systems 2012 Ltd | Sound capture method and apparatus |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3776729A (en) | 1971-02-22 | 1973-12-04 | Ibm | Photosensitive dielectric composition and process of using the same |
US4025348A (en) | 1974-05-10 | 1977-05-24 | Hitachi Chemical Company, Ltd. | Photosensitive resin compositions |
US4043819A (en) | 1974-06-11 | 1977-08-23 | Ciba-Geigy Ag | Photo-polymerizable material for the preparation of stable polymeric images and process for making them by photopolymerization in a matrix |
JPS592018B2 (ja) * | 1975-03-26 | 1984-01-17 | 住友化学工業株式会社 | カイリヨウサレタカンコウセイジユシソセイブツカラナルゲンケイ |
DE2861486D1 (en) * | 1977-11-21 | 1982-02-18 | Ciba Geigy Ag | Process for the application of soldering masks to printed circuits with through holes for contacting |
US4296196A (en) | 1978-05-20 | 1981-10-20 | Hoechst Aktiengesellschaft | Photopolymerizable mixture in a transfer element |
DE2822190A1 (de) | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
US4278752A (en) | 1978-09-07 | 1981-07-14 | E. I. Du Pont De Nemours And Company | Flame retardant radiation sensitive element |
US4361640A (en) | 1981-10-02 | 1982-11-30 | E. I. Du Pont De Nemours And Company | Aqueous developable photopolymer compositions containing terpolymer binder |
-
1981
- 1981-08-28 DE DE19813134123 patent/DE3134123A1/de not_active Withdrawn
-
1982
- 1982-08-09 CA CA000409020A patent/CA1185389A/en not_active Expired
- 1982-08-12 US US06/407,488 patent/US4438189A/en not_active Expired - Lifetime
- 1982-08-12 ZA ZA825843A patent/ZA825843B/xx unknown
- 1982-08-17 AU AU87217/82A patent/AU552582B2/en not_active Ceased
- 1982-08-23 AT AT82107706T patent/ATE18470T1/de active
- 1982-08-23 EP EP82107706A patent/EP0073444B1/de not_active Expired
- 1982-08-23 DE DE8282107706T patent/DE3269632D1/de not_active Expired
- 1982-08-26 FI FI822966A patent/FI73841C/fi not_active IP Right Cessation
- 1982-08-26 KR KR8203838A patent/KR880002535B1/ko active Pre-grant Review Request
- 1982-08-27 IL IL66659A patent/IL66659A/xx unknown
- 1982-08-27 ES ES515332A patent/ES8400608A1/es not_active Expired
- 1982-08-27 JP JP57149050A patent/JPS5842040A/ja active Pending
-
1987
- 1987-01-31 SG SG67/87A patent/SG6787G/en unknown
- 1987-04-09 HK HK281/87A patent/HK28187A/xx unknown
- 1987-12-30 MY MY458/87A patent/MY8700458A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
ATE18470T1 (de) | 1986-03-15 |
SG6787G (en) | 1987-06-05 |
EP0073444A2 (de) | 1983-03-09 |
IL66659A0 (en) | 1982-12-31 |
FI73841B (fi) | 1987-07-31 |
ZA825843B (en) | 1983-06-29 |
EP0073444A3 (en) | 1983-06-15 |
KR880002535B1 (ko) | 1988-11-28 |
FI73841C (fi) | 1987-11-09 |
US4438189A (en) | 1984-03-20 |
DE3134123A1 (de) | 1983-03-17 |
AU552582B2 (en) | 1986-06-05 |
CA1185389A (en) | 1985-04-09 |
EP0073444B1 (de) | 1986-03-05 |
FI822966L (fi) | 1983-03-01 |
AU8721782A (en) | 1983-03-03 |
HK28187A (en) | 1987-04-16 |
KR840001343A (ko) | 1984-04-30 |
ES515332A0 (es) | 1983-11-01 |
DE3269632D1 (en) | 1986-04-10 |
FI822966A0 (fi) | 1982-08-26 |
JPS5842040A (ja) | 1983-03-11 |
MY8700458A (en) | 1987-12-31 |
IL66659A (en) | 1985-11-29 |
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