ES526016A0 - Procedimiento para la preparacion de revestimientos y reproducciones fotograficas en relieve - Google Patents

Procedimiento para la preparacion de revestimientos y reproducciones fotograficas en relieve

Info

Publication number
ES526016A0
ES526016A0 ES526016A ES526016A ES526016A0 ES 526016 A0 ES526016 A0 ES 526016A0 ES 526016 A ES526016 A ES 526016A ES 526016 A ES526016 A ES 526016A ES 526016 A0 ES526016 A0 ES 526016A0
Authority
ES
Spain
Prior art keywords
relief
coatings
procedure
preparation
photographic reproductions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES526016A
Other languages
English (en)
Other versions
ES8504391A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES526016A0 publication Critical patent/ES526016A0/es
Publication of ES8504391A1 publication Critical patent/ES8504391A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Steroid Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
ES526016A 1982-09-29 1983-09-28 Procedimiento para la preparacion de revestimientos y reproducciones fotograficas en relieve Expired ES8504391A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH577682 1982-09-29

Publications (2)

Publication Number Publication Date
ES526016A0 true ES526016A0 (es) 1985-04-16
ES8504391A1 ES8504391A1 (es) 1985-04-16

Family

ID=4299148

Family Applications (1)

Application Number Title Priority Date Filing Date
ES526016A Expired ES8504391A1 (es) 1982-09-29 1983-09-28 Procedimiento para la preparacion de revestimientos y reproducciones fotograficas en relieve

Country Status (4)

Country Link
US (1) US4562141A (es)
EP (1) EP0116258A3 (es)
JP (1) JPS5984909A (es)
ES (1) ES8504391A1 (es)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4767797A (en) * 1983-06-20 1988-08-30 Asahi Kasei Kogyo Kabushiki Kaisha Photocurable compositions of poly(ethynylphenyl)acetylene, its copolymer and composition thereof
FR2553531B1 (fr) * 1983-10-14 1995-12-29 Canon Kk Monomere photopolymerisable pour milieu d'enregistrement optique et milieu le contenant
DE3346716A1 (de) * 1983-12-23 1985-07-04 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von resistmustern und fuer dieses verfahren geeigneter trockenfilmresist
EP0143437B1 (de) * 1983-11-26 1988-07-27 BASF Aktiengesellschaft Verfahren zur Herstellung von Resistmustern und für dieses Verfahren geeigneter Trockenresist
JPS60223887A (ja) * 1984-04-20 1985-11-08 Canon Inc 発光表示素子
JPS61134345A (ja) * 1984-12-05 1986-06-21 Kanegafuchi Chem Ind Co Ltd ベンゼン環を含んだ両親媒性ジアセチレン化合物およびその膜
DE3545984A1 (de) * 1984-12-28 1986-07-03 Canon K.K., Tokio/Tokyo Anzeigeverfahren
US4684434A (en) * 1985-02-26 1987-08-04 Gte Laboratories Incorporated Method for the preparation of thin large-area single crystals of diacetylenes and polydiacetylenes
US4793893A (en) * 1985-02-26 1988-12-27 Gte Laboratories Incorporated Methods for the preparation of thin large-area single crystals of diacetylenes and polydiacetylenes
US4698121A (en) * 1985-02-26 1987-10-06 Gte Laboratories Incorporated Methods for the preparation of oriented thin large-area single crystals of diacetylenes and polydiacetylenes
JPS61203448A (ja) * 1985-03-05 1986-09-09 Mitsubishi Petrochem Co Ltd 光記録媒体
US4957851A (en) * 1985-04-16 1990-09-18 Canon Kabushiki Kaisha Image recording medium comprising a diacetylene derivative compound film and a radiation absorbing layer
US5004671A (en) * 1985-08-27 1991-04-02 Canon Kabushiki Kaisha Optical recording medium and optical recording method
US4863832A (en) * 1985-12-16 1989-09-05 Canon Kabushiki Kaisha Optical recording employing diacetylene compound and dye to change color and form pits
US4782006A (en) * 1985-12-16 1988-11-01 Canon Kabushiki Kaisha Optical recording employing diacetylene compound and dye to form and visualize a latent image
US4910107A (en) * 1985-12-16 1990-03-20 Canon Kabushiki Kaisha Optical recording-reproducing method and device by using the same
JPH0675194B2 (ja) * 1986-03-31 1994-09-21 キヤノン株式会社 重合性薄膜
US4798740A (en) * 1986-03-31 1989-01-17 Canon Kabushiki Kaisha Polymerizable film and pattern forming method by use thereof
US5009489A (en) * 1986-04-04 1991-04-23 Ken Eguchi Liquid crystal device
JPS62280837A (ja) * 1986-05-30 1987-12-05 Matsushita Electric Ind Co Ltd エネルギ−感応性単分子累積膜及びそれを用いたパタ−ン形成方法
JPS6358439A (ja) * 1986-08-29 1988-03-14 Hiroyoshi Shirai レジスト
JPH01236207A (ja) * 1987-07-24 1989-09-21 Nippon Steel Corp ポリジアセチレン薄膜の製造法
US4946919A (en) * 1987-08-31 1990-08-07 Hoechst Celanese Corp. Boron ceramics from carboralated diacetylene polymers
US4857490A (en) * 1987-08-31 1989-08-15 Hoechst Celanese Corp. Process of manufacturing boron ceramics from carboralated diacetylene polymers
JPS6473339A (en) * 1987-09-14 1989-03-17 Agency Ind Science Techn Pattern forming method
GB8721698D0 (en) * 1987-09-15 1987-10-21 Shell Int Research Polymeric surfactants
US4970137A (en) * 1989-03-09 1990-11-13 Gaf Chemicals Corporation Process for sensitizing polyacetylenic films
US5011907A (en) * 1989-10-10 1991-04-30 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Molecules with enhanced electronic polarizabilities based on "defect"-like states in conjugated polymers
US5139928A (en) * 1990-10-23 1992-08-18 Isp Investments Inc. Imageable recording films
US5661092A (en) * 1995-09-01 1997-08-26 The University Of Connecticut Ultra thin silicon oxide and metal oxide films and a method for the preparation thereof
US5731112A (en) * 1996-05-23 1998-03-24 Isp Investments Inc. Processless diacetylenic salt films capable of developing a black image
WO2008048695A2 (en) * 2006-01-19 2008-04-24 Kansas State University Research Foundation Synthesis and applications of nanomaterials derived from self-assembled diacetylenic triglycerides
KR101641665B1 (ko) * 2013-01-18 2016-07-21 한양대학교 산학협력단 수변색 폴리다이아세틸렌 복합체 조성물, 이를 이용한 수변색 박막필름 및 이의 용도
KR101812880B1 (ko) * 2016-05-02 2017-12-28 한양대학교 산학협력단 수용성 다이아세틸렌 단량체 화합물, 수용성 다이아세틸렌 단량체 화합물과 pedot/pss 전도성 고분자를 포함하는 광미세가공용 조성물 및 이를 이용한 마이크로 패턴의 제조방법
US10782613B2 (en) 2018-04-19 2020-09-22 International Business Machines Corporation Polymerizable self-assembled monolayers for use in atomic layer deposition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1430453A (en) * 1972-01-24 1976-03-31 Eastman Kodak Co Radiation-sensitiver compositions and materials
US4208501A (en) * 1977-02-25 1980-06-17 Allied Chemical Corporation Carbazolyl diacetylenic polymers
US4189399A (en) * 1977-07-19 1980-02-19 Allied Chemical Corporation Co-crystallized acetylenic compounds
IL60116A (en) * 1979-06-25 1984-04-30 University Patents Inc Coating process and articles coated thereby
US4314021A (en) * 1980-08-11 1982-02-02 Eastman Kodak Company Photographic element having a layer of lipid compound

Also Published As

Publication number Publication date
EP0116258A2 (de) 1984-08-22
JPS5984909A (ja) 1984-05-16
EP0116258A3 (de) 1985-09-25
US4562141A (en) 1985-12-31
ES8504391A1 (es) 1985-04-16

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